Optical system for monitoring plasma reactions and reactors

1. A plasma generating system, comprising:

a plasma cavity for generating a plasma therewithin by use of microwave energy;

a flow inlet being configured to introduce a gas into a center of the plasma cavity;

a detection unit for measuring intensities of light emitted by the plasma in an ultraviolet (UV) range and an infrared (IR) range; and

a controller for controlling the detection unit.

2. The plasma generating system as recited in claim 1 , further comprising:

a waveguide coupled to the plasma cavity; and

a hollow cylinder protruding from a wall of the waveguide and having a bottom cap that includes an aperture,

wherein the detection unit is arranged to receive the light through the aperture.

3. The plasma generating system as recited in claim 2 , wherein the aperture is dimensioned to prevent leakage of the microwave energy therethrough while still allowing enough light through for detection.

4. The plasma generating system as recited in claim 1 , wherein the detection unit includes:

a sensor for converting light into an electrical signal; and

a board having an electrical circuit, the sensor being mounted on the board, wherein the electrical circuit conditions the electrical signal and sends the electrical signal to the controller.

5. The plasma generating system as recited in claim 4 , further comprising:

a switchable bandpass filter disposed in front of the sensor and having one or more bandpass filters that each pass light in a wavelength range.

6. The plasma generating system as recited in claim 1 , further comprising:

a lens for collecting the light onto the detection unit.

7. The plasma generating system as recited in claim 1 , wherein the detection unit includes:

a first sensor for measuring intensity of the light in the UV range; and

a second sensor for measuring intensity of the light in the IR range.

8. The plasma generating system as recited in claim 7 , further comprising: a first bandpass filter disposed in front of the first sensor and configured to pass the light in the UV range; and

a second bandpass filter disposed in front of the second sensor and configured to pass the light in the IR range.

9. The plasma generating system as recited in claim 1 , further comprising:

a waveguide coupled to the plasma cavity; and

an optical fiber installed in the waveguide and having one end for receiving the light and an other end coupled to the detection unit.

10. The plasma generating system as recited in claim 1 , further comprising:

a waveguide for transmitting the microwave energy therethrough;

an inner wall disposed within the waveguide to define the plasma cavity;

an adaptor mounted on the waveguide and configured to introduce a gas into the plasma cavity and generate a vortex flow within the plasma cavity using the gas, the adaptor having a through hole through which a gas processed by the plasma exits the plasma cavity; and

an optical fiber installed in the adaptor and having one end for receiving the light and an other end coupled to the detection unit.

11. The plasma generating system as recited in claim 1 , further comprising:

a waveguide for transmitting the microwave energy therethrough;

the flow inlet being a forward flow inlet mounted on the waveguide and configured to introduce the gas into the center of the plasma cavity and to generate a vortex flow within the plasma cavity using the gas; and

an optical fiber installed in the forward flow inlet and having one end for receiving the light and an other end coupled to the detection unit.

12. The plasma generating system as recited in claim 11 , wherein the controller is configured to determine a possible input gas issue or damage to the plasma cavity based on a combination of both UV and IR emissions of varying amplitudes.

13. The plasma generating system as recited in claim 11 , wherein the controller is configured to determine a possible deposition on a surface of the plasma cavity based on the measured intensity of light emitted by the plasma in the IR range.

14. The plasma generating system as recited in claim 11 , wherein the detection unit is configured to detect a diminution of IR intensity and a presence of UV that is indicative of plasma stability.

15. The plasma generating system as recited in claim 1 , the flow inlet being at a first end of the plasma cavity and configured to generate a vortex flow within the plasma cavity using the gas.

16. The plasma generating system as recited in claim 15 , the flow inlet having a first opening, a second opening having, and a gas passageway disposed therethrough from the first opening to the second opening.

17. The plasma generating system as recited in claim 16 , the gas passageway having a geometry to impart spiral a motion to the flow as the flow enters the plasma cavity via the gas passageway.

18. The plasma generating system as recited in claim 16 , the gas passageway being curved to enhance the vorticity of the flow.

19. The plasma generating system as recited in claim 15 , further comprising a plasma stabilizer protruding into the plasma cavity and configured to contribute to the vortex flow within the plasma cavity.

20. The plasma generating system as recited in claim 1 , wherein the detection unit includes:

a sensor to generate an electrical signal based on sensed light; and

an electrical circuit to condition the electrical signal generated by the sensor and to send the conditioned electrical signal to the controller.