IP Library Granted Patent US 11,200,002
Granted Patent B2
US 11,200,002 · App. 16/918,310 · Granted Dec 14, 2021

Nonvolatile memory device

Inventors: Yonghyuk Choi (Suwon-si, KR); Jaeduk Yu (Seoul, KR); Sangwan Nam (Hwaseong-si, KR); Sangwon Park (Seoul, KR); Daeseok Byeon (Seongnam-si, KR); Bongsoon Lim (Seoul, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
G06F3/0659G06F3/0604G06F3/0679G11C16/0483G11C16/08G11C16/24H01L27/11556H01L27/11582
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Quick Facts
Patent No.
US 11,200,002
App. No.
16/918,310
Granted
Dec 14, 2021
Kind
B2
Abstract

A nonvolatile memory device includes a first semiconductor layer including an upper substrate in which word-lines extending in a first direction and bit-lines extending in a second direction are disposed and a memory cell array, a second semiconductor layer, a control circuit, and a pad region. The memory cell array includes a vertical structure on the upper substrate, and the vertical structure includes memory blocks. The second semiconductor layer includes a lower substrate that includes address decoders and page buffer circuits. The vertical structure includes via areas in which one or more through-hole vias are provided, and the via areas are spaced apart in the second direction. The memory cell array includes mats corresponding to different bit-lines of the bit-lines. At least two of the mats include a different number of the via areas according to a distance from the pad region in the first direction.

Claims (98)

1. A nonvolatile memory device comprising:

a first semiconductor layer including an upper substrate in which a plurality of word-lines extending in a first direction and a plurality of bit-lines extending in a second direction perpendicular to the first direction are disposed and a memory cell array including a vertical structure on the upper substrate, wherein the vertical structure includes a plurality of memory blocks;

a second semiconductor layer under the first semiconductor layer in a third direction perpendicular to the first and second directions, wherein the second semiconductor layer includes a lower substrate that includes a plurality of address decoders and a plurality of page buffer circuits configured to control the memory cell array;

a control circuit configured to control the plurality of address decoders and the plurality of page buffer circuits in response to a command and an address from an external device; and

a pad region disposed adjacent to the first semiconductor layer in the first direction and extending in the second direction,

wherein the vertical structure includes a plurality of via areas in which one or more through-hole vias are provided and the plurality of via areas are spaced apart in the second direction,

wherein the memory cell array includes a plurality of mats corresponding to different bit-lines of the plurality of bit-lines, and

wherein at least two of the plurality of mats include a different number of the via areas according to a distance from the pad region in the first direction.

2. The nonvolatile memory device of claim 1 , wherein:

the plurality of mats include at least a first mat and a second mat,

a first distance from the pad region to the first mat in the first direction is smaller than a reference distance, and

a second distance from the pad region to the second mat in the first direction is greater than or equal to the reference distance.

3. The nonvolatile memory device of claim 2 , wherein:

the first mat includes a first number of the via areas,

the second mat includes a second number of the via areas, and

the first number is smaller than the second number.

4. The nonvolatile memory device of claim 2 , wherein:

the first mat includes a first number of the via areas,

the second mat includes a second number of the via areas, and

the first number is greater than the second number.

5. The nonvolatile memory device of claim 4 , wherein:

the control circuit is configured to selectively store hot data and cold data in the first mat and the second mat based on an access frequency from the external device,

the control circuit is configured to store the hot data in the first mat and is configured to store the cold data in the second mat,

the hot data is accessed with a first frequency greater than a reference frequency during a reference time interval, and

the cold data is accessed with a second frequency less than or equal to the reference frequency during the reference time interval.

6. The nonvolatile memory device of claim 1 , wherein the second semiconductor layer comprises first, second, third, and fourth regions that are divided along the first and second directions intersecting at a point overlapping the memory cell array in the third direction,

wherein the first and second regions are adjacent to each other in the first direction, and the second and third regions are adjacent to each other in the second direction,

wherein the plurality of page buffer circuits include first through fourth page buffer circuits located in the first through fourth regions, respectively.

7. The nonvolatile memory device of claim 1 , wherein at least a first portion of the one or more through-hole vias connect at least some portion of the plurality of bit-lines to at least some portion of the plurality of page buffer circuits, and

wherein at least a second portion of the one or more through-hole vias connect at least some portion of the plurality of word-lines to at least some portion of the plurality of address decoders.

8. A nonvolatile memory device comprising:

a first semiconductor layer including an upper substrate in which a plurality of word-lines extending in a first direction and a plurality of bit-lines extending in a second direction perpendicular to the first direction are disposed and a memory cell array including a vertical structure on the upper substrate, wherein the vertical structure includes a plurality of memory blocks;

a second semiconductor layer under the first semiconductor layer in a third direction perpendicular to the first and second directions, wherein the second semiconductor layer includes a lower substrate that includes a plurality of address decoders and a plurality of page buffer circuits configured to control the memory cell array;

a control circuit configured to control the plurality of address decoders and the plurality of page buffer circuits in response to a command and an address from an external device; and

a pad region disposed adjacent to the first semiconductor layer in the first direction and extending in the second direction,

wherein the vertical structure includes a plurality of via areas in which one or more through-hole vias are provided and the plurality of via areas are spaced apart in the second direction,

wherein at least a first portion of the one or more through-hole vias connect at least some portion of the plurality of bit-lines to at least some portion of the plurality of page buffer circuits,

wherein at least a second portion of the one or more through-hole vias connect at least some portion of the plurality of word-lines to at least some portion of the plurality of address decoders,

wherein the memory cell array includes a plurality of mats corresponding to different bit-lines of the plurality of bit-lines,

wherein each of the plurality of mats includes a first tile and a second tile which are identified based on a distance from the pad region in the first direction, and

wherein the first tile and the second tile include a different number of the via areas according to the distance from the pad region in the first direction.

9. The nonvolatile memory device of claim 8 , wherein:

a first distance from the pad region to the first tile in the first direction is smaller than a reference distance, and

a second distance from the pad region to the second tile in the first direction is greater than or equal to the reference distance.

10. The nonvolatile memory device of claim 9 , wherein:

the first tile includes a first number of the via areas,

the second tile includes a second number of the via areas, and

the first number is smaller than the second number.

11. The nonvolatile memory device of claim 9 , wherein:

the first tile includes a first number of the via areas,

the second tile includes a second number of the via areas, and

the first number is greater than the second number.

12. The nonvolatile memory device of claim 11 , wherein:

the control circuit is configured to selectively store hot data and cold data in the first tile and the second tile based on an access frequency from the external device,

the control circuit is configured to store the hot data in the first tile and is configured to store the cold data in the second tile,

the hot data is accessed with a first frequency greater than a reference frequency during a reference time interval, and

the cold data is accessed with a second frequency less than or equal to the reference frequency during the reference time interval.

13. A nonvolatile memory device comprising:

a first semiconductor layer including an upper substrate in which a plurality of word-lines extending in a first direction and a plurality of bit-lines extending in a second direction perpendicular to the first direction are disposed and a memory cell array including a vertical structure on the upper substrate, wherein the vertical structure includes a plurality of memory blocks;

a second semiconductor layer under the first semiconductor layer in a third direction perpendicular to the first and second directions, wherein the second semiconductor layer includes a lower substrate that includes a plurality of address decoders and a plurality of page buffer circuits configured to control the memory cell array;

a control circuit configured to control the plurality of address decoders and the plurality of page buffer circuits in response to a command and an address from an external device; and

a pad region disposed adjacent to the first semiconductor layer in the first direction and extending in the second direction, wherein a plurality of input/output pads and at least one power pad are provided in the pad region,

wherein the vertical structure includes a plurality of via areas in which one or more through-hole vias are provided and the plurality of via areas are spaced apart in the second direction,

wherein the at least one power pad is disposed adjacent to a first edge portion of the pad region,

wherein the memory cell array includes a plurality of mats corresponding to different bit-lines of the plurality of bit-lines, and

wherein at least two of the plurality of mats include a different number of the via areas according to a distance from the at least one power pad in the second direction.

14. The nonvolatile memory device of claim 13 , wherein:

the plurality of mats include at least a first mat and a second mat,

a first distance from the at least one power pad to the first mat in the second direction is smaller than a first reference distance, and

a second distance from the at least one power pad to the second mat in the second direction is greater than or equal to the first reference distance.

15. The nonvolatile memory device of claim 14 , wherein:

the first mat includes a first number of the via areas,

the second mat includes a second number of the via areas, and

the first number is smaller than the second number.

16. The nonvolatile memory device of claim 14 , wherein:

the first mat includes a first number of the via areas,

the second mat includes a second number of the via areas, and

the first number is greater than the second number.

17. The nonvolatile memory device of claim 16 , wherein:

the control circuit is configured to selectively store hot data and cold data in the first mat and the second mat based on an access frequency from the external device,

the control circuit is configured to store the hot data in the first mat and is configured to store the cold data in the second mat,

the hot data is accessed with a first frequency greater than a reference frequency during a reference time interval, and

the cold data is accessed with a second frequency less than or equal to the reference frequency during the reference time interval.

18. The nonvolatile memory device of claim 14 , wherein:

the first mat includes a first tile and a second tile which are identified based on the distance in the second direction from the at least one power pad,

the second mat includes a third tile and a fourth tile which are identified based on the distance in the second direction from the at least one power pad,

a third distance from the at least one power pad to the first tile in the second direction is smaller than a second reference distance, and

a fourth distance from the at least one power pad to the second tile in the second direction is greater than or equal to the second reference distance.

19. The nonvolatile memory device of claim 18 , wherein:

the first tile includes a first number of the via areas,

the second tile includes a second number of the via areas,

each of the third tile and the fourth tile includes a third number of the via areas, and

the second number is greater than the first number and the third number is greater than the second number.

20. The nonvolatile memory device of claim 18 , wherein:

the first tile includes a first number of the via areas,

the second tile includes a second number of the via areas,

each of the third tile and the fourth tile includes a third number of the via areas, and

the first number is greater than the second number and the second number is greater than the third number.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 1, 2020
From: CHOI, YONGHYUK; YU, JAEDUK; NAM, SANGWAN; PARK, SANGWON; BYEON, DAESEOK; LIM, BONGSOON
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 053115/0605 →
Priority Claims (1)
KR 10-2019-0148349 · Nov 19, 2019 · national
Continuity (1)
Related Publication 20210149598A1 · May 20, 2021
Cited By (1)
US 12,593,452