GROUP-III NITRIDE LAMINATE
There is provided a group III nitride laminate, including: a substrate comprised of silicon carbide; a first layer comprised of aluminum nitride and formed on the substrate; a second layer comprised of gallium nitride and formed on the first layer; and a third layer formed on the second layer and comprised of group III nitride having an electron affinity lower than that of the gallium nitride comprised in the second layer, the second layer containing silicon at an average concentration of less than 1×10 16 /cm 3 in a lower layer portion when the second layer is divided into three equal thicknesses.
1 . A group III nitride laminate, comprising:
a substrate comprised of silicon carbide;
a first layer comprised of aluminum nitride and formed on the substrate;
a second layer comprised of gallium nitride and formed on the first layer; and
a third layer formed on the second layer and comprised of group III nitride having an electron affinity lower than that of the gallium nitride comprised in the second layer,
the second layer containing silicon at an average concentration of less than 1×10 16 /cm 3 in a lower layer portion when the second layer is divided into three equal thicknesses.
2 . The group III nitride laminate according to claim 1 , wherein the second layer has an average silicon concentration of less than 1×10 15 /cm 3 in the lower layer portion of the second layer.
3 . The group III nitride laminate according to claim 1 , wherein the second layer has an average oxygen concentration of less than 1×10 16 /cm 3 in the lower layer portion of the second layer.
4 . The group III nitride laminate according to claim 1 , wherein the average silicon concentration in the lower layer portion of the second layer is lower than the average carbon concentration in the lower layer portion of the second layer.
5 . The group III nitride laminate according to claim 1 , wherein the average oxygen concentration in the lower layer portion of the second layer is lower than the average carbon concentration in the lower layer portion of the second layer.
6 . A group III nitride laminate, comprising:
a substrate comprised of silicon carbide;
a first layer comprised of aluminum nitride and formed on the substrate;
a second layer comprised of gallium nitride and formed on the first layer; and
a third layer formed on the second layer and comprised of group III nitride having an electron affinity lower than that of the gallium nitride comprised in the second layer,
the second layer containing oxygen at an average concentration of less than 1×10 16 /cm 3 in a lower layer portion when the second layer is divided into three equal thicknesses.
7 . The group III nitride laminate according to claim 1 , having a silicon concentration of 1×10 21 /cm 3 or more at a depth position where the aluminum concentration of the first layer shows a peak.
8 . The group III nitride laminate according to claim 6 , having a silicon concentration of 1×10 21 /cm 3 or more at a depth position where the aluminum concentration of the first layer shows a peak.
9 . The group III nitride laminate according to claim 1 , having a carbon concentration of 1×10 21 /cm 3 or more at a depth position where the aluminum concentration of the first layer shows a peak.
10 . The group III nitride laminate according to claim 6 , having a carbon concentration of 1×10 21 /cm 3 or more at a depth position where the aluminum concentration of the first layer shows a peak.