IP Library Granted Patent US 12,248,123
Granted Patent B2
US 12,248,123 · App. 16/764,735 · Granted Mar 11, 2025

Methods of forming an antireflective layer on a complex substrate and complex substrates having the antireflective layer

Inventors: Sin-Yen Leo (Gainesville, FL); Peng Jiang (Gainesville, FL); Zhuxiao Gu (Gainesville, FL)
Assignee: University of Florida Research Foundation, INC.
G02B1/118C03C17/004C03C17/005C03C17/25G02B1/12C03C2217/213C03C2217/732C03C2218/111C03C2218/115C03C2218/32
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Quick Facts
Patent No.
US 12,248,123
App. No.
16/764,735
Granted
Mar 11, 2025
Kind
B2
Abstract

Described herein are antireflective layers, methods for forming antireflective layers, and structures including antireflective layers. Methods are included for forming a durable antireflective layer on the surface of a substrate, wherein the substrate has a complex three-dimensional shape, wherein the durable antireflective layer comprises a uniform monolayer of silica nanoparticles interconnected by SiO 2 , a uniform monolayer of silica nanoparticles bonded to the surface of the substrate, or a combination thereof.

Claims (13)

1. A structure comprising:

a durable antireflective layer disposed directly onto an inner surface and an outer surface of a substrate, wherein:

the substrate has a three-dimensional shape comprising one or more of a concave inner surface, a convex inner surface, and a polygonal inner surface and one or more of a concave outer surface, a convex outer surface, and a polygonal outer surface,

the inner surface of the substrate is functionalized to have a positive charge and the durable antireflective layer has a negative charge,

the durable antireflective layer is electrostatically adsorbed directly onto the inner surface,

the outer surface of the substrate is functionalized to have a positive charge and the durable antireflective layer has a negative charge,

the durable antireflective layer is electrostatically adsorbed directly onto the outer surface, and

the durable antireflective layer comprises a uniform monolayer of silica nanoparticles attached to one or more other silica nanoparticles by SiO 2 , wherein the uniform monolayer of silica nanoparticles is bonded directly to the inner surface of the substrate surface via a covalent SiO 2 -particle network, wherein the uniform monolayer of silica nanoparticles is bonded directly to the outer surface of the substrate surface via a covalent SiO 2 -particle network, wherein the silica nanoparticles have a diameter of about 100 to 200 nm.

2. The structure of claim 1 , wherein the substrate is selected from the group consisting of: a silicon substrate, a gallium arsenide (GaAs) substrate, a gallium antimonide (GaSb) substrate, indium phosphide (InP), and gallium nitride (GaN).

3. The structure of claim 2 , wherein the substrate is a silicon substrate.

4. The structure of claim 3 , wherein the substrate comprises a plurality of the three-dimensional shapes.

5. The structure of claim 1 , wherein the substrate is selected from a Buchner flask, a burette, a cold finger, a condenser, a cuvette, an Erlenmeyer flask, an Erlenmeyer bulb, a Florence flask, a Freidrichs condenser, a funnel, a pipette, a retort, a round bottom flask, a Schlenk flask, a separatory funnel, a Soxhlet extractor, a Thiele tube, a volumetric flask, a distillation glassware, a vial, a graduated cylinder, a test tube, a bottle, a jar, a spot plate, an evaporation dish, a boiling flask, a suction flask, a crystallization dish, a long condenser, a vacuum adapter, a distillation adapter, and a dropper.

6. The structure of claim 1 , wherein the covalent SiO 2 -particle network of the durable antireflective layer does not reduce a transmittance % of the antireflective layer by more than 2%, wherein the covalent SiO 2 -particle network does not form a layer of SiO 2 over the surface of the uniform monolayer of silica nanoparticles, and wherein the durable antireflective layer has a total specular reflectance of about 2% or less.

Assignments (2)
CONFIRMATORY LICENSE Recorded Apr 21, 2021
From: FLORIDA, UNIVERSITY OF
To: DEFENSE THREAT REDUCTION AGENCY, US DOD
Reel/Frame 055997/0395 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 5, 2020
From: LEO, SIN-YEN; JIANG, PENG; GU, ZHUXIAO
To: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.
Reel/Frame 053412/0752 →
Continuity (2)
Provisional Application 62607987 · Dec 20, 2017
Related Publication 20210181381A1 · Jun 17, 2021
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