Dummy vertical structures for etching in 3D NAND memory and other circuits
A memory device comprises a stack of patterned conductor layers, at least a plurality of the layers comprising conductive strips including strips continuous with a pad and other strips isolated from the pad. An array of vertical pillars extends through the stack of patterned conductor layers, wherein memory cells are disposed at cross-points between the vertical pillars and patterned conductor layers. The array has an array boundary proximal to the pad. A first set of isolation blocks extends through the plurality of patterned conductor layers separating the strips continuous with the pad from the other strips isolated from the pad. A second set of isolation blocks inside the array boundary extends through the plurality of patterned conductor layers isolating the other strips from the pad.
1. A memory device, comprising:
a stack of patterned conductor layers, at least a plurality of the layers comprising conductive strips including strips continuous with a pad and other strips isolated from the pad,
an array of vertical pillars extending through the stack of patterned conductor layers wherein memory cells are disposed at cross-points between the vertical pillars and patterned conductor layers, the array having an array boundary proximal to the pad;
a first set of isolation blocks extending through the plurality of patterned conductor layers separating the strips continuous with the pad from the other strips isolated from the pad; and
a second set of isolation blocks inside the array boundary and extending through the plurality of patterned conductor layers isolating the other strips from the pad.
2. The memory device of claim 1 , wherein the second set of isolation blocks include isolation blocks connecting a pair of adjacent isolation blocks in the first set of isolation blocks.
3. The memory device of claim 1 , wherein some of the vertical pillars between the pad and the other strips isolated from the pad are penetrated by the isolation blocks in the second set of isolation blocks inside the array boundary.
4. The memory device of claim 1 , wherein the array extends into the pad beyond an end of isolation blocks in the first set of isolation blocks by one or more vertical pillars.
5. The memory device of claim 1 , wherein the array of vertical pillars includes a plurality of vertical pillars used for memory cells in the strips continuous with the pad, and vertical pillars not used for memory cells disposed between the pad and the plurality of vertical pillars used for memory cells, the memory device further comprising:
a set of bit lines, overlying the array and extending in a bit line direction, coupled to the plurality of vertical pillars used for memory cells.
6. The memory device of claim 5 , wherein the conductive strips extend in a first direction orthogonal to the bit line direction, the vertical pillars used for memory cells and the vertical pillars not used for memory cells have a common pitch and a common width in the first direction.
7. The memory device of claim 5 , including a block isolation structure penetrating vertical pillars not used for memory cells inside the array boundary, the block isolation structure extending in a first direction orthogonal to the bit line direction, and wherein the conductive strips extend in the first direction, the vertical pillars not used for memory cells penetrated by the block isolation structure have a different width in the first direction than the vertical pillars used for memory cells.
8. The memory device of claim 1 , comprising:
a second pad, wherein the strips continuous with the first-mentioned pad are separated from the second pad at ends proximal to the second pad, and strips continuous with the second pad are separated from the first-mentioned pad at ends proximal to the first-mentioned pad.
9. The memory device of claim 1 , comprising:
a block of vertical pillars inside the array boundary;
a third pad disposed opposite the first-mentioned pad in a second direction orthogonal to a first direction along which the conductive strips extend;
first and second boundary rows of vertical pillars extending in the first direction through the stack of patterned conductor layers, the first and second boundary rows being disposed adjacent and spanning the first-mentioned pad and the block of vertical pillars, the vertical pillars in the first and second boundary rows not used for memory cells; and
a block isolation structure extending through the stack of patterned conductor layers separating the first-mentioned pad from the third pad, the vertical pillars in the first and second boundary rows in contact with sides of the block isolation structure.
10. The memory device of claim 9 , comprising:
a second block of vertical pillars disposed opposite the first-mentioned block of vertical pillars in the second direction,
the block isolation structure separating the first-mentioned block of vertical pillars from the second block of vertical pillars.
11. A 3D circuit, comprising:
a stack of patterned conductor layers, at least a plurality of the layers comprising conductive strips including strips continuous with a pad and other strips isolated from the pad;
an array of circuit structures in the stack of patterned conductor layers, the array having an array boundary proximal to the pad;
a first set of isolation blocks extending through the plurality of patterned conductor layers separating the strips continuous with the pad from the other strips isolated from the pad; and
a second set of isolation blocks inside the array boundary and extending through the plurality of patterned conductor layers isolating the other strips from the pad.