IP Library Granted Patent US 11,594,735
Granted Patent B2
US 11,594,735 · App. 16/796,287 · Granted Feb 28, 2023

Metal foil for electrochemical element electrode comprising a material, based on ti, c and h

Inventors: Celine Lavaud (Bordeaux, FR); Cecile Tessier (Bruges, FR); Laurent Dubost (Chamboeuf, FR); Michel Joseph Pierre Marie Martin (Septeme, FR)
Assignee: H.E.F.
H01M4/661H01M4/663H01M4/666H01M4/667H01M4/9041H01M10/0525H01M10/0562H01M10/0566H01M10/3909H01M2004/8694
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,594,735
App. No.
16/796,287
Granted
Feb 28, 2023
Kind
B2
Abstract

A metal foil including on at least one of its sides a layer of a material including: a metal or a metal alloy, carbon, hydrogen, and optionally oxygen, the atomic percentage of the metal or of the metals of the alloy in the material ranging from 10 to 60%, the atomic percentage of carbon in the material ranging from 35 to 70%, the atomic percentage of hydrogen in the material ranging from 2 to 20%, and the atomic percentage of oxygen if present in the material being less than or equal to 10%. The metal foil can be used in the manufacture of a cathode of a lithium-ion electrochemical cell. The deposition of this layer reduces the internal resistance of the cell.

Claims (18)

1. A process for manufacturing a layer of a material comprising a metal or a metal alloy, carbon and hydrogen on a metal foil, said process comprising the steps of:

a) provision of a substrate consisting of a metal foil,

b) etching of one side of the substrate by bombardment of ions resulting from the ionization of an inert gas,

c) sputter deposition on the etched side of the substrate of a material comprising:

a metal or a metal alloy,

carbon,

hydrogen,

and optionally oxygen,

the sputtering being carried out with a single target consisting of said metal or of said metal alloy, said metal alloy being devoid of carbon, the sputtering comprising a step of injecting into a chamber a mixture of an inert gas and a hydrocarbon gas at a temperature of 20° C. to 30° C., this mixture optionally containing nitrogen,

wherein carbon and hydrogen in the material deposited in step c) originate from the hydrocarbon gas.

2. The process as claimed in claim 1 , wherein the metal of the material of step c) is titanium.

3. The process as claimed in claim 1 , wherein the hydrocarbon is acetylene.

4. The process according to claim 1 , devoid of any annealing step.

5. The process according to claim 1 , wherein:

the atomic percentage of the metal or of the metals of the alloy in the material ranges from 10 to 60%,

the atomic percentage of carbon in the material ranges from 35 to 70%,

the atomic percentage of hydrogen in the material ranges from 2 to 20%,

the atomic percentage of oxygen if present in the material being less than or equal to 10%.

Assignments (3)
CHANGE OF NAME Recorded Nov 25, 2024
From: H.E.F
To: HYDROMECANIQUE ET FROTTEMENT
Reel/Frame 069398/0649 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 6, 2023
From: SAFT
To: H.E.F.
Reel/Frame 062298/0283 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 31, 2020
From: LAVAUD, CELINE; TESSIER, CECILE; DUBOST, LAURENT; MARTIN, MICHEL JOSEPH PIERRE MARIE
To: SAFT; H.E.F.
Reel/Frame 052274/0376 →
Priority Claims (1)
FR 1901747 · Feb 21, 2019 · national
Continuity (1)
Related Publication 20200274168A1 · Aug 27, 2020