Patent Assignment
Reel/Frame 061961/0204
Merger
Recorded: 2022-11-17
Pages: 45
Assignor
SCIOCS COMPANY LIMITED
Executed: 2022-10-13
Assignee
SUMITOMO CHEMICAL COMPANY, LIMITED
2-7-1, NIHONBASHI, CHUO-KU, TOKYO, TOKYO, 103-6020, JAPAN
Covered Properties
(32)
Crystal Laminate, Semiconductor Device and Method for Manufacturing the Same
Nitride Crystal Substrate, Semiconductor Laminate, Method of Manufacturing Semiconductor Laminate and Method of Manufacturing Semiconductor Device
Nitride Semiconductor Laminate, Semiconductor Device, Method of Manufacturing Nitride Semiconductor Laminate, Method of Manufacturing Nitride Semiconductor Free-Standing Substrate and Method of Manufacturing Semiconductor Device
Nitride Semiconductor Substrate, Laminate, Substrate Selection Program, Substrate Data Output Program, Off-Angle Coordinate Map, and Methods Thereof
Group-Iii Nitride Laminate
Group-Iii Nitride Laminate
Application:
16/906,270 →
Publication:
US 2021/0005717
Method for Producing Nitride Semiconductor Laminate, Silicon Semiconductor Product, Method for Inspecting Film Quality and Method for Inspecting Semiconductor Growth Device
Method for Manufacturing Nitride Semiconductor Substrate, Nitride Semiconductor Substrate and Layered Structure
Method for Manufacturing Nitride Semiconductor Substrate, Nitride Semiconductor Substrate, and Laminate Structure
Epitaxial Substrate
Nitride Semiconductor Substrate, Method for Manufacturing Nitride Semiconductor Substrate, and Laminated Structure
Structure Manufacturing Method Including Surface Photoelectrochemical Etching and Structure Manufacturing Device
Method for Manufacturing Nitride Semiconductor Substrate, Nitride Semiconductor Substrate, and Laminate Structure
Structure Manufacturing Method, Structure Manufacturing Apparatus and Intermediate Structure
Nitride Semiconductor Substrate Manufacturing Method, and Laminated Structure
Piezoelectric Stack, Piezoelectric Element, and Method of Manufacturing Piezoelectric Stack
Structure Manufacturing Method and Manufacturing Device, and Light Irradiation Device
Method for Manufacturing Nitride Semiconductor Substrate and Nitride Semiconductor Substrate
Group Iii Nitride Laminate, Semiconductor Element, and Method for Producing Group Iii Nitride Laminate
Method for Manufacturing Nitride-Based High Electron Mobility Transistor and Nitride-Based High Electron Mobility Transistor
Nitride Semiconductor Substrate, Laminated Structure, and Method for Manufacturing Nitride Semiconductor Substrate
Structure Manufacturing Method and Intermediate Structure
Method for Manufacturing Structure
Method for Manufacturing Structure, and Structure
Application:
17/630,413 →
Publication:
US 2022/0285525
Method and Device for Manufacturing Structure
Structure Production Wet Etch Method and Structure Production Apparatus
Nitride Crystal, Semiconductor Laminate, and Method for Manufacturing Nitride Crystal
Structure Manufacturing Method and Manufacturing Device, and Light Irradiation Device
Nitride Semiconductor Substrate, Laminated Structure, and Method for Manufacturing Nitride Semiconductor Substrate
Group Iii Nitride Semiconductor Device with Gate Recess and Related Method for Manufacturing
Application:
17/776,143 →
Publication:
US 2022/0384614
Structure Manufacturing Method and Structure Manufacturing Apparatus
Application:
17/799,406 →
Publication:
US 2023/0343597
Production Apparatus for Producing Structural Body and Production Method for Producing Structural Body
Application:
17/941,686 →
Publication:
US 2023/0099777
Related Assignments
(17)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Dec 3, 2019
From: HORIKIRI, FUMIMASA; YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 051166/0678 →
Assignment of Assignor's Interest
Dec 11, 2019
From: HORIKIRI, FUMIMASA; YOSHIDA, TAKEHIRO; MISHIMA, TOMOYOSHI
To: SUMITOMO CHEMICAL COMPANY, LIMITED; SCIOCS COMPANY LIMITED; HOSEI UNIVERSITY
Reel/Frame 051250/0850 →
Assignment of Assignor's Interest
Dec 11, 2019
From: FUJIKURA, HAJIME
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 051251/0640 →
Assignment of Assignor's Interest
Apr 24, 2020
From: HORIKIRI, FUMIMASA; YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 052487/0386 →
Assignment of Assignor's Interest
Jun 19, 2020
From: ISONO, RYOTA; TANAKA, TAKESHI
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 052988/0989 →
Assignment of Assignor's Interest
Jun 19, 2020
From: TANAKA, TAKESHI; ISONO, RYOTA
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 052988/0796 →
Assignment of Assignor's Interest
Nov 13, 2020
From: HORIKIRI, FUMIMASA
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 054367/0159 →
Assignment of Assignor's Interest
Feb 26, 2021
From: YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 055433/0153 →
Assignment of Assignor's Interest
Feb 26, 2021
From: YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 055433/0607 →
Assignment of Assignor's Interest
Feb 26, 2021
From: YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 055431/0899 →
Assignment of Assignor's Interest
Feb 26, 2021
From: HORIKIRI, FUMIMASA; NARITA, YOSHINOBU; SHIOJIMA, KENJI
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 055433/0359 →
Assignment of Assignor's Interest
Apr 16, 2021
From: HIRIKIRI, FUMIMASA
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 055944/0494 →
Assignment of Assignor's Interest
Apr 22, 2021
From: YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 056009/0097 →
Assignment of Assignor's Interest
Apr 27, 2021
From: HORIKIRI, FUMIMASA; FUKUHARA, NOBORU; SATO, TAKETOMO; TOGUCHI, MASACHIKA
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 056059/0666 →
Assignment of Assignor's Interest
May 11, 2021
From: YOSHIDA, TAKEHIRO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 056192/0702 →
Assignment of Assignor's Interest
Jun 4, 2021
From: SHIBATA, KENJI; WATANABE, KAZUTOSHI; HORIKIRI, FUMIMASA
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 056440/0044 →
Assignment of Assignor's Interest
Jun 8, 2021
From: HORIKIRI, FUMIMASA; FUKUHARA, NOBORU
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 056474/0684 →