IP Library › Granted Patent US 11,762,135
Granted Patent B2
US 11,762,135 · App. 16/980,425 · Granted Sep 19, 2023

Device and method for producing master diffraction grating

Inventor: Yuki Oue (Kyoto, JP)
Assignee: Shimadzu Corporation
G02B5/1857G03F7/0005G03H1/2202G03H2001/2231G03H2223/23
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Quick Facts
Patent No.
US 11,762,135
App. No.
16/980,425
Granted
Sep 19, 2023
Kind
B2
Abstract

A device for producing a master diffraction grating includes a light source unit and a reflecting member 11 . The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate 101 with light. The reflecting member 11 reflects the light from the light source unit reflected on the substrate surface of the master substrate 101 and guides the light again to the substrate surface side to form a second interference fringe. A resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate 101.

Claims (18)

1. A device for producing a master diffraction grating serving as a matrix for producing a replica diffraction grating, the device comprising:

a light source unit for forming a first interference fringe by irradiating a substrate surface of a master substrate with light; and

a reflecting member for reflecting light from the light source unit reflected on the substrate surface of the master substrate and guiding the light again to the substrate surface, so that a second interference fringe is formed, wherein

a resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate.

2. The device for producing a master diffraction grating according to claim 1 , wherein

the reflecting member is disposed at a position displaced along a direction parallel to a direction in which the first interference fringe extends, with respect to an optical axis of light from the light source unit.

3. The device for producing a master diffraction grating according to claim 2 , wherein

the light source unit includes a condenser lens, a pinhole through which light condensed by the condenser lens passes, and a concave mirror for making light that has passed through the pinhole parallel, and

the reflecting member is disposed between the concave mirror and the substrate surface of the master substrate.

4. A method for producing a master diffraction grating serving as a matrix for producing a replica diffraction grating, the method comprising:

a resist pattern forming step of forming a first interference fringe by irradiating a substrate surface of a master substrate with light from a light source unit, and forming a second interference fringe by reflecting light from the light source unit reflected on the substrate surface of the master substrate on a reflecting member and guiding again the light to the substrate surface, so as to form a resist pattern based on the first interference fringe and the second interference fringe on the substrate surface of the master substrate;

a grating pattern forming step of forming a grating pattern having a grating groove on the substrate surface of the master substrate by performing etching using the resist pattern as a mask; and

a film forming step of forming a metal thin film on the grating pattern.

5. The method for producing a master diffraction grating according to claim 4 , wherein

the reflecting member is disposed at a position displaced along a direction parallel to a direction in which the first interference fringe extends, with respect to an optical axis of light from the light source unit.

6. The method for producing a master diffraction grating according to claim 5 , wherein

the light source unit includes a condenser lens, a pinhole through which light condensed by the condenser lens passes, and a concave mirror for making light that has passed through the pinhole parallel, and

the reflecting member is disposed between the concave mirror and the substrate surface of the master substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2020
From: OUE, YUKI
To: SHIMADZU CORPORATION
Reel/Frame 053766/0884 →
Continuity (1)
Related Publication 20210003752A1 · Jan 7, 2021