IP Library Granted Patent US 11,428,614
Granted Patent B2
US 11,428,614 · App. 16/912,934 · Granted Aug 30, 2022

Notch treatment methods for flaw simulation

Inventors: Xiaoming Li (Colleyville, TX); Bogdan R. Krasnowski (Bedford, TX); Robert A. Figueroa (Colleyville, TX); Robert Wardlaw (Keller, TX)
Assignee: Textron Innovations Inc.
G01N3/62G01N3/02G06F30/15G06F2119/18
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Quick Facts
Patent No.
US 11,428,614
App. No.
16/912,934
Granted
Aug 30, 2022
Kind
B2
Abstract

A notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer; isolating the notch; and selectively etching the notch to provide an etched surface of the notch; wherein at least a portion of the re-melt material layer has been removed from the notch. In one aspect, there is provided a notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer, the specimen includes steel or an alloy thereof; isolating the notch; and selectively etching the notch with a first etching solution and a second etching solution to provide an etched surface on the notch; wherein at least a portion of the re-melt material layer has been removed from the notch.

Claims (9)

1. A notch treatment method for flaw simulation, comprising:

providing a specimen with a notch, the notch having a re-melt material layer, the specimen comprises titanium or an alloy thereof;

isolating the notch comprises placing an isolation layer with a slot onto the specimen such that the slot exposes the notch and placing a dam on the isolation layer to form a notch area and a peripheral area on the specimen, wherein the step of placing the dam on the isolation layer comprises forming a moldable cylinder; and

selectively etching the notch by filling the dam with an etching solution comprising Kroll's etchant solution to provide an etched surface of the notch;

wherein at least a portion of the re-melt material layer has been removed from the notch; and

wherein at least a portion of the etched surface on the notch includes microcracks.

2. The treatment method according to claim 1 , wherein the step of providing the specimen with the notch comprises:

generating the notch on the specimen by electrical discharge machining.

3. The treatment method according to claim 1 , wherein the re-melt material layer is disposed on at least one of a root notch and a lateral side wall of the notch.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 13, 2021
From: BELL TEXTRON RHODE ISLAND INC.
To: TEXTRON INNOVATIONS INC.
Reel/Frame 055898/0938 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED ON REEL 055825 FRAME 0386. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Apr 9, 2021
From: BELL TEXTRON INC.
To: BELL TEXTRON RHODE ISLAND INC.
Reel/Frame 055885/0878 →
CHANGE OF NAME Recorded Apr 5, 2021
From: BELL TEXTRON INC.
To: BELL TEXTRON RHODE ISLAND INC.
Reel/Frame 055825/0386 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 10, 2020
From: LI, XIAOMING; KRASNOWSKI, BOGDAN ROMAN; FIGUEROA, ROBERT A.; WARDLAW, ROBERT
To: BELL TEXTRON INC.
Reel/Frame 053736/0912 →
Continuity (4)
Division 16124762 · Sep 7, 2018
Continuation In Part 15079946 · Mar 24, 2016
Provisional Application 62137427 · Mar 24, 2015
Related Publication 20200333228A1 · Oct 22, 2020