Semiconductor module and method of manufacturing semiconductor module
A semiconductor module includes: a semiconductor device; a bonding layer that is arranged on the semiconductor device, contains nickel or copper, and is electrically connected to the semiconductor device; a solder portion containing gold, disposed on the bonding layer; and a protective layer disposed directly on the bonding layer, covering an outer peripheral edge of the bonding layer.
1. A semiconductor module, comprising:
a semiconductor device;
a bonding layer that is arranged on the semiconductor device, and contains nickel or copper, an entire back surface of the bonding layer being electrically connected to and in direct contact with an electrode in the semiconductor device;
a solder portion containing gold, disposed on the bonding layer; and
a protective layer disposed directly on a top surface of a peripheral portion of the bonding layer on which the solder portion is absent, covering an outer peripheral edge of the bonding layer,
wherein the protective layer contains polyimide or polyamide.
2. The semiconductor module according to claim 1 , wherein an outer peripheral edge of the solder portion coincides with an inner peripheral edge of the protective layer.
3. The semiconductor module according to claim 1 , wherein an outer peripheral edge of the solder portion is positioned further inwards than an inner peripheral edge of the protective layer.
4. The semiconductor module according to claim 3 , wherein between the outer peripheral edge of the solder portion and the inner peripheral edge of the protective layer, the bonding layer is exposed.
5. The semiconductor module according to claim 1 , wherein an arithmetic average roughness of a surface of a portion of the bonding layer on which the protective layer is disposed is greater than or equal to 1 μm and less than or equal to 6 μm.
6. The semiconductor module according to claim 2 , wherein an arithmetic average roughness of a surface of a portion of the bonding layer on which the protective layer is disposed is greater than or equal to 1 μm and less than or equal to 6 μm.
7. The semiconductor module according to claim 3 , wherein an arithmetic average roughness of a surface of a portion of the bonding layer on which the protective layer is disposed is greater than or equal to 1 μm and less than or equal to 6 μm.
8. The semiconductor module according to claim 4 , wherein an arithmetic average roughness of a surface of a portion of the bonding layer on which the protective layer is disposed is greater than or equal to 1 μm and less than or equal to 6 μm.