Quartz crystal microbalance concentration monitor
Describe is a quartz crystal microbalance (QCM) device mounted within a heated sample chamber. The sample chamber temperature is maintained about 10° C. to about 30° C. greater than the temperature of the precursor vessel. The sample chamber is connected to the precursor delivery line and includes a high temperature valve and a flow pathway to foreline with a high temperature valve to permit removal of excess material. The QCM device includes a heater and gas cooling channel allowing the device to be maintained at a temperature about 10° C. to about 30° C. less than the temperature of the precursor vessel.
1. A processing system comprising:
a carrier gas source;
a precursor vessel;
a deposition chamber; and
a sample chamber downstream of the precursor vessel and upstream of the deposition chamber, the sample chamber housing a quartz crystal microbalance (QCM) device.
2. The processing system of claim 1 , wherein the deposition chamber is selected from one or more of an atomic layer deposition (ALD) chamber, or a chemical vapor deposition (CVD) chamber.
3. The processing system of claim 1 , further comprising a heater and a gas cooling channel within the sample chamber.
4. The processing system of claim 1 , wherein the carrier gas source comprises a carrier gas selected from one or more of argon (Ar), helium (He), xenon (Xe), hydrogen (H 2 ), and nitrogen (N 2 ).
5. The processing system of claim 1 , wherein the quartz crystal microbalance (QCM) device comprises one or more of a sensor head, a crystal holder, a crystal, a feedthrough, an oscillator, and a frequency counter.
6. The processing system of claim 5 , wherein the crystal comprises one or more of an AT crystal or a RC crystal.
7. The processing system of claim 5 , comprising a range of from 1 to 24 crystals.
8. The processing system of claim 1 , further comprising a controller.
9. The processing system of claim 8 , wherein the controller comprises one or more of a central processing unit (CPU), a memory, circuits, and an input/output.
10. The processing system of claim 1 , further comprising a purge gas source and a reservoir, the reservoir downstream of the precursor vessel and the sample chamber and upstream of the deposition chamber.
11. The processing system of claim 10 , wherein the purge gas source comprises a purge gas selected from one or more of argon (Ar), helium (He), xenon (Xe), hydrogen (H 2 ), and nitrogen (N 2 ).
12. The processing system of claim 1 , wherein the precursor vessel is an ampoule.
13. The processing system of claim 1 , wherein the precursor vessel contains a precursor selected from one or more of a solid precursor or a liquid precursor.
14. A processing method comprising:
heating a vessel containing a chemical precursor to a temperature in a range of from about 10° C. to about 600° C., the vessel having a first precursor concentration;
flowing a carrier gas through the vessel to form a precursor gas comprising the chemical precursor;
measuring a concentration of the chemical precursor within the precursor gas using a quartz crystal microbalance (QCM) device within a sample chamber, the chemical precursor having a second precursor concentration, and the sample chamber having a temperature in a range of from about 10° C. to about 30° C. greater than the temperature of the vessel;
exposing a substrate to the precursor gas during a deposition process; and
depositing a film on the substrate.
15. The processing method of claim 14 , wherein heating the vessel vaporizes the chemical precursor.
16. The processing method of claim 14 , wherein the quartz crystal microbalance (QCM) device has a temperature in a range of from about 10° C. to about 15° C. less than the temperature of the vessel.
17. The processing method of claim 14 , wherein the measuring the concentration of the chemical precursor within the precursor gas is conducted in a time frame of about 50 milliseconds to about 20 seconds.
18. A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing system, causes the processing system to perform operations of:
heat a vessel containing a chemical precursor to a temperature in a range of from about 25° C. to about 600° C.;
flow a carrier gas through the vessel to form a precursor gas comprising the chemical precursor;
measure a concentration of the chemical precursor within the precursor gas using a quartz crystal microbalance (QCM) within a sample chamber, the sample chamber having a temperature in a range of from about 10° C. to about 30° C. greater than the temperature of the vessel;
expose a substrate to the precursor gas during a deposition process; and
deposit a film on the substrate.
19. The non-transitory computer readable medium of claim 18 , wherein the quartz crystal microbalance (QCM) device has a temperature in a range of from about 10° C. to about 30° C. less than the temperature of the vessel.
20. The non-transitory computer readable medium of claim 19 , wherein the measuring the concentration of the chemical precursor within the precursor gas is conducted in a time frame of less than about 100 milliseconds.