Structure including SiOCN layer and method of forming same
A method for forming a layer comprising SiOCN on a substrate is disclosed. An exemplary method includes thermally depositing the layer comprising SiOCN on a surface of the substrate. The layer comprising SiOCN can be used for various applications, including spacers, etch stop layers, and etch resistant layers.
1. A method of forming a structure, the method comprising the steps of:
providing a substrate within a reaction chamber; and
using a thermal cyclic deposition process, depositing a layer comprising SiOCN on the surface of the substrate,
wherein the thermal cyclic deposition process comprises providing a first precursor and a second reactant, wherein the first precursor comprises a silicon precursor comprising a compound comprising two silicon atoms bonded to a hydrocarbon group, wherein the second reactant comprises an oxygen source, and wherein the silicon precursor comprises an alkoxysilane.
2. The method of claim 1 , wherein the silicon precursor comprises a compound comprising two silicon atoms bonded to an alkoxy group.
3. The method of claim 1 , wherein a temperature of a susceptor within the reaction chamber during the step of depositing a layer comprising SiOCN is between about 300° C. and about 600° C.
4. The method of claim 1 , wherein a pressure within the reaction chamber during the step of depositing a layer comprising SiOCN is between about 2 Torr and about 50 Torr.
5. The method of claim 1 , wherein the silicon precursor comprises a bridged alkoxysilane.
6. The method of claim 1 , wherein the silicon precursor comprises a bridged alkoxyalkylsilane.
7. The method of claim 1 , wherein the second reactant used during the step of depositing a layer comprising SiOCN is selected from the group consisting of N 2 O, O 2 , H 2 O, and H 2 O 2 .
8. The method of claim 1 , wherein the silicon precursor comprises a cyclic alkoxysilane.
9. The method of claim 1 , wherein the silicon precursor comprises a cyclic alkoxyalkylsilane.
10. The method of claim 1 , wherein the layer comprising SiOCN is conformally deposited.
11. The method of claim 1 , further comprising forming an etch stop layer comprising the layer comprising SiOCN.
12. The method of claim 1 , further comprising forming a spacer comprising the layer comprising SiOCN.
13. The method of claim 1 , wherein the silicon precursor comprises a compound comprising two silicon atoms bonded to a silyl group.
14. A method of forming a structure, the method comprising the steps of:
providing a substrate within a reaction chamber; and
using a thermal cyclic deposition process, depositing a layer comprising SiOCN on the surface of the substrate,
wherein a pressure within the reaction chamber is between about 0.5 Torr and about 50 Torr,
wherein a temperature of a susceptor within the reaction chamber during the step of depositing a layer comprising SiOCN is between about 300° C. and about 600° C., and
wherein the thermal cyclic deposition process comprises providing a silicon precursor comprising a compound comprising two silicon atoms bonded to a hydrocarbon group, and wherein the silicon precursor comprises tetramethyl bis(2,2-dimethylhydrazino)disilane.
15. The method of claim 14 , wherein only a precursor and no reactant are used during the step of depositing a layer comprising SiOCN.
16. A structure formed according to the method of claim 14 , wherein the layer comprising SiOCN is conformally deposited onto the substrate.
17. A method of forming a structure, the method comprising the steps of:
providing a substrate within a reaction chamber; and
using a thermal cyclic deposition process, depositing a layer comprising SiOCN on the surface of the substrate,
wherein the thermal cyclic deposition process comprises providing a first precursor and a second reactant, wherein the first precursor comprises a silicon precursor, wherein the silicon precursor comprises an alkoxysilane having a formula of Si(OR 1 ) 4-x R 2 x , wherein R 1 is independently selected from the group consisting of C 1 -C 5 alkyl ligands, and x is 0, 1, 2, or 3, wherein R 2 is selected from the group consisting of C 1 -C 5 alkyl, alkenyl, alkynyl, phenyl, carbonyl, aldehyde, ester, ether, carboxyl, peroxy, hydroperoxyl, thiol, acrylate, and methacrylate ligands, and wherein the second reactant comprises an oxygen source.
18. The method of claim 17 , wherein R 2 is selected from the group consisting of C 1 -C 5 alkyl ligands.
19. The method of claim 17 , wherein R 2 is selected from the Group consisting of alkenyl, alkynyl, phenyl, carbonyl, aldehyde, ester, ether, carboxyl, peroxy, hydroperoxyl, thiol, acrylate, and methacrylate ligands.