Electrostatic holding apparatus with a layered composite electrode device and method for the production thereof

1. A holding apparatus configured for electrostatic holding of a component, comprising:

a base body with at least one base body plate,

a plurality of protruding burls which are arranged on an upper side of the base body plate and end faces of which span a burls support plane for a support of the component, and

an electrode device which is arranged in layered form in spacings between the burls and has an insulator layer which is connected to the base body plate, an electrode layer and a dielectric layer made from an inorganic dielectric, wherein the electrode layer is arranged between the insulator layer and the dielectric layer, wherein

a pre-determined gap spacing is set between the burls support plane and an upper side of the dielectric layer, and

the electrode device has a plurality of openings and is arranged on the upper side of the base body plate between the burls such that the burls protrude through the openings, wherein

the insulator layer comprises an inorganic dielectric and is connected with an adhesive to the upper side of the base body between the burls, and

the electrode device is embedded in the adhesive, and in the openings, a spacing between the burls and the electrode device is filled with the adhesive.

2. The holding apparatus according to claim 1 , wherein a surface of the adhesive and of the dielectric layer are formed aligned with one another between the burls, so that the gap spacing is formed between the burls support plane and a surface of the adhesive and the dielectric layer.

3. The holding apparatus according to claim 1 , wherein the adhesive comprises at least one of benzocyclobutene, prepolymerized benzocyclobutene, a parylene plastics material, a polyimide plastics material and a polyethylene terephthalate plastics material.

4. The holding apparatus according to claim 1 , wherein the electrode layer is separated from the openings by insulation sections.

5. The holding apparatus according to claim 1 , wherein the base body plate comprises SiSiC or SSiC ceramic material.

6. The holding apparatus according to claim 1 , wherein the burls are integrally connected to the base body plate.

7. The holding apparatus according to claim 1 , wherein the electrode layer comprises a metal, a metal alloy, a semiconductor material or an electrically conductive ceramic material.

8. The holding apparatus according to claim 7 , wherein the electrode layer comprises at least one of chromium, titanium and aluminum.

9. The holding apparatus according to claim 1 , being configured for the electrostatic holding of a semiconductor wafer.

10. A method for producing a holding apparatus configured for electrostatic holding of a component, comprising the steps:

producing a base body which has at least one base body plate and a plurality of protruding burls which are arranged on an upper side of the at least one base body plate and end faces of which generate a burls support plane for supporting the component,

producing an electrode device which comprises a layered structure of an insulator layer and a dielectric layer with an electrode layer which is arranged between the insulator layer and the dielectric layer, wherein the electrode device has openings for receiving the burls, and

connecting the electrode device to the base body, wherein burls protrude through the openings in the electrode device, wherein the method further comprises the steps:

producing a composite from an insulator disk, which is provided for the formation of the insulator layer, and a dielectric disk which is provided for the formation of the dielectric layer, with the electrode layer arranged between the insulator disk and the dielectric disk, with a deepening of depressions through the insulator disk as far as into the dielectric layer, wherein the depressions are provided for forming the openings,

applying an adhesive onto the upper side of at least one of the at least one base body plate and the insulator disk,

placing the composite of the dielectric disk and the insulator disk onto the base body so that the burls protrude into the depressions through the insulator disk, and the dielectric disk lies in the depressions on the end faces of the burls, with a joining of the dielectric disk and the insulator disk to the base body, and

thinning of the dielectric disk in order to form the dielectric layer, wherein

the electrode device is embedded in the adhesive and in the openings a spacing between the burls and the electrode device is filled with the adhesive.

11. The method according to claim 10 , wherein the production of the composite of the insulator disk and the dielectric disk comprises the steps:

joining the insulator disk and the dielectric disk to the electrode layer arranged therebetween, and

thinning the insulator disk in order to form the insulator layer.

12. The method according to claim 10 , further comprising the step of converting the electrode layer in the surroundings of the openings into insulation sections, so that the electrode layer is electrically insulated from the openings by the insulation sections.

13. The method according to claim 10 , wherein the thinning of the dielectric disk comprises:

thinning the dielectric disk by lapping and polishing until the end faces of the burls are uncovered, and

further thinning the dielectric disk by etching until a pre-determined gap spacing is formed between the burls support plane and the surface of the dielectric layer.

14. The method according to claim 13 , further comprising the step of removing material from the adhesive in the spacing between the burls and the electrode device until surfaces of the adhesive and of the dielectric layer are formed aligned with one another between the burls.

15. The method according to claim 10 , wherein a holding apparatus is produced which is configured for the electrostatic holding of a semiconductor wafer.