Three-dimensional memory device and manufacturing method thereof

1. A three-dimensional memory device comprising:

an electrode structure including a plurality of interlayer dielectric layers and a plurality of electrode layers that are alternately stacked on a first substrate, each of the plurality of electrode layers having a pad part which does not overlap with another electrode layer positioned on the electrode layer;

a pass transistor positioned below the first substrate; and

a first contact passing through the electrode structure from the pad part of one of the plurality of electrode layers, and coupling the pad part and the pass transistor.

2. The three-dimensional memory device according to claim 1 , wherein the pass transistor and the pad part that are coupled to each other through the first contact overlap with each other in a vertical direction.

3. The three-dimensional memory device according to claim 1 , wherein the first contact and the plurality of electrode layers comprise the same material.

4. The three-dimensional memory device according to claim 1 , further comprising:

a sidewall conductive layer defined on a side surface of the first contact that is disposed to couple the first contact to the pad part; and

a sidewall dielectric layer defined on the side surface of the first contact to isolate the first contact from other electrode layers in the electrode structure.

5. The three-dimensional memory device according to claim 4 , wherein the sidewall conductive layer and the plurality of electrode layers comprise the same material.

6. The three-dimensional memory device according to claim 1 , wherein an upper end portion of the first contact is directly coupled to the pad part.

7. The three-dimensional memory device according to claim 6 , wherein the upper end portion of the first contact has an increased width compared to a remaining portion of the first contact.

8. The three-dimensional memory device according to claim 6 , further comprising:

a sidewall dielectric layer defined on a side surface of the first contact to isolate the first contact from other electrode layers in the electrode structure.

9. The three-dimensional memory device according to claim 1 , further comprising:

a second contact projecting from one of the plurality of pad parts in a vertical direction.

10. The three-dimensional memory device according to claim 9 ,

wherein the first substrate includes a cell region, a peripheral region, and a coupling region between the cell region and the peripheral region,

wherein the electrode structure is disposed in the cell region and the coupling region, and the plurality of pad parts, the first contact and the second contact are disposed in the coupling region, and

wherein the second contact is disposed closer to the peripheral region than the first contact.

11. The three-dimensional memory device according to claim 1 , wherein the pass transistor is disposed on a second substrate below the first substrate.

12. The three-dimensional memory device according to claim 1 , further comprising:

a first interconnect structure defined under the first substrate,

wherein the first interconnect structure includes a first bonding pad, which is coupled to the first contact, on a first surface facing away from a second surface that contacts the first substrate.

13. The three-dimensional memory device according to claim 12 , wherein the first bonding pad overlaps, in a vertical direction, with the pad part that is coupled to the first contact.

14. The three-dimensional memory device according to claim 12 ,

wherein the pass transistor is disposed in a peripheral wafer that is bonded to the first surface of the first interconnect structure, and

wherein the peripheral wafer includes a second interconnect structure including a second bonding pad that is coupled to the pass transistor and that is bonded to the first bonding pad.