Method of manufacturing semiconductor device and associated memory device
A method of manufacturing a semiconductor device is disclosed. The method includes providing a substrate including a channel region for conducting current; shaping the substrate to form a protruding plane, a bottom plane and a side plane connected between the protruding plane and the bottom plane for the channel region; forming an oxide layer covering the channel region; forming a ferroelectric material strip, extending in a first direction, on a protruding plane of the oxide layer; and forming a gate strip, extending in a second direction orthogonal with the first direction, on the ferroelectric material strip and a side plane and a bottom plane of the oxide layer.
1. A method of manufacturing a semiconductor device, comprising:
providing a substrate including a channel region for conducting current;
shaping the substrate to form a protruding plane, a bottom plane and a side plane connected between the protruding plane and the bottom plane for the channel region;
forming an oxide layer covering the channel region;
forming a ferroelectric material strip, extending in a first direction, on a protruding plane of the oxide layer; and
forming a gate strip, extending in a second direction orthogonal with the first direction, on the ferroelectric material strip and a side plane and a bottom plane of the oxide layer.
2. The method of claim 1 , wherein shaping the substrate comprises:
executing a photolithography operation upon the substrate to form the protruding plane, the side plane and the bottom plane.
3. The method of claim 1 , wherein forming the oxide layer covering the channel region comprises:
electroplating the oxide layer on the substrate to cover the protruding plane, the bottom plane and the side plane of the channel region.
4. The method of claim 1 , wherein forming the oxide layer covering the channel region comprises:
executing an atomic layer deposition (ALD), a physical vapor deposition (PVD), a chemical vapor phase deposition (CVD), a low pressure CVD (LPCVD) or an alternatively plasma enhanced CVD (PECVD) to form the oxide layer.
5. The method of claim 1 , wherein forming the ferroelectric material strip, extending in the first direction, on the protruding plane of the oxide layer comprises:
electroplating a ferroelectric material upon the protruding plane of the oxide layer to form the ferroelectric material strip.
6. The method of claim 1 , wherein forming the ferroelectric material strip, extending in the first direction, on the protruding plane of the oxide layer comprises:
executing an atomic layer deposition (ALD), a physical vapor deposition (PVD), a chemical vapor phase deposition (CVD), a low pressure CVD (LPCVD) or an alternatively plasma enhanced CVD (PECVD) to form the ferroelectric material strip.
7. The method of claim 1 , wherein forming the ferroelectric material strip, extending in the first direction, on the protruding plane comprises:
depositing a ferroelectric material layer upon the oxide layer; and
shaping the ferroelectric: material layer to make the side plane and the bottom plane of the oxide layer free from being covered by the ferroelectric material layer.
8. The method of claim 1 , wherein shaping the ferroelectric material layer comprises;
disposing a photomask above a part of the ferroelectric material layer, wherein the part of the ferroelectric material layer is located above the protruding plane; and
executing a photolithography operation upon the ferroelectric material layer to form the ferroelectric material strip.
9. The method of claim 1 , wherein an angle between the side plane and the bottom plane ranges from 70 to 90 degrees.
10. The method of claim 1 , wherein a length of the side plane of the channel region along a direction from the protruding plane to the bottom plane ranges from 15 to 80 nm.
11. The method of claim 1 , wherein a length of the bottom plane of the channel region along the second direction ranges from 15 to 50 nm.
12. The method of claim 1 , wherein a length of the protruding plane of the channel region along the second direction ranges from 15 to 50 nm.
13. The method of claim 1 , wherein a thickness of the protruding plane of the oxide layer ranges from 1 to 6 nm.
14. The method of claim 1 , wherein a thickness of the side plane of the oxide layer ranges from 1 to 6 nm.
15. The method of claim 1 , wherein a thickness of the bottom plane of the oxide layer ranges from 15 to 50 nm.
16. A method of manufacturing a semiconductor device, comprising:
providing a substrate;
forming a gate electrode layer on the substrate;
generating a trench on the gate electrode layer, wherein a top surface of the substrate is exposed by the trench;
depositing a ferroelectric material layer on a part of a sidewall of the trench;
depositing an oxide layer around the sidewall of the trench, wherein a part of the oxide layer is surrounded by the ferroelectric material layer; and
filling a channel layer into the trench.
17. The method of claim 16 , wherein cross-sectional area of the channel layer is circular or rectangular.
18. The method of claim 16 , wherein the ferroelectric material layer surrounds 25 to 75% of the oxide layer.
19. A memory device, comprising:
a plurality of memory cells connected in series, each memory cell includes a first transistor, a second transistor and a capacitor, wherein the first transistor and the second transistor share a gate terminal, a source terminal and a drain terminal, and the capacitor is connected to the gate terminal; and
a selection transistor connected to one end of the plurality of memory cells in series.
20. The memory device of claim 19 , wherein the first transistor includes a ferroelectric field effect transistor (FeFET), and the capacitor includes a ferroelectric capacitor (FeCAP).