IP Library Granted Patent US 11,011,345
Granted Patent B2
US 11,011,345 · App. 16/786,482 · Granted May 18, 2021

Charged particle beam device

Inventors: Takumi Hatakeyama (Tokyo, JP); Naoya Ishigaki (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
H01J37/18H01J37/08H01J37/244H01J37/28H01J2237/0225
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Quick Facts
Patent No.
US 11,011,345
App. No.
16/786,482
Granted
May 18, 2021
Kind
B2
Abstract

The present disclosure relates to a charged particle beam device intended to appropriately measure the amount of foreign substances in a vacuum chamber. As one aspect for achieving the above object, proposed is a charged particle beam device including a charged particle beam column ( 9 ) configured to irradiate a sample with a charged particle beam, vacuum chambers ( 1, 2 ) configured to create a vacuum around the sample, a plurality of electrodes ( 12 ) arranged in the vacuum chambers, and a capacitance measuring device ( 13 ) for measuring the capacitance between the plurality of electrodes.

Claims (38)

1. A charged particle beam device comprising:

a charged particle beam column configured to irradiate a sample with a charged particle beam;

a vacuum chamber configured to create a vacuum around the sample;

a plurality of electrodes arranged in the vacuum chamber; and

a capacitance measuring device for measuring the capacitance between the plurality of electrodes; wherein

the vacuum chamber includes a vacuum sample chamber for introducing a sample irradiated with the charged particle beam,

a preliminary exhaust chamber for vacuum evacuating an atmosphere around the sample before introducing the sample into the vacuum sample chamber, and

the plurality of electrodes are installed in the preliminary exhaust chamber.

2. The charged particle beam device according to claim 1 , wherein

the plurality of electrodes include a first electrode group connected to one side of a measurement terminal of the capacitance measuring device and a second electrode group connected to the other side of the measurement terminal of the capacitance measuring device, and

the electrodes of the first electrode group and the electrodes of the second electrode group are alternately arranged.

3. The charged particle beam device according to claim 1 , wherein

the plurality of electrodes include a plate-like electrode and a porous electrode disposed on the plate-like electrode, and one side of a measurement terminal of the capacitance measuring device is connected to the plate-like electrode and the other side of the measurement terminal of the capacitance measuring device is connected to the porous electrode.

4. The charged particle beam device according to claim 1 , further comprising:

a dust collecting electrode arranged under the plurality of electrodes via an insulator and configured to be applied a dust collecting voltage.

5. The charged particle beam device according to claim 1 , further comprising:

a control device communicatively coupled to the capacitance measuring device, wherein

the control device is configured to derive a parameter related to the amount of foreign substances based on the output of the capacitance measuring device.

6. The charged particle beam device according to claim 1 , further comprising:

a display device communicatively coupled to the control device, wherein

the control device is configured to display an alert on the display device when the parameter satisfies a predetermined condition.

7. The charged particle beam device according to claim 1 , further comprising:

a gas introduction mechanism for introducing gas into the preliminary exhaust chamber, wherein

the control device is configured to perform the capacitance measurement by the capacitance measuring device before and after the gas introduction by the gas introduction mechanism.

8. The charged particle beam device according to claim 7 , wherein

the control device is configured to perform a difference calculation of capacitance or parameters before and after the gas introduction.

9. The charged particle beam device according to claim 8 , further comprising:

a display device communicatively coupled to the control device, wherein

the control device is configured to cause the display device to display a relationship between the number of times of sample unloads and the difference calculation result.

10. The charged particle beam device according to claim 1 , further comprising:

a display device communicatively coupled to the control device, wherein

the control device is configured to cause the display device to display a relationship between the number of times of sample loads into the preliminary exhaust chamber and the parameter.

11. A charged particle beam device comprising:

a charged particle beam column configured to irradiate a sample with a charged particle beam;

a vacuum chamber configured to create a vacuum around the sample;

a plurality of electrodes arranged in the vacuum chamber;

a capacitance measuring device for measuring the capacitance between the plurality of electrodes; and

a control device communicatively coupled to the capacitance measuring device to derive a parameter related to the amount of foreign substances based on the output of the capacitance measuring device.

Assignments (2)
CHANGE OF NAME Recorded Apr 14, 2021
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 055924/0833 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2020
From: HATAKEYAMA, TAKUMI; ISHIGAKI, NAOYA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 051787/0786 →
Priority Claims (1)
JP JP2019-043299 · Mar 11, 2019 · national
Continuity (1)
Related Publication 20200294758A1 · Sep 17, 2020