RC IGBT with an IGBT section and a diode section
An RC IGBT with an n-barrier region in a transition section between a diode section and an IGBT section is presented.
1. An RC IGBT, comprising:
an active region with an IGBT section, a diode section and a transition section between the IGBT section and the diode section, the IGBT section and the diode section adjoining the transition section from opposing lateral directions;
an edge termination region surrounding the active region;
a semiconductor body having a frontside and a backside, a thickness of the semiconductor body being defined as the distance along a vertical direction between the frontside and the backside, wherein a total lateral extension of the transition section amounts to at least 30% of the semiconductor body thickness;
a plurality of trenches arranged in each of the IGBT section, the diode section and the transition section, each trench extending from the frontside along the vertical direction into the semiconductor body and comprising a trench electrode isolated from the semiconductor body by a trench insulator, wherein two adjacent trenches define a respective mesa portion in the semiconductor body;
a first load terminal at the semiconductor body frontside and a second load terminal at the semiconductor body backside, wherein the IGBT section is configured for conduction of a forward load current between the first load terminal and the second load terminal, and wherein the diode section is configured for conduction of a reverse load current between the first load terminal and the second load terminal;
a control terminal configured to control the forward load current, wherein in the IGBT section, an average density of trench electrodes electrically connected to the control terminal is at least twice as great as an average density of trench electrodes connected to the control terminal in the transition section;
a drift region of a first conductivity type formed in the semiconductor body and extending into each of the IGBT section, the diode section and the transition section; and
a body region of a second conductivity type formed in the mesa portions of the semiconductor body and extending into each of the IGBT section, the diode section and the transition section,
wherein at least portions of the body region are electrically connected to the first load terminal,
wherein the body region forms pn-junctions to subsections of the mesa portions of the first conductivity type at least in the transition section,
wherein at least in the transition section, a barrier region of the first conductivity type having a peak dopant concentration at least 100 times greater than an average dopant concentration of the drift region is arranged at least in subportions of the mesa portion that interface with the body region,
wherein an average dopant dose of the mesa subportions of the first conductivity type in the transition section is at least a factor of 1.2 higher than an average dopant dose of mesa subportions of the first conductivity type in the diode section.
2. The RC IGBT of claim 1 , wherein with respect to a volume of the active region, a ratio between the IGBT section and the diode section is at least 2:1.
3. The RC IGBT of claim 1 , wherein at least a part of the body region in the IGBT section is coupled to the drift region without the barrier region, and/or wherein at least a part of the body region in the diode section is coupled to the drift region without the barrier region.
4. The RC IGBT of claim 1 , wherein the average dopant dose of the mesa subportions in the IGBT section is at least a factor of 1.2 lower than the average dopant dose of mesa subportions in the transition section.
5. The RC IGBT of claim 1 , wherein at least one of the average dopant dose of the mesa subportions in the IGBT section, the average dopant dose of the mesa subportions in the diode section and the average dopant dose of the mesa subportions in the transition section is achieved at least by a lateral structure of a barrier layer comprising the barrier region.
6. The RC IGBT of claim 1 , wherein the average dopant dose of the barrier region amounts at least to 20% and to no more than 500% of the average dopant dose of the body region in the transition section.
7. The RC IGBT of claim 1 , further comprising:
in the IGBT section, an IGBT emitter region of the second conductivity type electrically connected to the second load terminal and coupled to the drift region.
8. The RC IGBT of claim 1 , further comprising:
in the diode section, a diode cathode region of the first conductivity type electrically connected to the second load terminal and coupled to the drift region.
9. The RC IGBT of claim 1 , wherein each of the trenches that extend into the transition section is either electrically floating or electrically connected to a potential different from the electrical potential of the control terminal.
10. The RC IGBT of claim 1 , wherein each of at least 80% of the trenches that extend into the transition section is either electrically floating or electrically connected to a potential different from the electrical potential of the control terminal, and wherein at least one of the remaining 20% of the trenches that extend into the transition section is electrically connected to the control terminal for forming at least one local IGBT cell in the transition section.
11. The RC IGBT of claim 10 , wherein the barrier region in the transition section is laterally structured such that no lateral overlap between the barrier region and the at least one local IGBT cell in the transition section is formed.
12. The RC IGBT of claim 1 , wherein the trenches in each of the IGBT section, the diode section and the transition section are laterally arranged next to one another in accordance with a same lateral trench pitch.
13. The RC IGBT of claim 12 , wherein the lateral trench pitch defines a lateral distance between two adjacent trenches of no more than 1/30 of the semiconductor body thickness.
14. The RC IGBT of claim 1 , further comprising:
in the diode section, a further barrier region of the first conductivity having an average dopant concentration at least 100 times as great as an average dopant concentration of the drift region and laterally extending along at least 10% of the total lateral extension of the diode section,
wherein at least a part of the body region in the diode section is coupled to the drift region at least by the further barrier region.
15. The RC IGBT of claim 14 , wherein the barrier region of the transition section forms a contiguous barrier layer with the further barrier region.
16. The RC IGBT of claim 1 , further comprising:
in the IGBT section, a further barrier region of the first conductivity having a peak dopant concentration at least 100 times as great as an average dopant concentration of the drift region and laterally extending along at least 10% of the total lateral extension of the IGBT section,
wherein at least a part of the body region in the IGBT section is coupled to the drift region at least by the further barrier region.
17. The RC IGBT of claim 16 , wherein the barrier region of the transition section forms a contiguous barrier layer with the further barrier region.
18. The RC IGBT of claim 1 , further comprising:
in the transition section, a doped region electrically connected to the second load terminal and coupled to the drift region and having the same total lateral extension as the transition section.
19. The RC IGBT of claim 18 , wherein:
the doped region is of the second conductivity type; or
the doped region is a hybrid region with a number of subregions of the first conductivity type electrically connected to the second load terminal and coupled to the drift region, and a number of second subregions of the second conductivity type electrically connected to the second load terminal and coupled to the drift region, or
the doped region is of the second conductivity type and the RC IGBT further comprises, in the diode section, a diode cathode region of the first conductivity type electrically connected to the second load terminal and coupled to the drift region, the diode cathode region being laterally interrupted by one or more subregions of the second conductivity type that are electrically connected to the second load terminal and coupled to the drift region.
20. The RC IGBT 18 , wherein the doped region is of the second conductivity type, wherein the IGBT section comprises an IGBT emitter region of the second conductivity type electrically connected to the second load terminal and coupled to the drift region, and wherein:
the IGBT emitter region is a laterally structured region with a number of higher doped IGBT emitter subregions of the second conductivity type electrically connected to the second load terminal and coupled to the drift region, and with a number of lower doped IGBT emitter subregions of the second conductivity type electrically connected to the second load terminal and coupled to the drift region; and/or
the doped region is a laterally structured region with a number of higher doped subregions of the second conductivity type electrically connected to the second load terminal and coupled to the drift region, and with a number of lower doped subregions of the second conductivity type electrically connected to the second load terminal and coupled to the drift region.
21. The RC IGBT of claim 1 , wherein:
the body region of the diode section extends further along the vertical direction as compared to the body region in the IGBT section by a factor of at least 150% compared to a deepest level of the body region in the IGBT section along the vertical direction; and/or
the barrier region of the transition section and the body region of the diode section have a common vertical extension range amounting to at least 20% of the total vertical extension range of the barrier region.
22. A method of forming an RC IGBT, the method comprising:
forming an active region with an IGBT section, a diode section and a transition section between the IGBT section and the diode section, wherein the IGBT section and the diode section adjoin the transition section from opposing lateral directions;
forming an edge termination region surrounding the active region;
forming a semiconductor body having a frontside and a backside, a thickness of the semiconductor body being defined as the distance along a vertical direction between the frontside and the backside, wherein a total lateral extension of the transition section amounts to at least 30% of the semiconductor body thickness;
forming a plurality of trenches arranged in each of the IGBT section, the diode section and the transition section, each trench extending from the frontside along the vertical direction into the semiconductor body and comprising a trench electrode isolated from the semiconductor body by a trench insulator, wherein two adjacent trenches define a respective mesa portion in the semiconductor body;
forming a first load terminal at the semiconductor body frontside and a second load terminal at the semiconductor body backside, wherein the IGBT section is configured for conduction of a forward load current between the first load terminal and the second load terminal, wherein the diode section is configured for conduction of a reverse load current between the first load terminal and the second load terminal;
forming a control terminal configured to control the forward load current, wherein in the IGBT section, an average density of trench electrodes electrically connected to the control terminal is at least twice as great as an average density of trench electrodes connected to the control terminal in the transition section;
forming a drift region of a first conductivity type in the semiconductor body and extending into each of the IGBT section, the diode section and the transition section;
forming a body region of a second conductivity type in the mesa portions of the semiconductor body and extending into each of the IGBT section, the diode section and the transition section, wherein at least portions of the body region are electrically connected to the first load terminal, and wherein the body region forms pn-junctions to subsections of the mesa portions of the first conductivity type of the first conductivity type at least in the transition section; and
forming at least in the transition section, a barrier region of the first conductivity type having a peak dopant concentration at least 100 times greater than an average dopant concentration of the drift region and arranged at least in subportions of the mesa portion that interface with the body region, wherein an average dopant dose of the mesa subportions of the first conductivity type in the transition section is at least a factor of 1.2 higher than an average dopant dose of mesa subportions of the first conductivity type in the diode section.