Coupled antenna system for multiband operation
A radiating system configured to operate electromagnetic wave signals from first and second frequency regions, wherein the lowest frequency of the second frequency region is above the highest frequency of the first frequency region: the radiating system comprising a radiating structure, a radiofrequency system, and an external port. The radiating structure comprises a first boosting element electrically connected to a first conductive element, a second boosting element electrically connected to a second conductive element, and a ground plane layer. The radiofrequency system comprises a first matching network connected to the first conductive element and the external port, and a second matching network connected to the second conductive element and a ground port. The first and second matching networks are configured to modify the impedance of the radiating structure providing impedance matching to the radiating system, at the external port, in the first and second frequency regions.
1. A radiating system for a wireless device, the radiating system comprising:
a radiofrequency system;
an external port; and
a radiating structure comprising:
a ground plane layer;
first and second conductive elements connected to the radiofrequency system, the first conductive element being connected to the ground plane layer, and the second conductive element being connected to the external port; and
a boosting element comprising a dielectric material, a first conductive surface and a second conductive surface contained in the dielectric material, wherein each of the first and second conductive surfaces is electrically connected to one of the first and second conductive elements, wherein the boosting element is configured to fit inside a limiting volume equal to or smaller than L 3 /50000, where L is a wavelength corresponding to a lowest frequency of a first frequency region of operation of the radiating system.
2. The radiating system of claim 1 , wherein the first and second conductive surfaces are located on two opposite sides of the dielectric material.
3. The radiating system of claim 1 , wherein the first and second conductive surfaces are contained in top and bottom surfaces of the dielectric material and respectively comprise top and bottom conductive surfaces.
4. The radiating system of claim 3 , wherein the top conductive surface is connected to a pad by a linear conductive element.
5. The radiating system of claim 4 , wherein the linear conductive element is a via.
6. The radiating system of claim 5 , wherein:
the first conductive element is connected to the ground plane layer by a direct connection; and
the radiofrequency system comprises a matching network connected to the second conductive element and the external port.
7. The radiating system of claim 4 , wherein the pad is contained in the bottom surface of the dielectric material.
8. The radiating system of claim 7 , wherein the linear conductive element is a via.
9. The radiating system of claim 8 , wherein:
the first conductive element is connected to the ground plane layer by a direct connection; and
the radiofrequency system comprises a matching network connected to the second conductive element and the external port.
10. The radiating system of claim 1 , wherein:
the first conductive element is connected to the ground plane layer by a direct connection; and
the radiofrequency system comprises a matching network connected to the second conductive element and the external port.
11. The radiating system of claim 10 , wherein the first conductive element is connected to the ground plane layer by a conductive trace.
12. The radiating system of claim 1 , wherein the radiofrequency system comprises a first matching network connected to the first conductive element and the ground plane layer, and a second matching network connected to the second conductive element and the external port.
13. The radiating system of claim 1 , wherein the radiating system is configured to operate at the first frequency region and a second frequency region, wherein a lowest frequency of the second frequency region is above a highest frequency of the first frequency region.
14. The radiating system of claim 13 , wherein a ratio between the lowest frequency of the second frequency region and the highest frequency of the first frequency region is greater than 1.2.
15. The radiating system of claim 13 , wherein a ratio between the lowest frequency of the second frequency region and the highest frequency of the first frequency region is greater than 1.5.
16. The radiating system of claim 13 , wherein a ratio between the lowest frequency of the second frequency region and the highest frequency of the first frequency region is greater than 2.0.
17. The radiating system of claim 1 , wherein:
the radiating system is configured to operate at the first frequency region and a second frequency region; and
a ratio between a lowest frequency of the second frequency region and the lowest frequency of the first frequency region is greater than 1.5.
18. The radiating system of claim 17 , wherein the ratio between the lowest frequency of the second frequency region and the lowest frequency of the first frequency region is greater than 2.0.
19. The radiating system of claim 17 , wherein the ratio between the lowest frequency of the second frequency region and the lowest frequency of the first frequency region is greater than 2.4.