Optical diffraction component for suppressing at least one target wavelength by destructive interference
An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength λ 1 . A second of the diffraction structure groups is configured to suppress a second target wavelength λ 2 , where (λ 1 −λ 2 ) 2 /(λ 1 +λ 2 ) 2 <20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.
1. A component, comprising:
a periodic grating structure profile having a grating period which comprises first, second, third and fourth structure sections,
wherein:
the first structure section has a neutral structure level;
the second structure section has the neutral structure level;
the third structure section has a positive structure level which is above the neutral structure level;
the fourth structure section has a negative structure level which is below the neutral structure level;
the neutral, positive and negative structure levels define a topography of the grating period that is repeated regularly along a direction; and
along the direction, the structure sections have the same length within +/−20%.
2. The component of claim 1 , wherein, along the direction, the structure sections have the following sequence: the third structure section; the first structure section; the fourth structure section; and the second structure section.
3. The component of claim 1 , wherein, along the direction, the third structure section is between the first and second structure sections.
4. The component of claim 1 , wherein, along the direction, the fourth structure section is between the first and second structure sections.
5. The component of claim 1 , wherein, along the direction, the first, second, third and fourth structure sections have the same length within +/−15%.
6. The component of claim 1 , wherein:
the first, second, third and fourth structure sections are configured so that a wavelength range including a first infrared wavelength, λ 1 , is diffracted by the periodic grating structure profile; and
the positive structure level is higher than the neutral structure level by an optical path length of λ 1 /4+/−20%.
7. The component of claim 6 , wherein the negative structure level is lower than the neutral structure level by an optical path length of λ 1 /4+/−20%.
8. The component of claim 1 , wherein:
the first, second, third and fourth structure sections are configured so that a wavelength range including a first infrared wavelength, λ 1 , is diffracted by the periodic grating structure profile; and
the negative structure level is lower than the neutral structure level by an optical path length of λ 1 /4+/−20%.
9. The component of claim 1 , wherein:
the first, second, third and fourth structure sections are configured so that a wavelength range including a first infrared wavelength, λ 1 , is diffracted by the periodic grating structure profile; and
the wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the first infrared wavelength, λ 1 ; the + first order of diffraction of the first infrared wavelength, λ 1 ; and the − first order of diffraction of the first infrared wavelength, λ 1 .
10. The component of claim 9 , wherein:
the wavelength range further comprises a second infrared wavelength, λ 2 , which is different from the first infrared wavelength, λ 1 ;
the wavelength range comprises radiation components which interfere with one each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the second infrared wavelength, λ 2 ; the + first order of diffraction of the second infrared wavelength, λ 2 ; and the − first order of diffraction of the second infrared wavelength, λ 2 .
11. The component of claim 10 , wherein (λ 1 −λ 2 ) 2 /(λ 1 +λ 2 ) 2 <20%.
12. The component of claim 9 , wherein (λ 1 −λ 2 ) 2 /(λ 1 +λ 2 ) 2 <20%.
13. The component of claim 1 , wherein:
the first, second, third and fourth structure sections are configured so that a first wavelength range including a first wavelength, λ 1 , is diffracted by the periodic grating structure profile;
the first wavelength, λ 1 , is an infrared wavelength;
the first wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the first wavelength, λ 1 ; the + first order of diffraction of the first wavelength, λ 1 ; and the − first order of diffraction of the first wavelength, λ 1 ;
the first, second, third and fourth structure sections are configured so that a second wavelength range including a second wavelength, λ 2 , is diffracted by the periodic grating structure profile;
the second wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the second wavelength, λ 2 ; the + first order of diffraction of the second wavelength, λ 2 ; and the − first order of diffraction of the second wavelength, λ 2 ; and
the second wavelength, λ 2 , is a wavelength selected from the group consisting of a near infrared wavelength, an ultraviolet wavelength and a deep ultraviolet wavelength.
14. A collector, comprising:
a component according to claim 1 ,
wherein the collector is a lithography collector.
15. An illumination system, comprising:
a lithography collector comprising a component according to claim 1 ; and
an illumination optical unit configured to illuminate an object field.
16. An optical system, comprising:
a lithography collector comprising a component according to claim 1 ;
an illumination optical unit configured to illuminate an object field; and
a projection optical unit configured to image the object field into an image field.
17. An apparatus, comprising:
a light source;
a lithography collector comprising a component according to claim 1 ;
an illumination optical unit configured to illuminate an object field; and
a projection optical unit configured to image the object field into an image field, wherein the apparatus is a projection exposure apparatus.
18. A component, comprising:
a periodic grating structure profile having a grating period,
wherein:
the periodic grating structure profile comprises diffraction structures configured so that a first wavelength range including a first infrared wavelength, λ 1 , is diffracted by the periodic grating structure profile;
the first wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the first infrared wavelength, λ 1 ; the + first order of diffraction of the first infrared wavelength, λ 1 ; and the − first order of diffraction of the first infrared wavelength, λ 1 ;
the first wavelength range comprises a second infrared wavelength, λ 2 , which is different from the first infrared wavelength, λ 1 ;
the diffraction structures are configured so that a second wavelength range including the second infrared wavelength, λ 2 , is diffracted by the periodic grating structure profile;
the second wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the second infrared wavelength, λ 2 ; the + first order of diffraction of the second infrared wavelength, λ 2 ; and the − first order of diffraction of the second infrared wavelength, λ 2 ;
(λ 1 −λ 2 ) 2 /(λ 1 +λ 2 ) 2 <20%; and
the periodic grating structure profile comprises exactly three different structure levels so that each diffraction structure has a structure level selected from one of the three different structure levels.
19. A component, comprising:
a periodic grating structure profile having a grating period,
wherein:
the periodic grating structure profile comprises diffraction structures configured so that a first wavelength range including a first wavelength, λ 1 , is diffracted by the periodic grating structure profile;
the first wavelength, λ 1 , is an infrared wavelength;
the first wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the first wavelength, λ 1 ; the + first order of diffraction of the first wavelength, λ 1 ; and the − first order of diffraction of the first wavelength, λ 1 ;
the diffraction structures are configured so that a second wavelength range including a second wavelength, λ 2 , is diffracted by the periodic grating structure profile;
the second wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the second wavelength, λ 2 ; the + first order of diffraction of the second wavelength, λ 2 ; and the − first order of diffraction of the second wavelength, λ 2 ;
the second wavelength, λ 2 , is a wavelength selected from the group consisting of a near infrared wavelength, an ultraviolet wavelength and a deep ultraviolet wavelength; and
the periodic grating structure profile comprises exactly three different structure levels so that each diffraction structure has a structure level selected from one of the three different structure levels.
20. A component, comprising:
a periodic grating structure profile having a grating period,
wherein:
the periodic grating structure profile comprises diffraction structures configured so that a first wavelength range including a first wavelength, λ 1 , is diffracted by the periodic grating structure profile;
the first wavelength, λ 1 , is an infrared wavelength;
the first wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the first wavelength, λ 1 ; the + first order of diffraction of the first wavelength, λ 1 ; and the − first order of diffraction of the first wavelength, λ 1 ;
the diffraction structures are configured so that a second wavelength range including a second wavelength, λ 2 , is diffracted by the periodic grating structure profile;
the second wavelength range comprises radiation components which interfere with each other destructively in at least one order of diffraction selected from the group consisting of: the zero order of diffraction of the second wavelength, λ 2 ; the + first order of diffraction of the second wavelength, λ 2 ; and the − first order of diffraction of the second wavelength, λ 2 ;
the second wavelength, λ 2 , is a wavelength selected from the group consisting of an ultraviolet wavelength and a deep ultraviolet wavelength.