IP Library Granted Patent US 11,255,018
Granted Patent B2
US 11,255,018 · App. 16/948,597 · Granted Feb 22, 2022

Methods for producing an etch resist pattern on a metallic surface

Inventors: Nava Shpaisman (Kedumim, IL); Moshe Frenkel (Jerusalem, IL)
Assignee: KATEEVA, LTD.
C23F1/02B41M5/0058C09D11/101C09D11/30C23F1/00G03F1/50G03F7/2018H01L51/0004H01L51/0005H05K3/0002H05K3/0017H05K3/0079H05K3/061H05K2203/013H05K2203/0392H05K2203/0582H05K2203/1173
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Quick Facts
Patent No.
US 11,255,018
App. No.
16/948,597
Granted
Feb 22, 2022
Kind
B2
Abstract

A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.

Claims (35)

1. A method of forming a metallic pattern on a substrate, the method comprising:

activating a metallic surface of a substrate by applying an aqueous solution comprising an inorganic activating agent onto the metallic surface;

after chemically activating the metallic surface, selectively printing an etch-resist ink onto the metallic surface;

reacting a component of the etch-resist ink with ions of the metallic surface to produce an etch-resist mask;

performing an etching process to remove portions of the metallic surface that are not covered by the etch-resist mask; and

removing the etch-resist mask to form the metallic pattern.

2. The method of claim 1 , wherein the metallic pattern formed by performing the etching process comprises multiple metallic lines each of the multiple metallic lines having a width of less than 50 microns.

3. The method of claim 1 , wherein the etch-resist mask produced from the printing comprises lines having a width of less than 50 microns.

4. The method of claim 1 , wherein the performing the etching process comprises forming metallic lines having a width of less than 30 microns.

5. The method of claim 1 , further comprising, prior to printing, removing the chemically surface-activating aqueous solution from the activated metallic surface using a solvent.

6. The method of claim 1 , wherein the ink component that reacts with the activated metallic surface is a polymeric component comprising an acrylate, a phosphate, a sulfonate, or any combination thereof.

7. The method of claim 1 , wherein the inorganic activating agent comprises one or more materials selected from the group consisting of a copper salt, a ferric salt, a chromic-sulfuric acid, a persulfate salt, sodium chlorite, and hydrogen peroxide.

8. The method of claim 1 , wherein applying the aqueous solution comprises immersing the metallic surface in a bath of the aqueous solution for about 10-60 seconds or spraying the aqueous solution onto the metallic surface.

9. The method of claim 1 , wherein selectively printing the etch-resist ink onto the metallic surface comprises ink-jet printing.

10. The method of claim 1 , wherein the etch-resistant ink comprises a dye.

11. The method of claim 1 , wherein the metallic surface comprises copper and the ions of the metallic surface comprise copper cations.

12. A method of forming a metallic pattern on a substrate, the method comprising:

activating a metallic surface of a substrate by applying an aqueous solution comprising an inorganic activating agent onto the metallic surface;

after chemically activating the metallic surface, ink-jet printing an ink comprising a polymeric component onto the metallic surface;

reacting a component of the ink with ions of the metallic surface to produce a resist;

performing an etching process to remove portions of the metallic surface that are not covered by the resist; and

removing the resist to form the metallic pattern.

13. The method of claim 12 , wherein the performing the etching process comprises forming multiple metallic lines each of the multiple metallic lines having a width of less than 50 microns.

14. The method of claim 12 , wherein the polymeric component comprises an acrylate, a phosphate, a sulfonate, or any combination thereof.

15. The method of claim 1 , wherein the inorganic activating agent comprises one or more materials selected from the group consisting of a copper salt, a ferric salt, a chromic-sulfuric acid, a persulfate salt, sodium chlorite, and hydrogen peroxide.

16. The method of claim 1 , wherein the ink comprises a dye.

17. The method of claim 1 , wherein the component of the ink reacts with copper ions of the metallic surface.

18. A method of forming a metallic pattern on a substrate, the method comprising:

activating a metallic surface of a substrate by applying an aqueous solution comprising an inorganic activating agent selected from the group consisting of a copper salt, a ferric salt, a chromic-sulfuric acid, a persulfate salt, sodium chlorite, and hydrogen peroxide onto the metallic surface;

after chemically activating the metallic surface, ink-jet printing an ink comprising an acrylate, a phosphate, a sulfonate, or a combination thereof onto the metallic surface;

reacting a component of the ink with copper ions of the metallic surface to produce a resist;

performing an etching process to remove portions of the metallic surface that are not covered by the resist; and

removing the resist to form the metallic pattern.

19. The method of claim 18 , wherein the performing the etching process comprises forming metallic lines having a width of less than 30 microns.

20. The method of claim 18 , wherein the ink comprises a dye.

Assignments (3)
SECURITY INTEREST Recorded Apr 19, 2022
From: KATEEVA CAYMAN HOLDING, INC.
To: HB SOLUTION CO., LTD.
Reel/Frame 059727/0111 →
SECURITY INTEREST Recorded Mar 17, 2022
From: KATEEVA, INC.; KATEEVA CAYMAN HOLDING, INC.
To: SINO XIN JI LIMITED
Reel/Frame 059382/0053 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 19, 2020
From: SHPAISMAN, NAVA
To: KATEEVA, INC.
Reel/Frame 054100/0673 →
Continuity (3)
Continuation 15751866
Provisional Application 62204508 · Aug 13, 2015
Related Publication 20210007225A1 · Jan 7, 2021
Cited By (2)
US 12,270,111 US 12,414,239