Imprint template, preparation method thereof and imprint method
The present disclosure provides an imprint template, including: a base substrate, a pattern layer for imprinting and a planarization layer; wherein the planarization layer is located on a surface of the pattern layer facing away from the base substrate, and a surface of the planarization layer facing away from the base substrate is a plane; and the planarization layer and the pattern layer are configured such that under a specific film removing process, the planarization layer is removed while the pattern layer remains. The present disclosure further provides a preparation method of an imprint template, and an imprint method.
1. An imprint method, wherein the imprint method is based on an imprint template, and the imprint template comprises: a base substrate, a pattern layer for imprinting, and a planarization layer; wherein
the planarization layer is located on a surface of the pattern layer facing away from the abase substrate, and a surface of the planarization layer facing away from the base substrate is a plane;
the planarization layer and the pattern layer are configured such that under a specific film removing process, the planarization layer is removed while the pattern layer remains;
the planarization layer completely covers an entire surface of the pattern layer facing away from the base substrate;
the layer is for imprinting an imprint glue after the planarization layer is removed; and
a material of the planarization layer comprises: a water soluble material or a degradable material,
wherein the imprint method sequentially comprises:
imprinting the imprint glue by the planarization layer of the imprint template to flatten a surface of the imprint glue;
removing the planarization layer through a film removing process to expose the pattern layer; and
imprinting the imprint glue by the pattern layer of the imprint template to pattern the imprint glue, wherein
when the material of the planarization layer comprises a water soluble material, the step of removing the planarization layer through a film removing process comprises: dissolving the planarization layer with an aqueous solvent; and
when the material of the planarization layer comprises a degradable material, the step of removing the planarization layer through a film removing process comprises: degrading the planarization layer through a degradation process.
2. The imprint method according to claim 1 , wherein the imprint template further comprises: a buffer layer; wherein
the buffer layer is located between the base substrate and the pattern layer.
3. The imprint method according to claim 1 , wherein after the step of removing the planarization layer through a film removing process, the method further comprises:
drying the imprint template.
4. The imprint method according to claim 1 , wherein the water soluble material comprises at least one of a polyvinyl alcohol resin and a polycaprolactone resin.
5. The imprint method according to claim 1 , wherein the degradable material comprises a degradable imprint glue.