Hard surface cleaning compositions with reduced surface tension

1. A hard surface cleaning composition comprising:

from about 5 wt. % to less than 10 wt. % of an anionic surfactant, wherein the anionic surfactant is sulfated, sulfonated, and/or carboxylated;

from about 3 wt. % to about 6 wt. % of an amphoteric surfactant, wherein the amphoteric surfactant comprises an amine oxide, a betaine, a sultaine, or a mixture thereof;

from about 0.5 wt. % to about 2 wt. % of a nonionic surfactant, wherein the nonionic surfactant is a C8-C18 linear or branched, alkoxylated surfactant;

from about 0.01 wt. % to about 10 wt. % of a water conditioning agent comprising a polycarboxylic acid polymer;

an alkalinity source comprising an alkanolamine; and

water;

wherein the hard surface cleaning composition has a viscosity of 100 cps or less.

2. The hard surface cleaning composition of claim 1 , wherein the composition further comprises an alkaline pH modifier, and wherein the alkaline pH modifier provides a pH of between about 7 and about 14 when in a use solution.

3. The hard surface cleaning composition of claim 1 , wherein the composition further comprises an acidic pH modifier, and wherein the acidic pH modifier provides a pH of between about 1 and about 7 when in a use solution.

4. The hard surface cleaning composition of claim 1 , wherein the composition further comprises a dye, a fragrance, an oxidizer, a solvent, or a mixture thereof.

5. The hard surface cleaning composition of claim 1 , wherein the anionic surfactant comprises a linear or branched C8-22 alkyl benzene sulfonate, an alpha olefin sulfonate, a C8-C18 linear or branched alkyl sulfate, an alkyl ether sulfate, or a mixture thereof.

6. The hard surface cleaning composition of claim 1 , wherein the amphoteric surfactant comprises linear or branched, alkoxylated or unalkoxylated C8-C18 amine oxide, amidebetaine, or a mixture thereof.

7. The hard surface cleaning composition of claim 1 , wherein the alkalinity source is present in an amount of between about 1 wt. % and about 30 wt. %.

8. The hard surface cleaning composition of claim 1 , wherein the water conditioning agent is present in an amount of between about 0.1 wt. % and about 5 wt. %.

9. The hard surface cleaning composition of claim 1 , wherein the composition is a ready-to-use cleaning composition having between about 25 ppm and about 10000 ppm of the anionic surfactant, and between about 25 ppm and about 10000 ppm of the amphoteric surfactant.

10. The hard surface cleaning composition of claim 9 , wherein the composition comprises the nonionic surfactant in a concentration between about 0.1 ppm and about 5000 ppm.

11. The hard surface cleaning composition of claim 1 , wherein the water conditioning agent is present in an amount of between about 0.1 ppm and about 500 ppm.

12. The hard surface cleaning composition of claim 2 , wherein the alkaline pH modifier is in a concentration between about 25 ppm and about 10,000 ppm.

13. The hard surface cleaning composition of claim 1 , wherein the cleaning composition has a surface tension of less than about 26 dynes.

14. A method of cleaning a hard surface comprising:

contacting the surface with the hard surface cleaning composition of claim 1 ; wherein at least 50% of the soil is removed from the surface.

15. The method of claim 14 , further comprising rinsing the surface.

16. The method of claim 14 , wherein the contacting is performed by spraying, wiping, pouring, and/or mopping the surface with the hard surface cleaning composition.

17. The composition of claim 1 , wherein the alkanolamine source comprises monoethanolamine, diethanolamine, triethanolamine, monopropanolamine, dipropanolamine, tripropanolamine, or a mixture thereof.

18. The composition of claim 1 , wherein the composition is free of acetate solvents.