Mitigating leaks in membranes
Two-dimensional material based filters, their method of manufacture, and their use are disclosed. In one embodiment, a membrane may include an active layer including a plurality of defects and a deposited material associated with the plurality of defects may reduce flow therethrough. Additionally, a majority of the active layer may be free from the material. In another embodiment, a membrane may include a porous substrate and an atomic layer deposited material disposed on a surface of the porous substrate. The atomic layer deposited material may be less hydrophilic than the porous substrate and an atomically thin active layer may be disposed on the atomic layer deposited material.
1. An article comprising:
an atomically thin layer including a plurality of defects; and
a material deposited on the plurality of defects, wherein a majority of a surface of the atomically thin layer is free from the material, and wherein the material is retained in the article during use.
2. The article of claim 1 , wherein the atomically thin layer comprises a plurality of atomically thin layers.
3. The article of claim 1 , wherein the deposited material comprises a molecule, wherein a size of the molecule is less than a size of the plurality of defects.
4. The article of claim 1 , wherein the deposited material is a stoichiometric material.
5. The article of claim 1 , wherein the deposited material comprises at least two molecules bound together, each of which comprises a first portion that is too large to pass through at least a portion of the plurality of defects and a second portion which is capable of passing through at least the portion of the plurality of defects.
6. The article of claim 1 , wherein the deposited material comprises at least one of a polyamide, calcium sulfate, calcium carbonate, zinc carbonate, polyaniline, polypyrrole, and poly(lactic acid).
7. The article of claim 1 , wherein the atomically thin layer comprises at least one of graphene, hexagonal boron nitride, molybdenum sulfide, vanadium pentoxide, silicon, doped-graphene, graphene oxide, hydrogenated graphene, fluorinated graphene, a covalent organic framework, a layered transition metal dichalcogenide, a layered Group-IV and Group-III metal chalcogenide, silicene, germanene, and a layered binary compound of a Group IV element and a Group III-V element.
8. A method of forming an article, the method comprising:
depositing a material on a plurality of defects in an atomically thin layer, wherein a majority of a surface of the atomically thin layer is free from the material, wherein the material is retained in the article during use.
9. The method of claim 8 , wherein depositing the material further comprises depositing the material in the plurality of defects.
10. The method of claim 8 , wherein depositing the material comprises reacting a first reactant in a first phase with a second reactant in a second phase to deposit the material.
11. The method of claim 10 , wherein depositing the material comprises sequentially exposing the atomically thin layer to the first phase and the second phase.
12. The method of claim 10 , wherein the first phase comprises at least one of a liquid and a gas and the second phase comprises at least one of a liquid and a gas.
13. The method of claim 10 , wherein the first phase and the second phase are immiscible.
14. The method of claim 10 , wherein reacting the first reactant in the first phase with the second reactant in the second phase comprises reacting the first reactant in the first phase with the second reactant in the second phase at an interface between the first phase and the second phase.
15. The method of claim 10 , wherein at least one of the first reactant and the second reactant comprises a molecule, wherein a size of the molecule is less than a size of the plurality of defects.
16. The method of claim 8 , wherein the atomically thin layer comprises a plurality of atomically thin layers.
17. The method of claim 8 , wherein the atomically thin layer comprises at least one of graphene, hexagonal boron nitride, molybdenum sulfide, vanadium pentoxide, silicon, doped-graphene, graphene oxide, hydrogenated graphene, fluorinated graphene, a covalent organic framework, a layered transition metal dichalcogenide, a layered Group-IV and Group-III metal chalcogenide, silicene, germanene, and a layered binary compound of a Group IV element and a Group III-V element.
18. An article comprising:
an atomically thin layer including a plurality of defects; and
a material deposited in the plurality of defects, wherein a majority of a surface of the atomically thin layer is free from the material, and wherein the material is retained in the article during use.
19. The article of claim 18 , wherein the atomically thin layer comprises a plurality of atomically thin layers.
20. The article of claim 18 , wherein the deposited material comprises a molecule, wherein a size of the molecule is less than a size of the plurality of defects.
21. The article of claim 18 , wherein the deposited material is a stoichiometric material.
22. The article of claim 18 , wherein the deposited material comprises at least two molecules bound together, each of which comprises a first portion that is too large to pass through at least a portion of the plurality of defects and a second portion which is capable of passing through at least the portion of the plurality of defects.
23. The article of claim 18 , wherein the deposited material comprises at least one of a polyamide, calcium sulfate, calcium carbonate, zinc carbonate, polyaniline, polypyrrole, and poly(lactic acid).
24. The article of claim 18 , wherein the atomically thin layer comprises at least one of graphene, hexagonal boron nitride, molybdenum sulfide, vanadium pentoxide, silicon, doped-graphene, graphene oxide, hydrogenated graphene, fluorinated graphene, a covalent organic framework, a layered transition metal dichalcogenide, a layered Group-IV and Group-III metal chalcogenide, silicene, germanene, and a layered binary compound of a Group IV element and a Group III-V element.
25. A method of forming an article, the method comprising:
depositing a material in a plurality of defects in an atomically thin layer, wherein a majority of a surface of the atomically thin layer is free from the material, wherein the material is retained in the article during use.
26. The method of claim 25 , wherein depositing the material comprises reacting a first reactant in a first phase with a second reactant in a second phase to deposit the material.
27. The method of claim 26 , wherein the first phase comprises at least one of a liquid and a gas and the second phase comprises at least one of a liquid and a gas.
28. The method of claim 26 , wherein the first phase and the second phase are immiscible.
29. The method of claim 26 , wherein the first phase is located on a first side of the atomically thin layer, wherein the second phase is located on a second side of the atomically thin layer, and wherein an interface between the first phase and the second phase is located within the atomically thin layer.
30. The method of claim 26 , wherein depositing the material comprises sequentially exposing the atomically thin layer to the first phase and the second phase.
31. The method of claim 26 , wherein at least one of the first reactant and the second reactant comprises a molecule, wherein a size of the molecule is less than a size of the plurality of defects.
32. The method of claim 25 , wherein the atomically thin layer comprises a plurality of atomically thin layers.
33. The method of claim 25 , wherein depositing the material further comprises binding at least two molecules located on opposing sides of the atomically thin layer, wherein each of which comprises a first portion which is too large to pass through at least a portion of the plurality of defects and a second portion which is capable of passing through at least the portion of the plurality of defects.
34. The method of claim 25 , wherein the atomically thin layer comprises at least one of graphene, hexagonal boron nitride, molybdenum sulfide, vanadium pentoxide, silicon, doped-graphene, graphene oxide, hydrogenated graphene, fluorinated graphene, a covalent organic framework, a layered transition metal dichalcogenide, a layered Group-IV and Group-III metal chalcogenide, silicene, germanene, and a layered binary compound of a Group IV element and a Group III-V element.