Method for increasing corrosion resistance of a substrate comprising an outermost chromium alloy layer
View Patent ↗Method for increasing corrosion resistance of substrate including an outermost chromium alloy layer, including (i) providing substrate comprising an outermost layer, the layer having color space defined by CIELAB with lightness L* of 79 or more, including oxygen and carbon, and including iron in amount up to 1 atom-%, (ii) providing an aqueous, acidic passivation solution, the solution including trivalent chromium ions, phosphate ions, one or more than one organic acid anion, (iii) contacting the substrate with the passivation solution and passing electrical current between the substrate as cathode and an anode in the passivation solution wherein a passivation layer is deposited onto the outermost layer, wherein in step (i) the outermost layer is electrolytically deposited from aqueous, acidic deposition composition, the composition including trivalent chromium ions, at least one organic acid comprising an isothiureido moiety and/or salts thereof, and chloride ions in amount of 0 wt-% to 0.1 wt-%.
1. A method for increasing corrosion resistance of a substrate comprising an outermost chromium alloy layer, the method comprising the steps of:
(i) providing the substrate comprising said outermost layer, the layer
having a color space defined by CIELAB with a lightness L* of 79 or more,
comprising oxygen and carbon, and
further comprising iron in a total amount of 0 atom-% to 1 atom-%, based on the total number of atoms in said outermost layer,
(ii) providing an aqueous, acidic passivation solution, the solution comprising:
trivalent chromium ions,
phosphate ions, and
one or more than one organic acid residue anion,
(iii) contacting the substrate with the passivation solution and passing an electrical current between the substrate as a cathode and an anode in the passivation solution such that a passivation layer is deposited onto the outermost layer,
wherein
in step (i) the outermost chromium alloy layer is electrolytically deposited from an aqueous, acidic deposition composition, the composition comprising:
trivalent chromium ions,
at least one organic acid comprising an isothiureido moiety and/or salts thereof, and
chloride ions in a total amount of 0 wt-% to 0.1 wt-%, based on the total weight of the deposition composition.
2. The method of claim 1 , wherein in step (i) said outermost layer has a color space defined by CIELAB with a lightness L* of 80 or more.
3. The method of claim 1 , wherein in step (i) said outermost layer has a color space defined by CIELAB with a color channel a* in the range from −2.0 to +2.0.
4. The method according to claim 1 , wherein in step (i) said outermost layer has a color space defined by CIELAB with a color channel b* in the range from −4.0 to +4.0.
5. The method according to claim 1 , wherein in step (i) in the outermost layer carbon is present in a total amount in the range from 2 atom-% to 10 atom-%, based on the total number of atoms in the outermost layer.
6. The method according to claim 1 , wherein in step (i) in the outermost layer oxygen is present in a total amount in the range from 2 atom-% to 15 atom-%, based on the total number of atoms in the outermost layer.
7. The method according to claim 1 , wherein in step (i) the outermost layer further comprises sulfur.
8. The method according to claim 1 , wherein in the aqueous, acidic deposition composition of step (i) the at least one organic acid comprising an isothiureido moiety and salts thereof comprises at least one mono-carboxylic acid comprising an isothiureido moiety and/or salts thereof.
9. The method according to claim 1 , wherein in the aqueous, acidic deposition composition of step (i) the at least one organic acid comprising an isothiureido moiety and salts thereof comprises the compound (NH 2 )C(═NH)S—(CH 2 ) m —COOH and/or salts thereof, wherein m is an integer in the range from 1 to 10.
10. The method according to claim 1 , wherein in the aqueous, acidic deposition composition of step (i) the at least one organic acid comprising an isothiureido moiety and salts thereof comprises the compound (NH 2 )C(═NH)S—(CH 2 ) 3 —COOH and/or salts thereof.
11. The method according to claim 1 , wherein in step (i) the aqueous, acidic deposition composition does not comprise one, more than one or all of the compounds selected from the group consisting of thiourea, thiosulfate, and ammonium ions.
12. The method according to claim 1 , wherein in step (i) the aqueous, acidic deposition composition comprises the chloride ions in a total amount from 0 wt-% to 0.05 wt-%, based on the total weight of the deposition composition.
13. The method according to claim 1 , wherein the one or more than one organic acid residue anion in the aqueous, acidic passivation solution of step (ii) comprises at least one organic acid residue anion having two carboxylic moieties.
14. The method according to claim 1 , wherein in step (i) the outermost layer is free of cracks and free of pores.
15. The method according to claim 1 , comprising prior to step (iii) the additional step
(ii-a) immersing the substrate obtained after step (i) into an aqueous immersion treatment solution comprising:
trivalent chromium ions,
phosphate ions, and
one or more than one organic acid residue anion,
wherein during the immersing no electrical current is applied.