IP Library Granted Patent US 11,335,840
Granted Patent B2
US 11,335,840 · App. 16/853,307 · Granted May 17, 2022

Optical semiconductor device package, optical semiconductor device, and manufacturing method for optical semiconductor device package

Inventors: Takahiro Fukunaga (Kyoto, JP); Akinobu Kittaka (Osaka, JP)
Assignee: PANASONIC INTEILECTUAL PROPERTY MANAGEMENT CO., LTD.
H01L33/60H01L33/005H01L2933/0058
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,335,840
App. No.
16/853,307
Granted
May 17, 2022
Kind
B2
Abstract

An optical semiconductor device package includes a circuit board in which a first metal, a second metal, and a third metal are sequentially stacked in an optical semiconductor element mounting region. The first metal has a first standard electrode potential. The second metal is disposed on a portion of an upper surface of the first metal and has a second standard electrode potential that is greater than the first standard electrode potential. The third metal is disposed on the upper surface of the first metal and an upper surface of the second metal and has a third standard electrode potential that is greater than the first standard electrode potential and less than the second standard electrode potential.

Claims (24)

1. An optical semiconductor device package for mounting an optical semiconductor element, the optical semiconductor device package comprising:

a circuit board; and

a wall which is disposed on the circuit board, encloses an outer periphery of a region on the circuit board in which the optical semiconductor element is to be mounted, and includes a white pigment, wherein

the circuit board includes:

a first metal having a first standard electrode potential;

a second metal which is disposed on a portion of an upper surface of the first metal, and has a second standard electrode potential that is greater than the first standard electrode potential; and

a third metal which is stacked on the upper surface of the first metal and an upper surface of the second metal, and has a third standard electrode potential that is greater than the first standard electrode potential and less than the second standard electrode potential, and

the second metal is disposed exclusively on the portion of the upper surface of the first metal, and

the third metal is stacked to be in direct contact with the upper surface of the first metal and the upper surface of the second metal.

2. The optical semiconductor device package according to claim 1 , wherein the white pigment includes titanium oxide.

3. The optical semiconductor device package according to claim 1 , wherein the second metal is disposed between the first metal and the third metal in a stacking direction.

4. The optical semiconductor device package according to claim 1 , wherein the first metal includes copper or a copper alloy.

5. The optical semiconductor device package according to claim 1 , wherein the second metal includes palladium or a palladium alloy.

6. The optical semiconductor device package according to claim 1 , wherein an area of a boundary surface between the first metal and the third metal is smaller than an area of a boundary surface between the first metal and the second metal.

7. The optical semiconductor device package according to claim 1 , wherein the first metal is disposed below the wall.

8. An optical semiconductor device, comprising:

an optical semiconductor element; and

the optical semiconductor device package according to claim 1 on which the optical semiconductor element is mounted.

9. A manufacturing method for an optical semiconductor device package for mounting an optical semiconductor element, the manufacturing method comprising:

preparing a first metal having a first standard electrode potential;

forming a second metal on a portion of an upper surface of the first metal, the second metal having a second standard electrode potential that is greater than the first standard electrode potential; and

forming a third metal on the upper surface of the first metal and an upper surface of the second metal, the third metal having a third standard electrode potential that is greater than the first standard electrode potential and less than the second standard electrode potential,

wherein in the forming of the second metal, the second metal is formed exclusively on the portion of the upper surface of the first metal, and

in the forming of the third metal, the third metal is formed to be in direct contact with the upper surface of the first metal and the upper surface of the second metal.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2022
From: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
To: PANASONIC HOLDINGS CORPORATION
Reel/Frame 060944/0789 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 28, 2020
From: FUKUNAGA, TAKAHIRO; KITTAKA, AKINOBU
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 053334/0363 →