IP Library Granted Patent US 11,207,705
Granted Patent B2
US 11,207,705 · App. 16/817,325 · Granted Dec 28, 2021

Mask and method of manufacturing mask assembly including the same

Inventors: Su Cheol Gong (Cheonan-si, KR); Min Goo Kang (Seoul, KR); Taek Kyo Kang (Suwon-si, KR); Jung Woo Ko (Seoul, KR); Min Ju Kim (Cheonan-si, KR); Young Eun Ryu (Asan-si, KR); Jae Suk Moon (Seongnam-si, KR); Soo Hyun Min (Asan-si, KR)
Assignee: Samsung Display Co., Ltd.
B05B12/20B05C21/005B23K31/02C23C14/042B23K2103/04H01L51/0011H01L51/56
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,207,705
App. No.
16/817,325
Granted
Dec 28, 2021
Kind
B2
Abstract

A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and a second surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of ribs between the plurality of pattern holes, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of the body, is 1,000 μm to 4,000 μm.

Claims (44)

1. A mask, comprising:

a body;

a first welding region of the body at one end of the mask;

a second welding region of the body at another end of the mask, the another end of the mask facing the one end of the mask in a length direction; and

a pattern region between the first welding region and the second welding region,

wherein the pattern region includes a plurality of ribs, each rib including an upper surface having a first length and a lower surface having a second length that is longer than the first length,

wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to one of the first welding region and the second welding region, is 1,000 μm to 4,000 μm,

wherein an upper surface of the pattern region is flat,

wherein an upper surface of the first welding region and an upper surface of the second welding region protrude from the upper surface of the pattern region in a thickness direction, and

wherein portions of the body adjacent to the first welding region and the second welding region has the same thickness in the thickness direction as that of the pattern region.

2. The mask as claimed in claim 1 , wherein:

each of the first welding region, the second welding region, and the pattern region contains nickel and iron, and

a content of nickel in the first welding region, the second welding region, and the pattern region is 35 wt % to 40 wt %, based on a total weight of nickel and iron.

3. The mask as claimed in claim 1 , wherein a thickness of at least one of the first and second welding regions is equal to or greater than a thickness of the pattern region.

4. The mask as claimed in claim 1 , wherein a thickness of the pattern region is 6 μm to 10 μm.

5. A method of manufacturing a mask assembly, the method comprising:

forming a mask such that the mask has one surface and another surface facing each other in a thickness direction; and

attaching the mask to a mask frame such that the one surface of the mask is in contact with the mask frame,

wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of a body of the mask to the one end or the other end of the body, is 1,000 μm to 4,000 μm,

wherein the mask comprises:

the body;

a first welding region of the body at one end of the mask;

a second welding region of the body at another end of the mask, the another end of the mask facing the one end of the mask in a length direction; and

a pattern region between the first welding region and the second welding region,

wherein the pattern region includes a plurality of ribs, each rib including an upper surface having a first length and a lower surface having a second length that is longer than the first length,

wherein an upper surface of the pattern region is flat,

wherein an upper surface of the first welding region and an upper surface of the second welding region protrude from the upper surface of the pattern region in the thickness direction, and

wherein portions of the body adjacent to the first welding region and the second welding region has the same thickness in the thickness direction as that of the pattern region.

6. The method as claimed in claim 5 , further comprising stretching the mask in the length direction after the forming the mask, wherein the mask attached to the mask frame has a curl value of 0 μm to 400 μm.

7. The method as claimed in claim 6 , wherein, in the stretching the mask, the mask is stretched by a tensile resultant force of 0.4 Kgf to 6.0 Kgf.

8. The method as claimed in claim 5 , wherein:

the mask contains nickel and iron, and

a content of nickel in the mask is 35 wt % to 40 wt %, based on a total weight of nickel and iron.

9. The method as claimed in claim 5 , wherein:

the mask includes the first welding region at the one end of the mask in the length direction, the second welding region disposed at the other end of the mask facing the one end in the length direction, and the pattern region between the first welding region and the second welding region, and

in the forming the mask, a thickness of at least one of the first and second welding regions is equal to or greater than a thickness of the pattern region.

10. The method as claimed in claim 9 , wherein the thickness of the pattern region is 6 μm to 10 μm.

11. The method as claimed in claim 5 , wherein forming the mask includes:

forming a photoresist layer on a substrate;

forming a photomask on the photoresist layer and etching at least a part of the photoresist layer using the photomask, so as to form a plurality of photoresist patterns spaced apart from each other;

forming a metal layer between the plurality of photoresist patterns; and

removing the plurality of photoresist patterns and the substrate.

12. The method as claimed in claim 11 , wherein forming the metal layer includes applying a constant current to the metal layer.

13. The method as claimed in claim 11 , wherein the metal layer is formed using a metal plating solution, and the metal layer is formed in an amount of 1 wt % to 10 wt %, based on a total weight of the metal plating solution.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2021
From: GONG, SU CHEOL; KANG, MIN GOO; KANG, TAEK KYO; KO, JUNG WOO; KIM, MIN JU; RYU, YOUNG EUN; MOON, JAE SUK; MIN, SOO HYUN
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 057356/0890 →
Priority Claims (1)
KR 10-2016-0117572 · Sep 12, 2016 · national
Continuity (2)
Division 15651034 · Jul 17, 2017
Related Publication 20200206765A1 · Jul 2, 2020
Cited By (1)
US 12,312,670