Monolithic memory stack
Embodiments may relate to a microelectronic package that includes a first plurality of memory cells of a first type coupled with a substrate. The microelectronic package may further include a second plurality of memory cells of a second type communicatively coupled with the substrate such that the first plurality of memory cells is between the substrate and the second plurality of memory cells. Other embodiments may be described or claimed.
1. A microelectronic package, comprising:
a substrate;
a plurality of dynamic random-access memory (DRAM) cells communicatively coupled with a face of the substrate; and
a plurality of embedded DRAM (eDRAM) cells communicatively coupled with a face of the substrate, wherein the plurality of DRAM cells is between the substrate and the plurality of eDRAM cells, and wherein a pitch of the eDRAM cells is greater than a pitch of the DRAM cells.
2. The microelectronic package of claim 1 , wherein the substrate includes a periphery transistor that is communicatively coupled with a DRAM cell of the plurality of DRAM cells or an eDRAM cell of the plurality of eDRAM cells.
3. The microelectronic package of claim 1 , wherein the DRAM cells are communicatively coupled with the face of the substrate by interconnects, and wherein the pitch of the DRAM cells is between 25 nanometers (nm) and 100 nm.
4. The microelectronic package of claim 1 , wherein the eDRAM cells are communicatively coupled with the face of the substrate by interconnects, and wherein the pitch of the eDRAM cells is between 50 nanometers (nm) and 200 nm.
5. The microelectronic package of claim 1 , wherein a DRAM cell of the plurality of DRAM cells includes a capacitor and a transistor.
6. The microelectronic package of claim 1 , wherein an eDRAM cell of the plurality of eDRAM cells includes a capacitor and a transistor.
7. The microelectronic package of claim 1 , further comprising a second plurality of DRAM cells or eDRAM cells communicatively coupled with the substrate, wherein the plurality of eDRAM cells is between the second plurality of DRAM cells or eDRAM cells and the substrate.
8. A microelectronic package, comprising:
a substrate with a first complementary metal-oxide-semiconductor (CMOS) layer;
a first plurality of memory cells coupled with the substrate;
a second plurality of memory cells communicatively coupled with the substrate, wherein the first plurality of memory cells is between the second plurality of memory cells and the substrate; and
a second CMOS layer communicatively coupled with the second plurality of memory cells, wherein the second plurality of memory cells are between the second CMOS layer and the first plurality of memory cells, and wherein a pitch of the first plurality of memory cells is greater than a pitch of the second plurality of memory cells.
9. The microelectronic package of claim 8 , wherein a lateral footprint of the substrate is same as a lateral footprint of the first plurality of memory cells.
10. The microelectronic package of claim 8 , wherein the second CMOS layer includes a periphery transistor of a memory cell of the first or second plurality of memory cells.
11. The microelectronic package of claim 8 , wherein the first plurality of memory cells includes a plurality of dynamic random-access memory (DRAM) cells.
12. The microelectronic package of claim 8 , wherein the second plurality of memory cells are embedded dynamic random-access memory (eDRAM) cells.
13. The microelectronic package of claim 8 , further comprising wherein the second CMOS layer is further communicatively coupled with the first plurality of memory cells.
14. The microelectronic package of claim 8 , further comprising a third plurality of memory cells communicatively coupled with the substrate, wherein the third plurality of memory cells is between the first and second plurality of memory cells.
15. The microelectronic package of claim 1 , wherein:
an individual DRAM cell of the plurality of DRAM cells includes a capacitor and a transistor,
transistors of multiple individual DRAM cells of the plurality of DRAM cells are arranged in a first layer over the substrate, and
capacitors of multiple individual DRAM cells of the plurality of DRAM cells are arranged in a second layer over the substrate.
16. The microelectronic package of claim 15 , wherein the first layer is closer to the substrate than the second layer.
17. The microelectronic package of claim 15 , wherein:
an individual eDRAM cell of the plurality of eDRAM cells includes a further capacitor and a further transistor,
further transistors of multiple individual eDRAM cells of the plurality of eDRAM cells are arranged in a third layer over the substrate, and
further capacitors of multiple individual eDRAM cells of the plurality of eDRAM cells are arranged in a fourth layer over the substrate.
18. The microelectronic package of claim 17 , wherein the first layer is closer to the substrate than the second layer, the second layer is closer to the substrate than the third layer, and the third layer is closer to the substrate than the fourth layer.
19. An integrated circuit (IC) device assembly, comprising:
a microelectronic package; and
a further component coupled to the microelectronic package,
wherein the microelectronic package includes:
a substrate with a first complementary metal-oxide-semiconductor (CMOS) layer,
a first plurality of memory cells coupled with the substrate,
a second plurality of memory cells communicatively coupled with the substrate, wherein the first plurality of memory cells is between the second plurality of memory cells and the substrate, and
a second CMOS layer communicatively coupled with the second plurality of memory cells, wherein the second plurality of memory cells are between the second CMOS layer and the first plurality of memory cells, and wherein a pitch of the first plurality of memory cells is greater than a pitch of the second plurality of memory cells.
20. The IC device assembly of claim 19 , wherein the further component is a circuit board or an interposer.