Method of manufacturing a display apparatus having a first and a second heat shrink layer on a heating pattern

1. A method of manufacturing a display apparatus, comprising:

forming a heating pattern having a conductivity in an opening peripheral area on a base substrate, wherein the base substrate includes a display area, an opening area, and the opening peripheral area between the opening area and the display area, wherein the display area surrounds the opening area, and the opening peripheral area has an annular shape;

forming a first heat shrink layer having a first heat shrink rate on the heating pattern;

forming a second heat shrink layer having a second heat shrink rate greater than the first heat shrink rate on the first heat shrink layer;

forming a light emitting layer including an organic material on the second heat shrink layer and the base substrate;

applying a magnetic field to the heating pattern to generate an induction current to heat the first and second heat shrink layers; and

removing a portion of the light emitting layer formed on the second heat shrink layer.

2. The method of claim 1 , wherein in forming the first and second beat shrink layers, an edge of the second heat shrink layer is formed to cover an edge of the first heat shrink layer.

3. The method of claim 2 , further comprising:

forming a thin film encapsulation layer including a first inorganic layer, an organic layer, and a second inorganic layer on the light emitting layer, after removing the portion of the light emitting layer,

wherein the organic layer of the thin film encapsulation layer is not formed in the opening peripheral area, wherein the first inorganic layer and the second inorganic layer of the thin film encapsulation layer contact each other, and

the first inorganic layer covers a side surface of the light emitting layer disposed in the opening peripheral area.

4. The method of claim 3 , further comprising:

forming a hole penetrating the display apparatus in the opening area after forming the thin film encapsulation layer.

5. The method of claim 4 , wherein in forming the hole,

a portion of the heating pattern is removed, wherein side surfaces of the heating pattern are exposed at a cutting surface providing the hole.

6. The method of claim 4 , wherein in forming the hole,

a cutting surface providing the hole is spaced apart from the light emitting layer formed in the opening peripheral area.

7. The method of claim 1 , wherein in applying the magnetic field,

the magnetic field is provided by an induction heater including a coil and an alternating current generator.

8. The method of claim 7 , wherein the heating pattern is formed to have an annular shape in the opening peripheral area, and

wherein in forming the first and second heat shrink layers,

the first and second heat shrink layers are formed in a shape of a circle overlapping the heating pattern.

9. The method of claim 1 , further comprising:

forming a thin film encapsulation layer on the light emitting layer before removing the portion of the light emitting layer, and

wherein in removing the portion of the light emitting layer, the first and second heat shrink layers, the portion of the light emitting layer formed on the second heat shrink layer, and a portion of the thin film encapsulation layer formed on the light emitting layer are removed.

10. The method of claim 1 , wherein the first heat shrink layer comprises an epoxy resin or polyimide, and

the second heat shrink layer comprises at least one of acrylic resin, polyolefin, polyvinyl chloride (PVC), polyester (PET) or polymethyl methacrylate (PMMA).