Method of manufacturing semiconductor device and semiconductor device

1. A method of manufacturing semiconductor device, comprising:

performing a first ion implantation implanting at least one element selected from a group consisting of beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), zinc (Zn), cadmium (Cd), silicon (Si), germanium (Ge), and tin (Sn) into a nitride semiconductor layer;

performing a second ion implantation implanting nitrogen (N) into the nitride semiconductor layer;

performing a third ion implantation implanting hydrogen (H) into the nitride semiconductor layer;

forming a covering layer on a surface of the nitride semiconductor layer after the performing the first ion implantation, the second ion implantation, and the third ion implantation;

performing a first heat treatment after the forming the covering layer;

removing the covering layer after the performing the first heat treatment; and

performing a second heat treatment after the removing the covering layer.

2. The method according to claim 1 , wherein the covering layer is an insulator.

3. The method according to claim 2 , wherein the covering layer includes silicon oxide, silicon nitride, silicon oxynitride, or aluminum nitride.

4. The method according to claim 1 , wherein the first heat treatment is performed in an atmosphere containing argon, nitrogen, hydrogen, or helium.

5. The method according to claim 4 , wherein the first heat treatment is performed in an atmosphere containing hydrogen.

6. The method according to claim 1 , wherein the second heat treatment is performed in an atmosphere containing argon, nitrogen, or helium.

7. The method according to claim 1 , wherein the second heat treatment is performed at a pressure lower than a pressure of the first heat treatment.

8. The method according to claim 1 , wherein a dose amount of nitrogen in the second ion implantation is larger than a dose amount of the at least one element in the first ion implantation.

9. The method according to claim 1 , wherein a concentration of nitrogen at any position in the depth direction of the nitride semiconductor layer is higher than a concentration of the at least one element after the second ion implantation.

10. The method according to claim 1 , wherein a dose amount of hydrogen in the third ion implantation is larger than a dose amount of the at least one element of the first ion implantation and is larger than a dose amount of nitrogen in the second ion implantation.

11. The method according to claim 1 , wherein a concentration distribution of hydrogen formed in the nitride semiconductor layer by the third ion implantation covers a concentration distribution of the at least one element formed in the nitride semiconductor layer by the first ion implantation.

12. The method according to claim 1 , wherein a dose amount of the at least one element in the first ion implantation is equal to or more than 1×10 11 cm −2 and equal to or less than 1×10 15 cm −2 .

13. The method according to claim 1 , wherein a dose amount of hydrogen in the third ion implantation is equal to or more than 1×10 15 cm −2 .

14. The method according to claim 1 , further comprising:

forming a trench in the nitride semiconductor layer before the performing the first ion implantation, the second ion implantation, and the third ion implantation;

forming a gate insulating layer in the trench after the performing the second heat treatment; and

forming a gate electrode in the trench after the forming the gate insulating layer, wherein

the at least one element is implanted to a bottom face of the trench by the first ion implantation, nitrogen (N) is implanted to the bottom face of the trench by the second ion implantation, and hydrogen (H) is implanted to the bottom face of the trench by the third ion implantation.

15. The method according to claim 1 , further comprising:

forming a metal layer on the surface of the nitride semiconductor layer after the performing the second heat treatment.

16. A method of manufacturing semiconductor device, comprising:

performing a first ion implantation implanting at least one element selected from a group consisting of beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), zinc (Zn), cadmium (Cd), silicon (Si), germanium (Ge), and tin (Sn) into a nitride semiconductor layer;

performing a second ion implantation implanting nitrogen (N) into the nitride semiconductor layer;

performing a third ion implantation implanting hydrogen (H) into the nitride semiconductor layer;

forming a covering layer on a surface of the nitride semiconductor layer after the performing the first ion implantation, the second ion implantation, and the third ion implantation;

performing a first heat treatment after forming the covering layer; and

performing a second heat treatment under a condition different from a condition of the first heat treatment after the first heat treatment.

17. The method according to claim 16 , wherein the first heat treatment is performed in an atmosphere containing hydrogen, and the second heat treatment is performed in an atmosphere containing no hydrogen or in an atmosphere having a hydrogen partial pressure lower than a hydrogen partial pressure of the first heat treatment.

18. The method according to claim 16 , wherein the second heat treatment is performed at a pressure lower than a pressure of the first heat treatment.

19. A semiconductor device comprising:

a first nitride semiconductor layer;

a second nitride semiconductor layer disposed on the first nitride semiconductor layer, the second nitride semiconductor layer having a bandgap wider than a bandgap of the first nitride semiconductor layer;

a first electrode disposed on the second nitride semiconductor layer, the first electrode being electrically connected to the second nitride semiconductor layer;

a second electrode disposed on the second nitride semiconductor layer, the second electrode being electrically connected to the second nitride semiconductor layer;

a trench disposed between the first electrode and the second electrode, the trench having a first side face, a second side face, and a bottom face between the first side face and the second side face, and the bottom face disposed in the first nitride semiconductor layer;

a gate electrode disposed in the trench;

a gate insulating layer disposed between the bottom face and the gate electrode, between the first side face and the gate electrode, and between the second side face and the gate electrode; and

a third nitride semiconductor layer disposed between the bottom face and the gate insulating layer, between the first side face and the gate insulating layer, and between the second side face and the gate insulating layer, the third nitride semiconductor layer having a bandgap wider than the bandgaps of the first nitride semiconductor layer and the second nitride semiconductor layer, wherein

the first nitride semiconductor layer includes, on a lateral side of at least one of the first side face and the second side face, a first region containing at least one element selected from a group consisting of beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), zinc (Zn), and cadmium (Cd).

20. The semiconductor device according to claim 19 , further comprising:

a fourth nitride semiconductor layer provided between the first nitride semiconductor layer and the second nitride semiconductor layer, the fourth nitride semiconductor layer having a bandgap wider than the bandgaps of the first nitride semiconductor layer and the second nitride semiconductor layer, and the fourth nitride semiconductor layer including a second region containing at least one element selected from a group consisting of silicon (Si), germanium (Ge), and tin (Sn).