Neuron device using spontaneous polarization switching principle
A neuron device is described. The neuron device is based on spontaneous polarization switching which includes a plurality of gate electrodes, a plurality of drain electrodes, a plurality of source lines, a dielectric layer, and a semiconductor layer. The gate electrodes are arranged parallel to each other. The drain electrodes are arranged parallel to each other. The source lines are arranged between the gate electrodes and the drain electrodes and parallel to each other. The dielectric layer is formed at intersections between the gate electrodes and the source lines. The semiconductor layer is formed at intersections between the drain electrodes and the source electrodes. The drain electrodes function as synapse-after-neuron linking terminals. The gate electrodes adjust an arrangement direction of electrical dipoles of the dielectric layer to control a firing time point and a firing height of the neuron device.
1. A neuron device comprising:
a plurality of gate electrodes extending parallel to each other in a first direction and separated from each other in a second direction perpendicular to the first direction;
a plurality of drain electrodes extending parallel to each other in the first direction and separated from each other in the second direction;
a plurality of source lines arranged separate from and between the plurality of gate electrodes and the plurality of drain electrodes in a third direction perpendicular to the first direction and the second direction, extending parallel to each other in the second direction, and separated from each other in the first direction, wherein each of the plurality of source lines intersects each of the plurality of gate electrodes and each of the plurality of drain electrodes in a plan view from above the plurality of gate;
a dielectric layer formed between the plurality of gate electrodes and the plurality of source lines in the third direction at a plurality of intersections between the plurality of gate electrodes and the plurality of source lines; and
a semiconductor layer formed between the plurality of drain electrodes and the plurality of source lines in the third direction at a plurality of intersections between the plurality of drain electrodes and the plurality of source lines.
2. The neuron device of claim 1 , wherein the gate electrodes are located in a lower portion of the neuron device,
the drain electrodes are located in an upper portion of the neuron device, and
the dielectric layer, the source lines, and the semiconductor layer are sequentially stacked on top surfaces of the gate electrodes.
3. The neuron device of claim 1 , wherein the drain electrodes are located in a lower portion of the neuron device, and the gate electrodes are located in an upper portion of the neuron device, and
the semiconductor layer, the source lines, and the dielectric layer are sequentially stacked on top surfaces of the drain electrodes.
4. The neuron device of claim 1 , further comprising a controller configured to compare an output voltage output by the drain electrodes based on an input voltage signal applied to the source lines with a threshold value and control a voltage to be applied to the gate electrodes,
wherein, when the output voltage is equal to or greater than the threshold value, the controller applies a reset voltage to the gate electrodes such that an arrangement direction of electrical dipoles of the dielectric layer is switched in an opposite direction.
5. The neuron device of claim 4 , wherein the controller controls the firing time point and the firing height of the neuron device using a high current that is instantaneously generated by applying a constant input voltage pulse.
6. The neuron device of claim 1 , wherein the dielectric layer comprises a perovskite structure, a polymer material, or an oxide film.