Pump and probe type second harmonic generation metrology
Various approaches to can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation.
1. An optical interrogation apparatus comprising:
a pump optical source configured to emit pumping radiation to be directed onto a semiconductor wafer;
a probe optical source configured to emit probing radiation with variable energy to be directed onto said wafer;
an optical detector configured to detect a Second Harmonic Generation (SHG) effect signal at a first location and a second location generated by at least one of the pumping radiation and the probing radiation; and
electronics configured to:
cause the probe optical source to provide probing radiation to a first location on the wafer;
cause raster scanning of the probing radiation or the wafer to cause the probe optical source to provide probing radiation to a second location on the wafer; and
detect a region where the SHG effect signal changes when the wavelength of the pumping radiation is varied to determine a threshold injection carrier energy.
2. The optical interrogation apparatus of claim 1 , wherein the pumping radiation has an average optical power greater than about 100 mW.
3. The optical interrogation apparatus of claim 1 , wherein the pumping radiation has an average optical power less than about 10 W.
4. The optical interrogation apparatus of claim 1 , wherein the pumping radiation has a wavelength between about 80 nm and about 1000 nm.
5. The optical interrogation apparatus of claim 1 , wherein the probing radiation has an average optical power less than about 150 mW.
6. The optical interrogation apparatus of claim 1 , wherein the probing radiation has a peak optical power greater than about 10 kW.
7. The optical interrogation apparatus of claim 1 , wherein the probing radiation has a peak optical power less than about 1 GW.
8. The optical interrogation apparatus of claim 1 , wherein the probing radiation has a wavelength between about 100 nm to 2000 nm.
9. The optical interrogation apparatus of claim 1 , wherein the pump optical source comprises a UV flash lamp or a pulsed laser.
10. The optical interrogation apparatus of claim 1 , wherein said change comprises an increase in the second harmonic generated light as the energy of pumping radiation is increased.
11. The optical interrogation apparatus of claim 1 , wherein the electronics is configured such that a region where the SHG effect signal changes in slope when the wavelength of the pumping radiation is varied is detected to determine a threshold injection carrier energy.
12. The optical interrogation apparatus of claim 11 , wherein said change comprises an increase in slope of the second harmonic generated light as the energy of pumping radiation is increased.
13. The optical interrogation apparatus of claim 1 , wherein the electronics is configured to detect a region where the SHG effect signal suddenly changes when the wavelength of the pumping radiation is varied to determine a threshold injection carrier energy.
14. The optical interrogation apparatus of claim 13 , wherein said sudden change comprises an increase in the second harmonic generated light as the energy of pumping radiation is increased.
15. The optical interrogation apparatus of claim 1 , wherein the electronics is configured such that a region where the SHG effect signal suddenly changes in slope when the wavelength of the pumping radiation is varied is detected to determine a threshold injection carrier energy.
16. The optical interrogation apparatus of claim 15 , wherein said sudden change comprises an increase in slope of the second harmonic generated light as the energy of pumping radiation is increased.