Sputtering target with backside cooling grooves
Implementations of the present disclosure relate to a sputtering target for a sputtering chamber used to process a substrate. In one implementation, a sputtering target for a sputtering chamber is provided. The sputtering target comprises a sputtering plate with a backside surface having radially inner, middle and outer regions and an annular-shaped backing plate mounted to the sputtering plate. The backside surface has a plurality of circular grooves which are spaced apart from one another and at least one arcuate channel cutting through the circular grooves and extending from the radially inner region to the radially outer region of sputtering plate. The annular-shaped backing plate defines an open annulus exposing the backside surface of the sputtering plate.
1. A sputtering target, comprising:
a circular sputtering plate, comprising:
a sputtering surface; and
a backside surface opposite the sputtering surface, wherein the backside surface has a radially inner region, a radially middle region, and a radially outer region, the backside surface having:
a plurality of circular grooves spaced apart from one another; and
at least one channel cutting through the circular grooves and extending from the radially inner region to the radially outer region of the circular sputtering plate;
an annular flange that extends beyond a radius of the circular sputtering plate, the annular flange comprising a peripheral circular surface having an outer footing operable to rest on a surface;
an outer peripheral wall that extends from an outer edge of the sputtering surface to the annular flange; and
an inner peripheral wall that extends from the backside surface of the circular sputtering plate to the annular flange, wherein a recess that exposes the backside surface of the circular sputtering plate is defined by the backside surface and the inner peripheral wall.
2. The sputtering target of claim 1 , wherein the circular grooves are concentric.
3. The sputtering target of claim 2 , wherein the circular grooves comprise from about 20 to about 30 grooves.
4. The sputtering target of claim 2 , wherein all of the circular grooves are located at the radially middle region of the backside surface.
5. The sputtering target of claim 1 , wherein the at least one channel is a linear channel.
6. The sputtering target of claim 5 , wherein the linear channel is a plurality of linear channels spaced apart from one another by an angle of from about 30 to about 90 degrees as measured from a center of the backside surface.
7. The sputtering target of claim 1 , wherein the at least one channel is an arcuate channel.
8. The sputtering target of claim 7 , wherein the arcuate channel is a plurality of arcuate channels spaced apart from one another by an angle of from about 30 to about 90 degrees as measured from a center of the backside surface.
9. The sputtering target of claim 1 , wherein the sputtering target comprises an alloy of copper and chrome.
10. The sputtering target of claim 1 , wherein the sputtering target comprises a material selected from Al-0.5 wt. % Cu alloy, Al-1.0 wt. % Si alloy, Al-0.5 wt. % Cu—(1.0 wt. % Si) alloy, aluminum, or a combination thereof.
11. A sputtering chamber, comprising:
a sputtering target mounted in the sputtering chamber, comprising:
a circular sputtering plate, comprising:
a sputtering surface; and
a backside surface opposite the sputtering surface, wherein the backside surface has a radially inner region, a radially middle region, and a radially outer region, the backside surface having:
a plurality of circular grooves spaced apart from one another; and
at least one channel cutting through the circular grooves and extending from the radially inner region to the radially outer region of the circular sputtering plate;
an annular flange that extends beyond a radius of the circular sputtering plate, the annular flange comprising a peripheral circular surface having an outer footing operable to rest on a surface;
an outer peripheral wall that extends from an outer edge of the sputtering surface to the annular flange; and
an inner peripheral wall that extends from the backside surface of the circular sputtering plate to the annular flange, wherein a recess that exposes the backside surface of the circular sputtering plate is defined by the backside surface and the inner peripheral wall;
a substrate support facing the sputtering target;
a gas distributor to introduce a gas into the sputtering chamber;
a gas energizer to energize the gas to form a plasma to sputter the sputtering target; and
a gas exhaust port to exhaust gas from the sputtering chamber.
12. The sputtering target of claim 11 , wherein the circular grooves are concentric.
13. The sputtering target of claim 12 , wherein the circular grooves comprise from about 20 to about 30 grooves.
14. The sputtering target of claim 12 , wherein all of the circular grooves are located at the radially middle region of the backside surface.
15. The sputtering target of claim 11 , wherein the at least one channel is a linear channel.
16. The sputtering target of claim 15 , wherein the linear channel is a plurality of linear channels spaced apart from one another by an angle of from about 30 to about 90 degrees as measured from a center of the backside surface.
17. The sputtering target of claim 11 , wherein the at least one channel is an arcuate channel.
18. The sputtering target of claim 17 , wherein the arcuate channel is a plurality of arcuate channels spaced apart from one another by an angle of from about 30 to about 90 degrees as measured from a center of the backside surface.
19. The sputtering target of claim 11 , wherein the sputtering target comprises an alloy of copper and chrome.
20. The sputtering target of claim 11 , wherein the sputtering target comprises a material selected from Al-0.5 wt. % Cu alloy, Al-1.0 wt. % Si alloy, Al-0.5 wt. % Cu—(1.0 wt. % Si) alloy, aluminum, or a combination thereof.