AUTOMATIC SAMPLE PREPARATION APPARATUS
A charged particle beam device ( 10 a ) includes a computer ( 21 ) which controls multiple charged particle beam irradiation optical systems, the needle ( 18 ), and a gas supply portion ( 17 ) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle ( 18 ), and the sample piece (Q) previously acquired by multiple charged particle beams.
1 . An automatic sample preparation apparatus which automatically prepares a sample piece from a sample, comprising:
a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam;
a sample stage configured to move with the sample placed thereon;
a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample;
a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred;
a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and
a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to move and stop the sample piece held by the sample piece transfer device with a gap between the sample piece and the sample piece holder, and connect the sample piece to the sample piece holder.
2 . The automatic sample preparation apparatus according to claim 1 ,
wherein the computer is configured to control the sample piece transfer device to set the gap to 1 μm or less.
3 . The automatic sample preparation apparatus according to claim 1 ,
wherein the computer is configured to control the sample piece transfer device to set the gap to 100 nm or more and 200 nm or less.
4 . The automatic sample preparation apparatus according to claim 1 ,
wherein the computer is configured to stop the formation of the deposition film in a case where the conduction between the sample piece transfer device and the sample piece holder is detected.
5 . The automatic sample preparation apparatus according to claim 1 ,
wherein the computer is configured to stop the formation of the deposition film in a case where absorption current images of the sample piece transfer device and the sample piece holder are detected.
6 . The automatic sample preparation apparatus according to claim 1 ,
wherein the computer is configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion based on an image which is acquired by the charged particle beam with respect to the sample piece held by the sample piece transfer device.
7 . An automatic sample preparation apparatus which automatically prepares a sample piece from a sample, comprising:
a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam;
a sample stage configured to move with the sample placed thereon;
a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample;
a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and
a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to move and stop the sample piece transfer device with a gap between the sample piece transfer device and the sample piece, and connect the sample piece transfer device to the sample piece.
8 . The automatic sample preparation apparatus according to claim 7 ,
wherein the computer is configured to detect the position of the sample piece transfer device according to a reference mark which is formed on the sample and image data with respect to the sample piece transfer device.
9 . The automatic sample preparation apparatus according to claim 8 ,
wherein the computer is configured to detect the position of the sample piece transfer device according to image data which is acquired from two different directions.
10 . The automatic sample preparation apparatus according to claim 7 ,
wherein the computer is configured to control the sample piece transfer device to set the gap to 1 μm or less.
11 . The automatic sample preparation apparatus according to claim 7 ,
wherein the computer is configured to control the sample piece transfer device to set the gap to 100 nm or more and 200 nm or less.
12 . The automatic sample preparation apparatus according to claim 7 ,
wherein the computer is configured to stop the formation of the deposition film by detecting variation of the absorption currents of the sample piece transfer device.
13 . The automatic sample preparation apparatus according to claim 7 ,
wherein the computer is configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion based on an image which is acquired by the charged particle beam with respect to the sample piece transfer device.