Method of fabricating hexagonal boron nitride
Disclosed herein is a method of fabricating hexagonal boron nitride in which hexagonal boron nitride is epitaxially grown. A method of fabricating hexagonal boron nitride includes placing a catalytic metal in a chamber, the catalytic metal having a hexagonal crystal structure and having a lattice mismatch of 15% or less with hexagonal boron nitride (h-BN) in a chamber; and growing hexagonal boron nitride on the catalytic metal at a temperature of 800° C. or lower while supplying a nitrogen source and a boron source into the chamber.
1. A method of fabricating hexagonal boron nitride, the method comprising:
placing a catalytic metal in a chamber, the catalytic metal having a hexagonal crystal structure and having a lattice mismatch of greater than or equal to 0% and less than or equal to 15% with hexagonal boron nitride (h-BN);
removing pollutants from a surface of the catalytic metal; and
growing hexagonal boron nitride on the catalytic metal at a temperature of 600° C. to 800° C. while supplying a nitrogen source and a boron source into the chamber,
wherein
the hexagonal boron nitride is grown directly on the catalytic metal, and
the catalytic metal includes crystals osmium (Os),
wherein the removing the pollutants from the surface of the catalytic metal includes supplying hydrogen (H 2 ) gas into the chamber and increasing a temperature in the chamber to 1,000° C.,
wherein the removing the pollutants from the surface of the catalytic metal is performed for 20 minutes while supplying the hydrogen gas at a flow rate of 100 sccm, and
wherein the growing the hexagonal boron nitride provides a grown hexagonal boron nitride with a Raman spectrum having a peak at about 1370 cm −1 and a peak at about 1450 cm −1 , and an intensity of the peak at about 1370 cm −1 is greater than an intensity of the peak at about 1450 cm −1 .
2. The method of claim 1 , wherein the catalytic metal further includes crystals of at least one of a Co—Cr alloy, a Co—N alloy, a Co—Ir alloy, and rhenium (Re).
3. The method of claim 1 , wherein
the nitrogen source and the boron source include at least one of borazine, 1,3,5-trimethylborazine, 2,4,6-trimethylborazine, aminoborane, 2,4,6-trichloroborazine, B-tri(methylamino) borazine, and ammonia borane.
4. The method of claim 1 , wherein the nitrogen source includes at least one of ammonia (NH 3 ) gas and nitrogen (N 2 ) gas.
5. The method of claim 1 , wherein the boron source includes at least one of BH 3 , BF 3 , BCl 3 , B 2 H 6 , (CH 3 CH 2 ) 3 B, and (CH 3 ) 3 B.
6. The method of claim 1 , wherein the nitrogen source and the boron source are provided by vaporizing solid boron nitride powder.
7. The method of claim 1 , wherein the growing the hexagonal boron nitride is performed by inductively coupled plasma chemical vapor deposition.
8. The method of claim 1 , wherein the growing the hexagonal boron nitride includes:
supplying hydrogen (H 2 ) gas into the chamber at a flow rate of 0 sccm to 100 sccm,
supplying argon (Ar) gas into the chamber at a flow rate of 0 sccm to 100 sccm,
supplying borazine gas into the chamber at a flow rate of 0.01 sccm to 1 sccm, and
maintaining pressure in the chamber at 0.01 Torr to 1 Torr.
9. The method of claim 1 , wherein a lattice mismatch between the catalytic metal and the hexagonal boron nitride is greater than or equal to 0% and less than or equal to 10.4%.
10. The method of claim 1 , wherein growing the grown hexagonal boron nitride and a root mean square surface roughness of the grown hexagonal boron nitride is 2 nm or less and greater than or equal to 0 nm.
11. The method of claim 10 , wherein the root mean square surface roughness of the grown hexagonal boron nitride is 1.7 nm or less and greater than or equal to 0 nm.
12. The method of claim 1 , wherein
the growing hexagonal boron nitride is performed after the removing the pollutants from the surface of the catalytic metal is performed.
13. A method of fabricating hexagonal boron nitride, the method comprising:
placing a catalytic metal in a chamber, the catalytic metal having a hexagonal crystal structure and including crystals of osmium (Os); and
directly growing hexagonal boron nitride on the catalytic metal at a temperature in a range of about 600° C. to about 800° C. while supplying a nitrogen source and a boron source into the chamber,
wherein the directly growing the hexagonal boron nitride provides a grown hexagonal boron nitride with a Raman spectrum having a peak at about 1370 cm −1 and a peak at about 1450 cm −1 , and an intensity of the peak at about 1370 cm −1 is greater than an intensity of the peak at about 1450 cm −1 .
14. The method of claim 13 , wherein the directly growing hexagonal boron nitride includes:
supplying hydrogen (H 2 ) gas into the chamber at a flow rate of 0 sccm to 100 sccm,
supplying argon (Ar) gas into the chamber at a flow rate of 0 sccm to 100 sccm,
supplying borazine gas into the chamber at a flow rate of 0.01 sccm to 1 sccm, and
maintaining pressure in the chamber at 0.01 Torr to 1 Torr.
15. The method of claim 13 , wherein the directly growing hexagonal boron nitride is performed by inductively coupled plasma chemical vapor deposition.
16. The method of claim 13 , further comprising:
removing pollutants from a surface of the catalytic metal before the growing the hexagonal boron nitride.
17. The method of claim 13 , wherein
the nitrogen source and the boron source include at least one of borazine, 1,3,5-trimethylborazine, 2,4,6-trimethylborazine, aminoborane, 2,4,6-trichloroborazine, B-tri(methylamino) borazine, and ammonia borane.
18. The method of claim 16 , wherein
the removing the pollutants from the surface of the catalytic metal includes supplying hydrogen (H 2 ) gas into the chamber and increasing a temperature in the chamber to 1,000° C.,
the removing the pollutants from the surface of the catalytic metal is performed while supplying the hydrogen gas at a flow rate of 100 sccm, and
the directly growing hexagonal boron nitride is performed after the removing the pollutants from the surface of the catalytic metal is performed.