IP Library Granted Patent US 11,063,214
Granted Patent B2
US 11,063,214 · App. 16/864,051 · Granted Jul 13, 2021

Two-terminal reversibly switchable memory device

Inventors: Darrell Rinerson (Cupertino, CA); Christophe J. Chevallier (Palo Alto, CA); Wayne Kinney (Emmett, ID); Roy Lambertson (Los Altos, CA); John E. Sanchez, Jr. (Palo Alto, CA); Lawrence Schloss (Palo Alto, CA); Philip Swab (Santa Rosa, CA); Edmond Ward (Monte Sereno, CA)
Assignee: Hefei Reliance Memory Limited
H01L45/08G06F30/30G11C11/5685G11C13/004G11C13/0007G11C13/0009G11C13/0069H01L27/2436H01L27/2481H01L45/085H01L45/1233H01L45/1246H01L45/1253H01L45/146H01L45/147H01L45/1625G11C2013/005G11C2013/009G11C2013/0045G11C2213/11G11C2213/31G11C2213/32G11C2213/53G11C2213/54G11C2213/56G11C2213/71G11C2213/79
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Quick Facts
Patent No.
US 11,063,214
App. No.
16/864,051
Granted
Jul 13, 2021
Kind
B2
Abstract

A memory using mixed valence conductive oxides is disclosed. The memory includes a mixed valence conductive oxide that is less conductive in its oxygen deficient state and a mixed electronic ionic conductor that is an electrolyte to oxygen and promotes an electric filed to cause oxygen ionic motion.

Claims (34)

1. A multi-resistive state element comprising:

a conductive element;

a reactive metal that reacts with the conductive element; and

an oxygen repository;

wherein the multi-resistive state element is operable to:

change from a high resistive state to a low resistive state upon application of a first write voltage, and

change from a low resistive state to a high resistive state upon application of a second write voltage.

2. The multi-resistive state element of claim 1 , wherein the reactive metal has fully reacted with the conductive element.

3. The multi-resistive state element of claim 1 , wherein the multi-resistive state element can be exposed to a range of voltages without disturbing a resistive state of the multi-resistive state element.

4. The multi-resistive state element of claim 1 , wherein the multi-resistive state element is substantially non-conductive over a range of voltages from V NO− to V NO+ .

5. The multi-resistive state element of claim 4 , wherein the conductive element comprises manganite perovskite.

6. The multi-resistive state element of claim 5 , wherein the manganite perovskite is a PCMO.

7. The multi-resistive state element of claim 6 , wherein the reactive metal comprises Al, Ti, Mg, W, Fe, Cr, Vn, Zn, Ta or Mo.

8. The multi-resistive state element of claim 7 , wherein the reactive metal is Al.

9. The multi-resistive state element of claim 7 , comprising 10-100 Angstroms of Al deposited on the PCMO.

10. The multi-resistive state element of claim 9 , comprising 25-50 Angstroms of Al deposited on the PCMO.

11. A memory array comprising a plurality of three-terminal memory elements, wherein each of the three-terminal memory elements comprises:

a multi-resistive state element comprising:

a conductive element,

a reactive metal that reacts with the conductive element, and

an oxygen repository;

wherein the multi-resistive state element is operable to:

change from a high resistive state to a low resistive state upon application of a first write voltage, and

change from a low resistive state to a high resistive state upon application of a second write voltage; and

a transistor coupled with the multi-resistive state element.

12. The memory array of claim 11 , wherein the reactive metal has fully reacted with the conductive element in each of the multi-resistive state elements.

13. The memory array of claim 11 , wherein each multi-resistive state element can be exposed to a range of voltages without disturbing a resistive state of the multi-resistive state element.

14. The memory array of claim 11 , wherein each multi-resistive state element is substantially non-conductive over a range of voltages from V NO− to V NO+ .

15. The memory array of claim 14 , wherein the conductive element comprises manganite perovskite.

16. The memory array of claim 15 , wherein the manganite perovskite is a PCMO.

17. The memory array of claim 16 , wherein the reactive metal comprises Al, Ti, Mg, W, Fe, Cr, Vn, Zn, Ta or Mo.

18. The memory array of claim 17 , wherein the reactive metal is Al.

19. The memory array of claim 17 , comprising 10-100 Angstroms of Al deposited on the PCMO.

20. The memory array of claim 19 , comprising 25-50 Angstroms of Al deposited on the PCMO.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2020
From: RAMBUS INC.
To: HEFEI RELIANCE MEMORY LIMITED
Reel/Frame 052543/0583 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2020
From: RINERSON, DARRELL; CHEVALLIER, CHRISTOPHE J.; LAMBERTSON, ROY; KINNEY, WAYNE; SANCHEZ, JOHN E., JR.; SCHLOSS, LAWRENCE; SWAB, PHILIP F.S.; WARD, EDMOND R.
To: UNITY SEMICONDUCTOR CORPORATION
Reel/Frame 052546/0289 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2020
From: UNITY SEMICONDUCTOR CORPORATION
To: HEFEI RELIANCE MEMORY LIMITED
Reel/Frame 052546/0398 →
Continuity (9)
Continuation 16262841 · Jan 30, 2019
Continuation 15797452 · Oct 30, 2017
Continuation 14844805 · Sep 3, 2015
Continuation 14463518 · Aug 19, 2014
Continuation 12456627 · Jun 18, 2009
Continuation 11095026 · Mar 30, 2005
Continuation In Part 10934951 · Sep 3, 2004
Continuation In Part 10773549 · Feb 6, 2004
Related Publication 20200259079A1 · Aug 13, 2020