Method of determining whether a silicon-carbide semiconductor device is a conforming product
A method of determining whether a silicon-carbide semiconductor device, which has a metal oxide semiconductor (MOS) gate structure and a built-in diode, is a conforming product. The method includes measuring an ON voltage of the silicon carbide semiconductor device, passing a forward current through the built-in diode of the silicon carbide semiconductor device, measuring another ON voltage of the silicon carbide semiconductor device, which is the ON voltage of the silicon carbide semiconductor device after passing the forward current, calculating a rate of change between the ON voltage and the another ON voltage, and determining that the silicon carbide semiconductor device is a conforming product unless the calculated rate of change is less than 3%.
1. A method of determining whether a silicon-carbide semiconductor device, which has a metal oxide semiconductor (MOS) gate structure and a built-in diode, is a conforming product, the method comprising:
measuring an ON voltage of the silicon carbide semiconductor device;
passing a forward current through the built-in diode of the silicon carbide semiconductor device;
measuring another ON voltage of the silicon carbide semiconductor device, which is the ON voltage of the silicon carbide semiconductor device after passing the forward current;
calculating a rate of change between the ON voltage and the another ON voltage; and
determining that the silicon carbide semiconductor device is a conforming product when the calculated rate of change is less than 3%.
2. The method according to claim 1 , wherein
the ON voltage and the another ON voltage are measured by a rated current or a current lower than the rated current.
3. The method according to claim 1 ,
wherein the silicon-carbide semiconductor device further includes:
a silicon carbide substrate having a front surface and a back surface,
a first semiconductor layer of a first conductivity type provided on the front surface of the silicon carbide substrate and having a first side and a second side opposite to the first side and facing the silicon carbide substrate,
a second semiconductor layer of a second conductivity type provided on the first side of the first semiconductor layer,
a first semiconductor region of the first conductivity type selectively provided in the second semiconductor layer and having an impurity concentration higher than an impurity concentration of the silicon carbide substrate,
a trench penetrating the second semiconductor layer and reaching the first semiconductor layer,
a gate electrode provided on a gate insulating film in the trench,
a first electrode provided on surfaces of the first semiconductor region and the second semiconductor layer, and
a second electrode provided on the back surface of the silicon carbide substrate; and
wherein each of the ON voltage and the another ON voltage is measured by passing a current from the first electrode to the second electrode.
4. The method according to claim 1 , wherein
the silicon carbide semiconductor device is further determined to be a conforming product when the calculated rate of change is saturated.