Method of preparing thin film sample piece and charged particle beam apparatus
Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.
1. A method of preparing a thin film sample piece, whose thickness direction is along a surface of a sample, from the sample, the method including:
preparing the thin film sample piece and a connection portion, which is placed on one side of the thickness direction of the thin film sample piece and connecting the thin film sample piece to the sample, by processing the sample by irradiation of a charged particle beam from a first direction, which is a direction of a normal line to the surface of the sample, and from a second direction intersecting the direction of the normal line to form inclined surfaces along the thickness direction of the thin film and a slit along the direction of the normal line and a width direction of the thin film;
rotating the sample around direction of the normal line;
connecting a holding member, which holds the thin film sample piece to the thin film sample piece; and
separating the thin film sample piece from the sample by irradiating the connection portion with a third charged particle beam from a third direction intersecting the direction of the normal line, wherein the connection portion extends along the width direction of the thin film such that the connection portion overlaps a region of the slit.
2. A charged particle beam apparatus for preparing a thin film sample piece, whose thickness direction is along a surface of a sample, the apparatus comprising:
a charged particle beam radiation optical system for emitting a charged particle beam along a direction intersecting a vertical direction;
a stage moving with the sample placed thereon;
a holding member holding the thin film sample piece separated and removed from the sample; and
a controller for controlling operation of the charged particle beam radiation optical system, the stage, and the holding member,
wherein the controller controls to prepare the thin film sample piece and a connection portion placed on one side of the thin film sample piece in a thickness direction of the thin film sample piece and connecting the thin film sample piece to the sample, by irradiating the sample with charged particle beam from a first direction, which is a direction of a normal line to the surface of the sample, and from a second direction intersecting the direction of the normal line to form inclined surfaces along the thickness direction of the thin film and a slit along the direction of the normal line and a width direction of the thin film,
wherein the stage is rotated around the direction of the normal line,
wherein the holding member is connected to the thin film sample piece;
wherein the connection portion is irradiated with charged particle beam from a third direction intersecting the direction of the normal line to separate the thin film sample piece from the sample; and
wherein the connection portion extends along the width direction of the thin film such that the connection portion overlaps a region of the slit.
3. The charged particle beam apparatus according to claim 2 , wherein the controller controls to irradiate the connection portion with charged particle beam from the third direction, and to perform surface processing of a cross-section in the thickness direction of the thin film sample piece where the connection portion is disposed.
4. The charged particle beam apparatus according to claim 2 , the controller controls to prepare the connection portion on an inputted side among two sides in the thickness direction of the thin film sample piece in case a side to prepare the connection portion is inputted.
5. The charged particle beam apparatus according to claim 3 , the controller controls to prepare the connection portion on an inputted side among two sides in the thickness direction of the thin film sample piece in case a side to prepare the connection portion is inputted.
6. The charged particle beam apparatus according to any one of claim 2 , wherein the third direction is a direction in parallel to a cross-section of the thin film sample piece in the thickness direction.
7. The charged particle beam apparatus according to any one of claim 3 , wherein the third direction is a direction in parallel to a cross-section of the thin film sample piece in the thickness direction.
8. The charged particle beam apparatus according to any one of claim 4 , wherein the third direction is a direction in parallel to a cross-section of the thin film sample piece in the thickness direction.
9. The charged particle beam apparatus according to any one of claim 5 , wherein the third direction is a direction in parallel to a cross-section of the thin film sample piece in the thickness direction.