Electrostatic chuck device
This electrostatic chuck device includes an electrostatic chuck part which has a placement surface on one main surface thereof to place a plate-shaped sample and has an electrode for electrostatic attraction; a temperature controlling base part configured to cool the electrostatic chuck part; and a heater element disposed between the electrostatic chuck part and the temperature controlling base part, in which the electrostatic chuck part and the temperature controlling base part are parts in which a plurality of through holes communicating in a thickness direction are provided, the heater element has a first site formed in a band shape and a second site continuous with the first site, wherein the second site is formed to have in a band shape and a closed ring shape, one through hole of the through holes is disposed on an inner peripheral side of the second site in plan view.
1. An electrostatic chuck device comprising:
an electrostatic chuck part which has a placement surface on one main surface thereof to place a plate-shaped sample and has an electrode for electrostatic attraction;
a temperature controlling base part which is provided at a side opposite to the placement surface of the electrostatic chuck part and is configured to cool the electrostatic chuck part; and
a heater element disposed between the electrostatic chuck part and the temperature controlling base part or in the electrostatic chuck part in a layer form, wherein
the electrostatic chuck part and the temperature controlling base part are parts in which a plurality of through holes communicating in a thickness direction are provided,
the heater element has a first site formed in a band shape and a second site continuous with the first site,
wherein the second site is formed to have a band shape and a closed ring shape,
one through hole of the through holes is disposed on an inner peripheral side of the second site in plan view, and
a width of the second site is in a range of 0.25 times to 0.75 times a width of the first site.
2. The electrostatic chuck device according to claim 1 , wherein a shape of an inner peripheral edge of the second site in plan view protrudes to a first site side as compared with a virtual inscribed circle of the inner peripheral edge.
3. The electrostatic chuck device according to claim 1 , wherein the width of the second site is in a range of 0.45 times to 0.55 times the width of the first site.
4. The electrostatic chuck device according to claim 1 , wherein
the heater element is disposed in a circular region,
a first members extend in a circumferential direction of the circular region.
5. The electrostatic chuck device according to claim 1 , wherein
the heater element is disposed in a circular region,
the first site has first members and second members,
the first members extend in a circumferential direction of the circular region, and
the second member extend in a radial direction of the circular region.
6. The electrostatic chuck device according to claim 1 , wherein
the heater element is disposed in a circular region,
the first site has first members and second members,
the first members extend in a circumferential direction of the circular region, and
the second member extend in a direction obliquely intersecting with a radial direction of the circular region.
7. An electrostatic chuck device comprising:
an electrostatic chuck part which has a placement surface on one main surface thereof to place a plate-shaped sample and has an electrode for electrostatic attraction;
a temperature controlling base part which is provided at a side opposite to the placement surface of the electrostatic chuck part and is configured to cool the electrostatic chuck part; and
a heater element disposed between the electrostatic chuck part and the temperature controlling base part or in the electrostatic chuck part in a layer form, wherein
the electrostatic chuck part and the temperature controlling base part are parts in which a plurality of through holes communicating in a thickness direction are provided,
the heater element has a first site formed in a band shape and a second site continuous with the first site, wherein the second site is formed to have a band shape and a closed ring shape, the through hole is disposed on an inner peripheral side of the second site in plan view, and
a shape of an inner peripheral edge of the second site in plan view protrudes to a first site side as compared with a virtual inscribed circle of the inner peripheral edge.
8. The electrostatic chuck device according to claim 7 , wherein
the heater element is disposed in a circular region,
the first site has first members,
the first members extend in a circumferential direction of the circular region.
9. The electrostatic chuck device according to claim 7 , wherein
the heater element is disposed in a circular region,
the first site has first members and second members,
the first members extend in a circumferential direction of the circular region, and
the second member extend in a radial direction of the circular region.
10. The electrostatic chuck device according to claim 7 , wherein
the heater element is disposed in a circular region,
the first site has first members and second members,
the first members extend in a circumferential direction of the circular region, and
the second member extend in a direction obliquely intersecting with a radial direction of the circular region.
11. The electrostatic chuck device according to claim 7 , wherein a width of the second site is in a range of 0.25 times to 0.75 times a width of the first site.
12. The electrostatic chuck device according to claim 7 , wherein a width of the second site is in a range of 0.45 times to 0.55 times a width of the first site.