Display device and method for manufacturing the same
A display device includes an organic insulating layer, a first inorganic insulating layer, and a second inorganic insulating layer arranged in a first region and a second region, a plurality of pixels arranged in the first region, a protective film arranged in the second region and in contact with an upper surface of the second inorganic insulating layer in the second region, and a groove portion is provided in the organic insulating layer in the second region. A side surface and a bottom surface of the groove portion is covered by the first inorganic insulating layer and the second inorganic insulating layer. The protective film is overlapped with an upper surface of the organic insulating layer and an upper end portion and a part of the side surface of the groove portion.
1. A display device comprising;
an organic insulating layer, a first inorganic insulating layer, and a second inorganic insulating layer arranged in a first region and a second region; a plurality of pixels arranged in the first region;
a protective film arranged in the second region and in contact with an upper surface of the second inorganic insulating layer in the second region; and
a groove portion arranged in the organic insulating layer in the second region, wherein a side surface and a bottom surface of the groove portion is covered by the first inorganic insulating layer and the second inorganic insulating layer,
the protective film is overlapped with an upper surface of the organic insulating layer and an upper end portion and a portion of the side surface of the groove portion,
a ratio between a height of the groove portion and a width of the bottom surface of the groove portion is 2 or more and 5 or less, and
a thickness of a protective film portion overlapping with the upper end portion of the groove portion is larger than a thickness of a protective film portion overlapping with the upper surface of the organic insulating layer.
2. The display device according to claim 1 , wherein
the side surface of the groove portion of the organic insulating layer is inclined at an angle of 70 degrees or more and 90 degrees or less to a bottom portion of the organic insulating layer.
3. The display device according to claim 2 , wherein
the ratio between the height of the groove portion and the width of the bottom surface of the groove portion is 2.5 or more and 4 or less.
4. The display device according to claim 3 , wherein
the first inorganic insulating layer and the second inorganic insulating layer are silicon nitride films.
5. The display device according to claim 1 , wherein
the protective film includes an inorganic material.
6. The display device according to claim 5 , wherein
the protective film is a silicon oxide film.
7. The display device according to claim 1 , wherein
each of the plurality of pixels includes an organic EL element.
8. A method of manufacturing a display device, the method comprising:
forming an organic insulating layer having a groove portion outside a display area;
forming a first inorganic insulating layer covering an upper surface of the organic insulating layer, a side surface and a bottom surface of the groove portion;
forming a second inorganic insulating layer on the first inorganic insulating layer; and
forming a protective film on the second inorganic insulating layer overlapping with the upper surface of the organic insulating layer, an upper end portion and a part of the side surface of the groove portion, wherein
a ratio between a height of the groove portion and a width of the bottom surface of the groove portion is 2 or more and 5 or less, and
a mean free path of a deposited particle by a forming method of the protective film is shorter than a mean free path of a deposited particle by a forming method of the first inorganic insulating layer and the second inorganic insulating layer.
9. The method of manufacturing a display device according to claim 8 , wherein
the side surface of the groove portion of the organic insulating layer is inclined at an angle of 70 degrees or more and 90 degrees or less to a bottom portion of the organic insulating layer.
10. The method of manufacturing a display device according to claim 8 , wherein
the ratio between the height of the groove portion and a width of the bottom surface of the groove portion is 2.5 or more and 4 or less.
11. The method of manufacturing a display device according to claim 8 , wherein
the protective film is formed by a sputtering method.
12. The method of manufacturing a display device according to claim 8 , wherein
each of the first inorganic insulating layer and the second inorganic insulating layer are formed of a silicon nitride film.
13. The method of manufacturing a display device according to claim 12 , wherein
the protective film has an etching selectivity ratio of 2 or more with respect to the second inorganic insulating layer.
14. The method of manufacturing a display device according to claim 13 , wherein
the protective film is formed of a silicon oxide film.