Air-spaced encapsulated dielectric nanopillars for flat optical devices
Embodiments described herein relate to flat optical devices and methods of forming flat optical devices. One embodiment includes a substrate having a first arrangement of a first plurality of pillars formed thereon. The first arrangement of the first plurality of pillars includes pillars having a height h and a lateral distance d, and a gap g corresponding to a distance between adjacent pillars of the first plurality of pillars. An aspect ratio of the gap g to the height h is between about 1:1 and about 1:20. A first encapsulation layer is disposed over the first arrangement of the first plurality of pillars. The first encapsulation layer has a refractive index of about 1.0 to about 1.5. The first encapsulation layer, the substrate, and each of the pillars of the first arrangement define a first space therebetween. The first space has a refractive index of about 1.0 to about 1.5.
1. A flat optical device, comprising:
a substrate, the substrate having a first arrangement of a first plurality of pillars formed thereon, the first arrangement of the first plurality of pillars comprising:
pillars having a height h and a lateral distance d;
a gap g corresponding to a distance between adjacent pillars of the first plurality of pillars, and
a silica-containing aerogel material having an absorption coefficient less than 0.001 only disposed in each gap g; and
a first encapsulation layer disposed on the first arrangement of the first plurality of pillars, the first encapsulation layer is disposed on a top surface of each pillar of the first plurality of pillars and on the silica-containing aerogel material disposed in each gap g, the first encapsulation layer having a refractive index of about 1.0 to about 1.5.
2. The flat optical device of claim 1 , wherein the silica-containing aerogel material has nanoscale porosities formed therein.
3. The flat optical device of claim 2 , wherein the silica-containing aerogel material and the first encapsulation layer consist of substantially the same materials.
4. The flat optical device of claim 1 , wherein the gap g has an air gap disposed in a center opening of the silica-containing aerogel material.
5. The flat optical device of claim 1 , wherein a liner is disposed over the pillars.
6. The flat optical device of claim 5 , wherein the liner has a thickness of about 1 nanometer (nm) to about 200 nm.
7. The flat optical device of claim 1 , further comprising:
a second arrangement of a second plurality of pillars formed over the first encapsulation layer, the second arrangement of the second plurality of pillars comprising:
pillars having the height h and the lateral distance d;
the gap g corresponding to the distance between adjacent pillars of the second plurality of pillars, and
a silica-containing aerogel material having an absorption coefficient less than 0.001 only disposed in each gap g; and
a second encapsulation layer disposed on the second arrangement of the second plurality of pillars, the second encapsulation layer is disposed on a top surface of each pillar of the second plurality of pillars and on the silica-containing aerogel material disposed in each gap g, the second encapsulation layer having the refractive index of about 1.0 to about 1.5 .
8. The flat optical device of claim 1 , wherein the pillars comprise one or more of titanium dioxide (TiO 2 ), zinc oxide (ZnO), tin dioxide (SnO 2 ), aluminum-doped zinc oxide (AZO), fluorine-doped tin oxide (FTO), cadmium stannate (tin oxide) (CTO), zinc stannate (tin oxide) (SnZnO 3 ), or silicon containing materials.
9. The flat optical device of claim 1 , wherein the fist encapsulation material comprises a lower surface, wherein the lower surface is disposed on a top surface of each pillar of the first plurality of pillars and each gap, and wherein the lower surface is planar over the top surface.
10. A flat optical device, comprising:
a substrate, the substrate having a first arrangement of a first plurality of pillars formed thereon, the first arrangement of the first plurality of pillars comprising:
pillars having a height h and a lateral distance d; and
a gap g corresponding to a distance between adjacent pillars of the first plurality of pillars, wherein each gap g is composed of only a silica-containing aerogel material with nanoscale porosities within the silica-containing material, the silica-containing aerogel material having:
an absorption coefficient less than 0.001; and
a first encapsulation layer disposed on the first arrangement of the first plurality of pillars, the first encapsulation layer is disposed on a top surface of each pillar of the first plurality of pillars and on the silica-containing aerogel material disposed in each gap g, the first encapsulation layer having a refractive index of about 1.0 to about 1.5.
11. The flat optical device of claim 10 , wherein the gap is less than 350 nanometers (nm).
12. The flat optical device of claim 10 , wherein the height h is about 1500 nm or less.
13. The flat optical device of claim 10 , wherein the first encapsulation layer has a thickness less than 50 micrometers (μm).
14. The flat optical device of claim 10 , further comprising:
a second arrangement of a second plurality of pillars formed over the first encapsulation layer, the second arrangement of the second plurality of pillars comprising:
pillars having the height h and the lateral distance d;
the gap g corresponding to the distance between adjacent pillars of the second plurality of pillars, and
a silica-containing aerogel material having an absorption coefficient less than 0.001 only disposed in each gap q; and
a second encapsulation layer disposed on the second arrangement of the second plurality of pillars, the second encapsulation layer is disposed over a top surface of each pillar of the second plurality of pillars and on the silica-containing aerogel material disposed in each gap g, the second encapsulation layer having the refractive index of about 1.0 to about 1.5 .
15. The flat optical device of claim 10 , wherein the pillars comprise one or more of titanium dioxide (TiO 2 ), zinc oxide (ZnO), tin dioxide (SnO 2 ), aluminum-doped zinc oxide (AZO), fluorine-doped tin oxide (FTO), cadmium stannate (tin oxide) (CTO), zinc stannate (tin oxide) (SnZnO 3 ), or silicon containing materials.