Semiconductor device and method for manufacturing same

1. A semiconductor device comprising:

a semiconductor part;

a metal layer covering a back-surface of the semiconductor part;

a first electrode provided on a front surface of the semiconductor part;

a second electrode provided on the front surface of the semiconductor part, the second electrode being spaced from the first electrode;

a first control electrode provided between the semiconductor part and the first electrode;

a first insulating film electrically isolating the first control electrode from the semiconductor part;

a second control electrode provided between the semiconductor part and the second electrode;

a second insulating film electrically isolating the second control electrode from the semiconductor part; and

a third insulating film electrically isolating the first and second control electrodes from the first and second electrodes, respectively,

the semiconductor part including a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, a third semiconductor layer of the first conductivity type, a fourth semiconductor layer of the second conductivity type and a fifth semiconductor layer of the first conductivity type,

the first semiconductor layer including a first portion and a second portion, the first portion being positioned between the metal layer and the first electrode, the second portion being positioned between the metal layer and the second electrode,

the second semiconductor layer provided between the first semiconductor layer and the first electrode, the second semiconductor layer being electrically connected to the first electrode, the second semiconductor layer facing the first control electrode with the first insulating film interposed,

the third semiconductor layer selectively provided between the second semiconductor layer and the first electrode, the third semiconductor layer being electrically connected to the first electrode,

the fourth semiconductor layer provided between the first semiconductor layer and the second electrode, the fourth semiconductor layer being electrically connected to the second electrode, the fourth semiconductor layer facing the second control electrode with the second insulating film interposed,

the fifth semiconductor layer selectively provided between the fourth semiconductor layer and the second electrode, the fifth semiconductor layer being electrically connected to the second electrode,

the metal layer including a first layer and a second layer, the first layer being electrically connected to the first semiconductor layer, the second layer being provided on the first layer inside a periphery of the first layer, the second layer having a layer thickness thicker than a layer thickness of the first layer,

the second semiconductor layer being provided between the second layer of the metal layer and the first electrode,

the fourth semiconductor layer being provided between the second layer of the metal layer and the second electrode.

2. The device according to claim 1 , wherein

the metal layer includes a space extending along a periphery of the second layer, the space being provided between the first layer and an overhanging portion of the second layer.

3. The device according to claim 1 , wherein

the metal layer further includes a third layer covering the second layer, the third layer having a layer thickness thinner than the layer thickness of the second layer.

4. The device according to claim 1 , wherein

the metal layer further includes a third layer covering the first layer and the second layer, the third layer having a layer thickness thinner than the layer thickness of the second layer.

5. The device according to claim 3 , wherein

the first layer and the second layer of the metal layer includes silver, and the third layer includes nickel.