Doping of metal barrier layers

1. A method for forming a doped barrier layer, the method comprising:

forming a first barrier film on a dielectric layer on a substrate by atomic layer deposition, the first barrier film having a thickness in a range of from 2 Å to 10 Å;

doping the first barrier film with a dopant metal by exposing the first barrier film to a metal precursor during a flash chemical vapor deposition process to form a doped first barrier film having a thickness in a range of from 1 Å to 3 Å and comprising from 10 wt. % to 30 wt. % dopant metal, wherein the dopant metal diffuses through the first barrier film to the dielectric layer and forms a complex with the dielectric layer; and

forming a second barrier film having a thickness in a range of from 2 Å to 6 Å on the doped first barrier film by atomic layer deposition to form a doped barrier layer, the doped barrier layer having a combined thickness in a range of from 5 Å to 15 Å.

2. The method of claim 1 , wherein the first barrier film and the second barrier film independently comprise one or more of tantalum (Ta), tantalum nitride (TaN), tantalum carbide (TaC), niobium (Nb), niobium nitride (NbN), manganese (Mn), manganese nitride (MnN), titanium (Ti), titanium nitride (TiN), molybdenum (Mo), and molybdenum nitride (MoN), and the like.

3. The method of claim 1 , wherein the dopant metal comprises one or more of one or more of ruthenium (Ru), manganese (Mn), niobium (Nb), cobalt (Co), vanadium (V), copper (Cu), aluminum (Al), carbon (C), oxygen (O), silicon (Si), molybdenum (Mo) and the like.

4. The method of claim 1 , wherein the first barrier film and the second barrier film comprise tantalum nitride (TaN), and the dopant metal comprises ruthenium (Ru).

5. The method of claim 4 , wherein the dopant metal forms an intermetallic compound with the first barrier film and the second barrier film, the intermetallic compound having a formula of Ta x Ru y N or Ta x Ru y N x O.

6. The method of claim 1 , further comprising exposing the doped barrier layer to one or more of plasma treatment, physical vapor deposition (PVD) treatment, thermal anneal, and chemical enhancement after doping.

7. The method of claim 1 , wherein the substrate comprises at least one feature.

8. The method of claim 6 , wherein the at least one feature has an aspect ratio greater than or equal to about 10:1.

9. The method of claim 1 , wherein one or more of the first barrier film or the second barrier film are deposited at a temperature in a range of from 250° C. to 275° C.

10. A method of forming a doped metal nitride layer, the method comprising:

exposing a substrate to a first metal precursor and ammonia to form a first metal nitride film on the substrate, the substrate comprising a dielectric layer having at least one feature, the first metal nitride film having a thickness in a range of from 2 Å to 10 Å;

doping the first metal nitride film with a dopant metal by exposing the first metal nitride film to a dopant metal precursor during a flash chemical vapor deposition process to form a doped first metal nitride film having a thickness in a range of from 1 Å to 3 Å and comprising from 10 wt. % to 30 wt. % dopant metal, wherein the dopant metal diffuses through the first metal nitride film to the dielectric layer and forms a complex with the dielectric layer; and

exposing the substrate to the first metal precursor and ammonia to form a second metal nitride film on the doped first metal nitride film to form a doped metal nitride layer, the doped metal nitride layer having a combined thickness in a range of from 5 Å to 15 Å.

11. The method of claim 10 , wherein the first metal nitride film and the second metal nitride film independently comprise one or more of tantalum nitride (TaN), niobium nitride (NbN), manganese nitride (MnN), titanium nitride (TiN), molybdenum (Mo), and molybdenum nitride (MoN).

12. The method of claim 10 , wherein the dopant metal comprises one or more of one or more of ruthenium (Ru), manganese (Mn), niobium (Nb), cobalt (Co), vanadium (V), copper (Cu), aluminum (Al), carbon (C), oxygen (O), silicon (Si), molybdenum (Mo), and the like.

13. The method of claim 10 , further comprising exposing the doped metal nitride layer to one or more of plasma treatment, physical vapor deposition (PVD) treatment, thermal anneal, and chemical enhancement after doping.

14. The method of claim 10 , wherein the at least one feature comprises a first sidewall, a second sidewall, and a bottom, and the first metal nitride film is substantially conformal.

15. The method of claim 14 , wherein the at least one feature has an aspect ratio greater than or equal to about 10:1.

16. The method of claim 10 , wherein the dopant metal forms an intermetallic compound with the first metal nitride film and the second metal nitride film, the intermetallic compound having a formula of Ta x Ru y N or Ta x Ru y N x O.

17. The method of claim 10 , wherein one or more of the first metal nitride film or the second metal nitride film are deposited at a temperature in a range of from 250° C. to 275° C.

18. A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing system, causes the processing system to perform operations of:

form a first barrier film on a dielectric layer on a substrate, the first barrier film having a thickness in a range of from 2 Å to 10 Å;

dope the first barrier film with a dopant metal to form a doped first barrier film having a thickness in a range of from 1 Å to 3 Å and comprising from 10 wt. % to 30 wt. % dopant metal, wherein the dopant metal diffuses through the first barrier film to the dielectric layer and forms a complex with the dielectric layer; and

form a second barrier film on the doped first barrier film to form a doped barrier layer, the doped barrier layer having a combined thickness in a range of from 5 Å to 15 Å.

19. The non-transitory computer readable medium of claim 18 , further comprising instruction that, when executed by a controller of a processing system, causes the processing system to perform operations of: expose the doped barrier layer to one or more of plasma treatment, physical vapor deposition (PVD) treatment, thermal anneal, and chemical enhancement after doping.

20. The method of claim 18 , wherein one or more of the first barrier film or the second barrier film are deposited at a temperature in a range of from 250° C. to 275° C.