IP Library Granted Patent US 11,086,226
Granted Patent B1
US 11,086,226 · App. 16/891,422 · Granted Aug 10, 2021

Liquid tamped targets for extreme ultraviolet lithography

Inventor: Yechiel R. Frank (Berkeley, CA)
Assignee: Lawrence Livermore National Security, LLC
G03F7/70033G03F7/70841H05G2/005H05G2/006H05G2/008
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Quick Facts
Patent No.
US 11,086,226
App. No.
16/891,422
Granted
Aug 10, 2021
Kind
B1
Abstract

An EUV light source including a vacuum chamber, a droplets injector operatively connected to the vacuum chamber for directing the droplets into the vacuum chamber, droplets produced by the droplets injector wherein the droplets have one side and another side opposite the one side, the droplets including a solid higher Z bead in a low Z liquid, and at least one laser beam directed onto the one side of the droplets.

Claims (42)

1. An EUV light source, comprising:

a vacuum chamber,

a droplets injector operatively connected to said vacuum chamber for directing said droplets into said vacuum chamber,

droplets produced by said droplets injector wherein said droplets have one side and another side opposite said one side,

said droplets including a solid higher Z bead in a low Z liquid,

a laser beam directed onto said one side of said droplets,

another laser beam directed onto said other side of said droplets, and

a laser that produces said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets or

multiple lasers wherein said multiple lasers produce said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets.

2. Laser beams onto said one side of said droplets and said another laser beam directed onto said other side of said droplets of claim 1 hit the droplet at an angle from the plain perpendicular to the droplet injection direction.

3. The EUV light source of claim 1 wherein said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets are produced by a single laser.

4. The EUV light source of claim 1 wherein said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets are produced by multiple lasers.

5. The EUV light source of claim 1 wherein said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets cause deformation of said droplets into a co-centric disk-like shape with low material encasing the higher Z material.

6. The EUV light source of claim 1 wherein said droplets produced by said droplets injector contain micro tin beads.

7. The EUV light source of claim 1 wherein said droplets produced by said droplets injector contain beads that are smaller than micro tin beads.

8. The EUV light source of claim 1 wherein said low Z liquid is water.

9. The EUV light source of claim 1 wherein said low Z liquid is liquid methane.

10. An EUV light source, comprising:

a vacuum chamber,

a droplets injector operatively connected to said vacuum chamber for directing said droplets into said vacuum chamber,

droplets produced by said droplets injector wherein said droplets have one side and another side opposite said one side,

said droplets including a higher Z bead in a low Z liquid,

first multiple laser beams directed onto said one side of said droplets,

second multiple laser beams directed onto said other side of said droplets, and

a laser that produces said first multiple laser beams directed onto said one side of said droplets and second multiple laser beams directed onto said other side of said droplets or

multiple lasers wherein said multiple lasers produce said first multiple laser beams directed onto said one side of said droplets and second multiple laser beams directed onto said other side of said droplets.

11. The EUV light source of claim 10 wherein said droplets produced by said droplets injector contain micro higher Z beads.

12. The EUV light source of claim 10 wherein said droplets produced by said droplets injector contain beads that are smaller than micro higher Z beads.

13. The EUV light source of claim 10 wherein said low Z liquid is water.

14. The EUV light source of claim 10 wherein said low Z liquid is liquid methane.

15. A method of producing and operating a EUV light source, comprising the steps of:

using a droplets injector for directing droplets into a vacuum chamber wherein said droplets have one side and another side opposite said one side and

wherein said droplets include a higher Z bead in a low Z liquid,

directing a laser beam onto said one side of said droplets, and

directing another laser beam onto said other side of said droplets.

16. The method of producing and operating a EUV light source of claim 15 wherein said steps of directing a laser beam onto said one side of said droplets and directing another laser beam onto said other side of said droplets comprises using a laser that produces said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets or using multiple lasers wherein said multiple lasers produce said laser beam directed onto said one side of said droplets and said another laser beam directed onto said other side of said droplets.

17. The method of producing and operating a EUV light source of claim 15 wherein said steps of directing a laser beam onto said one side of said droplets and directing another laser beam onto said other side of said droplets cause deformation of said droplets into a disk shape.

18. The method of producing and operating a EUV light source of claim 15 wherein said steps of directing a laser beam onto said one side of said droplets and directing another laser beam onto said other side of said droplets cause deformation of said droplets into a co-centric disk-like shape.

19. The method of producing and operating a EUV light source of claim 15 wherein said droplets produced by said droplets injector include a micro higher Z bead.

20. The method of producing and operating a EUV light source of claim 15 wherein said droplets produced by said droplets injector include beads that are smaller than micro higher Z beads.

21. The method of producing and operating a EUV light source of claim 15 wherein said low Z liquid is water.

22. The method of producing and operating a EUV light source of claim 15 wherein said low Z liquid is liquid methane.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2023
From: FRANK, YECHIEL R.
To: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
Reel/Frame 063123/0124 →
CONFIRMATORY LICENSE Recorded Jun 7, 2021
From: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 056450/0495 →
CONFIRMATORY LICENSE (SEE DOCUMENT FOR DETAILS) Recorded Jun 22, 2020
From: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 053007/0091 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 3, 2020
From: FRANK, YECHIEL R.
To: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
Reel/Frame 052825/0135 →