Showerhead with inlet mixer

1. A gas distribution apparatus comprising:

a showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region;

a first inlet in fluid communication with the center region of the gas volume, the inlet having an inside and an outside;

a mixer disposed on the inside of the first inlet to increase gas flow temperature; and

optionally, a second inlet in fluid communication with the first inlet, the second inlet substantially perpendicular to the first inlet.

2. The apparatus of claim 1 , wherein the mixer is located at an entrance of the inside of the first inlet.

3. The apparatus of claim 1 , wherein the back plate of the showerhead is angled toward the front plate at the outer region of the gas volume to form a funnel shape.

4. The apparatus of claim 3 , wherein the first inlet creates a vortex spiraling outward from the center region to the outer region of the gas volume.

5. The apparatus of claim 3 , wherein the front plate is connected to an RF power source.

6. The apparatus of claim 1 , wherein the showerhead further comprises at least one sidewall connecting the front plate to the back plate and defining an outer peripheral edge of the outer region of the gas volume.

7. The apparatus of claim 6 , wherein the at least one sidewall is an insulator to electrically separate the front plate from the back plate.

8. The apparatus of claim 7 , wherein one of the front plate and the back plate is connected to an RF power source and the other of the front plate and the back plate is connected to electrical ground to generate a plasma within the gas volume.

9. The apparatus of claim 1 , wherein the mixer is disposed on the inside of the first inlet at some point between the entrance of the first inlet and about the top of the back plate of the showerhead.

10. A processing chamber apparatus comprising:

a chamber body having a top wall, bottom wall and at least one sidewall defining a processing volume;

a showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region, a first inlet in fluid communication with the center region of the gas volume, the first inlet having an inside and an outside, a mixer disposed on the inside of the inlet to increase gas flow temperature, and, optionally, a second inlet in fluid communication with the first inlet, the second inlet substantially perpendicular to the first inlet; and

a substrate support spaced a distance from the front plate of the showerhead.

11. The apparatus of claim 10 , wherein the mixer is located at an entrance of the inside of the first inlet.

12. The apparatus of claim 10 , wherein the back plate of the showerhead is angled toward the front plate at the outer region of the gas volume to form a funnel shape.

13. The apparatus of claim 12 , wherein the first inlet creates a vortex spiraling outward from the center region to the outer region of the gas volume.

14. The apparatus of claim 12 , wherein the front plate is connected to an RF power source.

15. The apparatus of claim 10 , wherein the showerhead further comprises at least one sidewall connecting the front plate to the back plate and defining an outer peripheral edge of the outer region of the gas volume.

16. The apparatus of claim 15 , wherein the at least one sidewall of the showerhead is an insulator to electrically separate the front plate from the back plate.

17. The apparatus of claim 16 , wherein one of the front plate and the back plate is connected to an RF power source and the other of the front plate and the back plate is connected to electrical ground to generate a plasma within the gas volume.

18. The apparatus of claim 10 , wherein the substrate support comprises a heater.

19. The apparatus of claim 10 , wherein the apparatus comprises a chemical vapor deposition apparatus.

20. A method of depositing a film on a substrate, the method comprising:

flowing one or more of a precursor, an oxidant, or a reductant through a showerhead, the showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region, a first inlet in fluid communication with the center region of the gas volume, the first inlet having an inside and an outside, a mixer disposed on the inside of the first inlet to increase gas flow temperature, and a second inlet in fluid communication with the first inlet, the second inlet substantially perpendicular to the first inlet;

delivering a flow from the front plate of the showerhead to a substrate; and

forming a film on the substrate,

wherein the mixer increases a temperature of the flow without affecting the amount of time it takes to deliver the flow.