Refractive index shaping laser writing process control

1. A refractive index writing system comprising:

a pulsed laser source for providing a pulsed laser output at a first wavelength;

an objective lens for focusing the pulsed laser output to a focal spot in an optical material;

a scanner for relatively moving the focal spot with respect to the optical material at a relative speed and direction along a scan region for writing one or more traces in the optical material defined by a change in refractive index; and

a controller for controlling laser exposures along the one or more traces in accordance with a calibration function for the optical material to achieve a desired refractive index profile in the optical material by varying a laser power and/or relative scan speed for maintaining an energy profile within the optical material along the scan region above a nonlinear absorption threshold of the optical material and below a breakdown threshold of the optical material at which significant light scattering or absorption degrades an intended performance of the optical material;

wherein the refractive index writing system is for writing traces in in vivo optical tissue, and the controller is configured with a calibration function obtained by calibrating refractive index change induced in test ocular tissue by femtosecond laser writing as a function of laser exposure by: writing test patterns in sections of one or more enucleated ocular globes with a femtosecond laser at different laser exposures for different sections of the test patterns; and determining the induced refractive index change in the written patterns relative to unmodified tissue in areas surrounding the written patterns as a function of the laser exposure from interferograms taken of the written patterns and surrounding areas in their natural curved orientation.

2. The writing system of claim 1 , wherein the calibration function is obtained by calibrating refractive index change induced in test ocular tissue by femtosecond laser writing as a function of laser exposure by:

writing test patterns in sections of one or more enucleated ocular globes with a femtosecond laser at different laser exposures for different sections of the test patterns;

dissecting portions of the one or more enucleated ocular globes including the sections having test patterns written in them and surrounding areas from the enucleated globes;

mounting the dissected portions into a wetcell with the portions placed in their natural curved orientation in the wetcell; and

determining the induced refractive index change in the written patterns relative to unmodified tissue in the portions as a function of the laser exposure from interferograms taken of the mounted dissected portion with an interferometer.

3. The writing system of claim 1 in which the pulsed laser source is arranged for producing a collimated output beam composed of a succession of pulses having a pulse energy between 0.01 nJ and 10 nJ, a pulse duration between 8 fs and 500 fs, and a repetition rate between 10 MHz and 500 MHz.

4. The writing system of claim 1 , further comprising a real-time process control monitor for detecting emissions from the optical material transmitted through the objective lens at a second wavelength while writing the one or more traces, comprising a photodetector, a lens for focusing the emissions transmitted through the objective lens onto the photodetector, and a filter for passing emissions at the second wavelength to the detector and blocking back-reflected pulse laser light of the first wavelength from the photodetector; and wherein the controller is further configured for further controlling the laser exposure in response to an emission from the optical material at the second wavelength detected by the real-time process control monitor.

5. The writing system of claim 4 , wherein the controller is configured to reduce or stop laser exposure along the one or more traces in response to a detected emission at the second wavelength outside a predetermined detected emission intensity range.

6. The writing system of claim 5 , wherein the process control monitor is configured to detect plasma luminescence emissions at the second wavelength.

7. The writing system of claim 5 , wherein the process control monitor is configured to detect backscattered second harmonic generation at the second wavelength.

8. The writing system of claim 4 , wherein the real-time process control monitor comprises multiple filter elements for selectively passing different wavelengths of back reflected light or emissions to the photodetector.

9. The writing system of claim 4 , wherein the real-time process control monitor comprises multiple filter elements and multiple photodetectors for simultaneously detecting back reflected light or emissions at different wavelengths.

10. The writing system of claim 9 in which the photodetectors are each photodiodes.

11. The writing system of claim 4 in which the photodetector is a photodiode.

12. The writing system of claim 4 , wherein the real-time process control monitor further comprises an additional filter for selectively passing two-photon fluorescence emissions from the optical material transmitted through the objective lens to the detector.

13. The writing system of claim 1 , further comprising an ocular patient interface comprising a vacuum suction ring for coupling the writing system to a cornea of a patient.

14. A method of writing localized refractive index changes in optical materials with a pulsed laser source providing a pulsed laser output at a first wavelength within energy regimes above a nonlinear absorption threshold of the optical materials and below a breakdown threshold of the optical materials at which significant light scattering or absorption degrades their intended performance, wherein the method employs a refractive index writing system in accordance with claim 1 and comprising steps of:

producing a collimated output beam composed of a succession of pulses having a pulse energy between 0.01 nJ and 10 nJ, a pulse duration between 8 fs and 500 fs, and a repetition rate between 10 MHz and 500 MHz;

focusing the beam with an objective lens to a focal spot within the optical material;

relatively moving the objective lens with respect to the optical material at a relative speed and relative direction to write one or more traces defined by a change in refractive index of the optical material; and

controlling laser exposures along the one or more traces in accordance with a calibration function for the optical material to achieve a desired refractive index profile in the optical material by varying a laser power and/or relative scan speed to maintain an energy profile within the optical material along a scan region above a nonlinear absorption threshold of the optical material and below a breakdown threshold of the optical material at which significant light scattering or absorption degrades an intended performance of the optical material;

wherein the optical material is in vivo optical tissue, and further comprising wherein the calibration function for the optical material is obtained by calibrating refractive index change induced in test ocular tissue by femtosecond laser writing as a function of laser exposure by: writing test patterns in sections of one or more enucleated ocular globes with a femtosecond laser at different laser exposures for different sections of the test patterns; and determining the induced refractive index change in the written patterns relative to unmodified tissue in areas surrounding the written patterns as a function of the laser exposure from interferograms taken of the written patterns and surrounding areas in their natural curved orientation.

15. The method of claim 14 , further comprising detecting emissions from the optical material transmitted through the objective lens at a second wavelength while writing the one or more traces by focusing the emissions transmitted through the objective lens onto a photodetector and blocking back-reflected pulse laser light of the first wavelength from the photodetector; and further controlling the laser exposure in response to a detected emission from the optical material at the second wavelength.

16. The method of claim 15 , wherein the laser exposure is reduced or stopped along the one or more traces in response to a detected emission at the second wavelength outside a predetermined detected emission intensity range.

17. The method of claim 16 , wherein the detected emission at the second wavelength is plasma luminescence.

18. The method of claim 16 , wherein the detected emission at the second wavelength is backscattered second harmonic generation.

19. The method of claim 15 , wherein the real-time process control monitor further comprises an additional filter for selectively passing two-photon fluorescence emissions from the optical material transmitted through the objective lens to the detector, and further comprising monitoring two-photon fluorescence emissions from the optical material prior to writing the one or more scans to determine concentration of two-photon fluorescence emitter in the optical material.