Plasma processing apparatus
A plasma processing apparatus includes a processing chamber in which a sample is subjected to plasma processing, a first radio frequency power supply that supplies radio frequency power for generating plasma, a sample stage on which the sample is mounted, and a second radio frequency power supply that supplies radio frequency power to the sample stage, the plasma processing apparatus further includes a DC power supply that applies a DC voltage, that is changed according to a periodically repeated waveform, to the sample stage, and the waveform of one cycle has a period in which amplitude changes by a predetermined amount or more during a predetermined time. Accordingly, charged particles on a wafer surface are removed, a trench shape with high verticality can be obtained, and damage to a film that is not to be etched inside a trench can be reduced.
1. A plasma processing apparatus, comprising:
a processing chamber in which a sample is subjected to plasma processing;
a first radio frequency power supply that supplies radio frequency power for generating plasma;
a sample stage including a film that electrostatically attracts the sample, and on which the sample is mounted;
a second radio frequency power supply that supplies radio frequency power to the sample stage; and
a first DC power supply that applies a first DC voltage to an electrode provided to an inner side of the film, wherein
the plasma processing apparatus further comprises a second DC power supply that supplies a second DC voltage that is changed according to a periodically repeated waveform to the electrode,
the second DC power supply applies the second DC voltage to the electrode via a capacitor,
the second radio frequency power supply applies the radio frequency power to the electrode via the capacitor,
the waveform of one cycle has a period in which amplitude changes by a predetermined amount or more during a predetermined time, and
rising and falling time constants of the waveform are 0.43 ms or more, respectively.
2. The plasma processing apparatus according to claim 1 , wherein
a change time and a change amount of the amplitude are a change time and a change amount of amplitude that maintains 10% or more of a maximum value of a current generated in the sample by the waveform for 1 ms or more.
3. The plasma processing apparatus according to claim 1 , wherein
the waveform is a triangular wave.
4. The plasma processing apparatus according to claim 1 , wherein
the radio frequency power to be supplied to the sample stage is supplied to the sample stage when the second DC voltage is applied to the electrode.
5. The plasma processing apparatus according to claim 1 , wherein
a frequency of the waveform is 500 Hz or less.
6. The plasma processing apparatus according to claim 1 , wherein
the waveform is a rectangular wave.
7. A plasma processing apparatus, comprising:
a processing chamber in which a sample is subjected to plasma processing;
a first radio frequency power supply that supplies radio frequency power for generating plasma;
a sample stage on which the sample is mounted; and
a second radio frequency power supply that supplies radio frequency power to the sample stage, wherein
the plasma processing apparatus further comprises a DC power supply that applies a DC voltage, that is changed according to a periodically repeated waveform, to the sample stage,
the waveform of one cycle has a period in which amplitude changes by a predetermined amount or more during a predetermined time,
wherein a ratio of a time during which the DC voltage rises to a time during which the DC voltage falls is a value obtained by dividing a predetermined value by a value obtained by subtracting the predetermined value from 1, and
the predetermined value is a value obtained by dividing mobility of ions by a sum of mobility of electrons in a dielectric on the sample and the mobility of the ions in the dielectric.
8. The plasma processing apparatus according to claim 7 , wherein a frequency of the waveform is 1000 times the smaller value of the value obtained by subtracting the predetermined value from 1 and the predetermined value where a unit of the frequency is Hz.
9. The plasma processing apparatus according to claim 7 , wherein the waveform is a triangular wave.
10. The plasma processing apparatus according to claim 7 , wherein
the sample stage includes an electrode that electrostatically attracts the sample, and
the DC voltage is applied to the electrode.
11. The plasma processing apparatus according to claim 7 , wherein
the radio frequency power to be supplied to the sample stage is supplied to the sample stage when the DC voltage is applied to the sample stage.
12. The plasma processing apparatus according to claim 7 , wherein a frequency of the waveform is 500 Hz or less.
13. The plasma processing apparatus according to claim 7 , wherein
the waveform is a rectangular wave, and
rising and falling time constants of the rectangular wave are 0.43 ms or more, respectively.