Techniques for controlling effective refractive index of gratings
A surface-relief structure comprises a surface-relief grating including a first material characterized by a first refractive index, a first layer of a second material having a second refractive index conformally deposited on surfaces of the surface-relief grating, and a second layer of a third material having a third refractive index conformally deposited on the first layer. The effective refractive index of the combination of the first layer and the second layer is less than, equal to, or greater than the first refractive index, thereby increasing the duty cycle and/or modifying the overall refractive index of the surface-relief structure. The first layer and the second layer are deposited using, for example, atomic layer deposition techniques.
1. A surface-relief structure comprising:
a surface-relief grating including a first material characterized by a first refractive index;
a first layer of a second material conformally deposited on surfaces of the surface-relief grating, the second material characterized by a second refractive index; and
a second layer of a third material conformally deposited on the first layer, the third material characterized by a third refractive index,
wherein:
one of the second refractive index and the third refractive index is lower or greater than the first refractive index; and
an effective refractive index of a combination of the first layer and the second layer is equal to the first refractive index.
2. The surface-relief structure of claim 1 , wherein the surface-relief grating includes a grating imprinted in an organic material.
3. The surface-relief structure of claim 1 , wherein a maximum duty cycle of the surface-relief structure is greater than 0.7.
4. The surface-relief structure of claim 1 , wherein a slant angle of the surface-relief grating is greater than 30°.
5. The surface-relief structure of claim 1 , wherein a depth of the surface-relief grating is greater than 100 nm.
6. The surface-relief structure of claim 1 , wherein the first layer is characterized by a thickness less than 50 nm.
7. The surface-relief structure of claim 1 , wherein a thickness of the first layer and a thickness of the second layer are selected based on the first refractive index, the second refractive index, and the third refractive index.
8. The surface-relief structure of claim 1 , further comprising:
a third layer of the second material conformally deposited on the second layer; and
a fourth layer of the third material conformally deposited on the third layer.
9. The surface-relief structure of claim 1 , further comprising an overcoat layer on the second layer, the overcoat layer filling gaps in the surface-relief grating and characterized by a fourth refractive index different from the first refractive index.
10. The surface-relief structure of claim 1 , wherein the first layer and the second layer are deposited by atomic layer deposition or plasma enhanced chemical vapor deposition (PECVD).
11. The surface-relief structure of claim 1 , wherein the first layer is characterized by a variation in thickness less than 10% of an average thickness of the first layer.
12. The surface-relief structure of claim 1 , wherein the second material includes an oxide.
13. A surface-relief structure comprising:
a surface-relief grating including ridges that include a first material characterized by a first refractive index;
a first layer of a second material conformally deposited on surfaces of the surface-relief grating, the second material characterized by a second refractive index greater than the first refractive index; and
a second layer of a third material conformally deposited on the first layer, the third material characterized by a third refractive index greater than the second refractive index,
wherein a maximum duty cycle of the surface-relief structure is greater than 0.7.
14. The surface-relief structure of claim 13 , wherein the surface-relief grating includes a grating formed in an organic material.
15. The surface-relief structure of claim 13 , further comprising an overcoat layer on the second layer, the overcoat layer filling gaps in the surface-relief grating and characterized by a fourth refractive index greater than or equal to the third refractive index.
16. The surface-relief structure of claim 13 , wherein a thickness of the first layer is less than 50 nm.
17. The surface-relief structure of claim 13 , wherein the first layer and the second layer are deposited by atomic layer deposition or plasma enhanced chemical vapor deposition (PECVD).
18. A surface-relief structure comprising:
a surface-relief grating including ridges that include a first organic material characterized by a first refractive index;
a first layer of a second material conformally deposited on surfaces of the surface-relief grating, the second material characterized by a second refractive index lower than the first refractive index; and
a second layer of a third material conformally deposited on the first layer, the third material characterized by a third refractive index lower than the second refractive index,
wherein a maximum duty cycle of the surface-relief structure is greater than 0.7.
19. The surface-relief structure of claim 18 , further comprising an overcoat layer on the second layer, the overcoat layer filling gaps in the surface-relief grating and characterized by a fourth refractive index lower than or equal to the third refractive index.