Metal or metal alloy deposition composition and plating compound
The present invention concerns a metal or metal alloy deposition composition, particularly a copper or copper alloy deposition composition, for electrolytic deposition of a metal or metal alloy layer, particularly for electrolytic deposition of a copper or copper alloy layer, comprising at least one type of metal ions to be deposited, preferably copper ions, and at least one imidazole based plating compound. The present invention further concerns a method for preparation of the plating compound, the plating compound itself and its use in a metal or metal alloy deposition composition. The inventive metal or metal alloy deposition composition can be preferably used for filling recessed structures, in particular those having higher diameter to depth aspect ratios.
1. A metal or metal alloy deposition composition, for electrolytic deposition of a metal or metal alloy layer, comprising
a) at least one type of metal ions to be deposited,
b) at least one plating compound comprising at least one structural unit represented by formula (1)
wherein
each R 1 and R 2 are independently selected from the group consisting of hydrogen and alkyl group;
each X 1 and X 2 are independently selected from the group consisting of
-a structural unit represented by formula (X-1)
wherein
Y 1 is an alkanediyl group;
each R 11 is independently selected from the group consisting of hydrogen, alkyl group, aryl group, and alkaryl group;
b is an integer ranging from 1 to 10; and
-a structural unit represented by formula (X-2)
wherein R 21 , R 22 , R 23 , R 24 and R 25 are independently selected from the group consisting of hydrogen, C1-C4-alkyl group;
c is an integer selected from 1, 2, 3, 4, 5 and 6;
d is an integer selected from 1 and 2;
e is an integer selected from 1, 2, 3, 4, 5 and 6;
with the proviso that at least one of X 1 and X 2 is a structural unit represented by formula (X-1);
and a is an integer ranging from 1 to 10.
2. The metal or metal alloy deposition composition of claim 1 characterized in that R 1 and R 2 are independently selected from the group consisting of hydrogen and C1-C4-alkyl group.
3. The metal or metal alloy deposition composition of claim 1 characterized in that Y 1 is a C1-C12-alkanediyl group.
4. The metal or metal alloy deposition composition of claim 1 characterized in that R 11 is selected from the group consisting of hydrogen, C1-C4-alkyl group and phenyl group.
5. The metal or metal alloy deposition composition of claim 1 characterized in that integer a ranges from 1 to 8.
6. The metal or metal alloy deposition composition of claim 1 characterized in that integer b ranges from 1 to 6.
7. The metal or metal alloy deposition composition of claim 1 characterized in that the plating compound is represented by formula (2)
wherein
R 3 and R 4 are independently selected from the group consisting of hydrogen and alkyl group; and
X 3 is selected from the group consisting of a structural unit represented by formula (X-1) and a structural unit represented by formula (X-2).
8. The metal or metal alloy deposition composition of claim 1 characterized in that X 1 and X 2 are both structural units represented by formula (X-1).
9. The metal or metal alloy deposition composition of claim 8 characterized in that X 1 and X 2 are structurally different.
10. The metal or metal alloy deposition composition of claim 1 characterized in that a first one of X 1 or X 2 is a structural unit represented by formula (X-1) and a second one of X 1 or X 2 is a structural unit represented by formula (X-2).
11. The metal or metal alloy deposition composition of claim 1 wherein the composition is a copper or copper alloy deposition composition.
12. The metal or metal alloy deposition composition of claim 1 wherein R 1 and R 2 are independently selected from the group consisting of hydrogen and C1-C2-alkyl group.
13. The metal or metal alloy deposition composition of claim 1 wherein Y 1 is a C2-C6-alkanediyl group.
14. The metal or metal alloy deposition composition of claim 1 wherein R1 and R2 are independently selected from the group consisting of hydrogen and C1-C2-alkyl group and wherein Y1 is a C2-C6-alkanediyl group.