Method for optimization of a lithographic process

1. A method for assessing performance parameter data characterizing a lithographic process, the method comprising:

obtaining a fingerprint, across a region on a substrate, of an uncertainty metric of a performance parameter comprised within the performance parameter data, the performance parameter selected from: critical dimension, overlay and/or edge placement error;

obtaining multiple process windows corresponding to multiple locations across the region, each process window representing a relation between the performance parameter and a yield of the lithographic process at its corresponding location;

using, by a hardware computer system, the fingerprint and multiple process windows to determine a probability of the performance parameter being outside an allowable range within the region; and

configuring or controlling an aspect of a manufacturing or measurement process based on the determined probability and/or providing a signal representing, or based on, the determined probability to a tool or system for use by the tool or system in controlling or configuring an aspect of a manufacturing or measurement process.

2. The method of claim 1 , wherein the performance data further comprises values of the performance parameter and the determining of the probability of the performance parameter being outside the allowable range further uses the values of the performance parameter.

3. The method of claim 2 , wherein the values of the performance parameter correspond to multiple layers applied to the substrate.

4. The method of claim 1 , wherein the uncertainty metric is proportional to a standard deviation of the performance parameter.

5. The method of claim 1 , wherein the region comprises one or more dies on the substrate.

6. The method of claim 5 , wherein the determining of the probability comprises integrating probability values across at least one die out of the one or more dies.

7. The method of claim 1 , wherein the relation between the performance parameter and the yield is a graph expressing an expected yield as a function of a value of the performance parameter.

8. The method of claim 1 , wherein the fingerprint and multiple process windows are further used to determine a critical location within the region where the probability of the performance parameter being outside an allowable range exceeds a specification value.

9. The method of claim 8 , further comprising labeling the critical location as a hotspot location.

10. A method for assessing performance parameter data characterizing a lithographic process, the method comprising:

obtaining a fingerprint, across a region on a substrate, of an uncertainty metric of a performance parameter comprised within the performance parameter data, the performance parameter selected from: critical dimension, overlay and/or edge placement error;

obtaining multiple process windows corresponding to multiple locations across the region, each process window being associated with an allowable range of the performance parameter at its corresponding location;

using, by a hardware computer system, the fingerprint and multiple process windows to determine a probability of the performance parameter being outside an allowable range within the region; and

configuring or controlling an aspect of a manufacturing or measurement process based on the determined probability and/or providing a signal representing, or based on, the determined probability to a tool or system for use by the tool or system in controlling or configuring an aspect of a manufacturing or measurement process.

11. A non-transitory computer-readable medium comprising instructions therein, the instructions, upon execution by a processor system, configured to cause the processor system to at least:

obtain performance parameter data relating to a lithographic process;

obtain a fingerprint, across a region on a substrate, of an uncertainty metric of a performance parameter comprised within the performance parameter data, the performance parameter selected from: critical dimension, overlay and/or edge placement error;

obtain multiple process windows corresponding to multiple locations across the region, each process window representing a relation between the performance parameter and a yield of the lithographic process at its corresponding location;

use the fingerprint and multiple process windows to determine a probability of the performance parameter being outside an allowable range within the region; and

configure or control an aspect of a manufacturing or measurement process based on the determined probability and/or provide a signal representing, or based on, the determined probability to a tool or system for use by the tool or system in controlling or configuring an aspect of a manufacturing or measurement process.

12. The non-transitory computer-readable medium of claim 11 , wherein the performance parameter data further comprises values of the performance parameter and the instructions are further configured to cause the processor system to determine the probability of the performance parameter being outside the allowable range based on the values of the performance parameter.

13. The non-transitory computer-readable medium of claim 12 , wherein the values of the performance parameter correspond to multiple layers applied to the substrate.

14. The non-transitory computer-readable medium of claim 11 , wherein the uncertainty metric is proportional to a standard deviation of the performance parameter.

15. The non-transitory computer-readable medium of claim 11 , wherein the region comprises one or more dies on the substrate.

16. The non-transitory computer-readable medium of claim 15 , wherein the instructions are further configured to cause the processor system to integrate probability values across at least one die out of the one or more dies.

17. The non-transitory computer-readable medium of claim 11 , wherein the relation between the performance parameter and the yield is a graph expressing an expected yield as a function of a value of the performance parameter.

18. The non-transitory computer-readable medium of claim 11 , wherein the instructions are further configured to cause the processor system to use the fingerprint and multiple process windows to determine a critical location within the region where the probability of the performance parameter being outside an allowable range exceeds a specification value.

19. The non-transitory computer-readable medium of claim 18 , wherein the instructions are further configured to cause the processor system to label the critical location as a hotspot location.

20. A non-transitory computer-readable medium comprising instructions therein, the instructions, upon execution by a processor system, configured to cause the processor system to at least:

obtain performance parameter data relating to a lithographic process;

obtain a fingerprint, across a region on a substrate, of an uncertainty metric of a performance parameter comprised within the performance parameter data, the performance parameter selected from: critical dimension, overlay and/or edge placement error;

obtain multiple process windows corresponding to multiple locations across the region, each process window being associated with an allowable range of the performance parameter at its corresponding location;

use the fingerprint and multiple process windows to determine the probability of the performance parameter being outside an allowable range within the region; and

configure or control an aspect of a manufacturing or measurement process based on the determined probability and/or provide a signal representing, or based on, the determined probability to a tool or system for use by the tool or system in controlling or configuring an aspect of a manufacturing or measurement process.