Sensor device including sensor unit for a gaseous medium
A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.
1. A sensor device comprising:
a sensor unit sensitive for a property of a gaseous medium, wherein the sensor unit is formed on a first surface of a sensor substrate;
a frame structure on the first surface, wherein the frame structure is formed from a developed first photoresist material and comprises a first loop portion laterally surrounding a first area comprising the sensor unit;
a communicating channel accessing the first area through at least one of a lateral port in the first loop portion or a base port in the sensor substrate; and
a lid structure formed from a developed second photoresist material formed directly on the frame structure and completely covering the frame structure and the first area.
2. The sensor device of claim 1 , wherein the sensor unit comprises a micro-electromechanical system (MEMS) pressure sensor.
3. The sensor device of claim 1 , wherein the sensor unit comprises a gas sensor having a sensitive surface comprising receptor sites for one or more species of molecules.
4. The sensor device of claim 1 , further comprising a carrier structure disposed on a second surface of the sensor substrate opposite the first surface of the sensor substrate.
5. A sensor device comprising:
a sensor unit sensitive for a property of a gaseous medium, wherein the sensor unit is formed on a first surface of a sensor substrate;
a frame structure on the first surface, wherein the frame structure is formed from a developed first photoresist material and comprises a first loop portion laterally surrounding a first area comprising the sensor unit; and
a communicating channel accessing the first area through at least one of a lateral port in the first loop portion or a base port in the sensor substrate.
6. The sensor device of claim 5 , wherein the sensor unit comprises a micro- electromechanical system (MEMS) pressure sensor.
7. The sensor device of claim 5 , wherein the sensor unit comprises a gas sensor having a sensitive surface comprising receptor sites for one or more species of molecules.
8. The sensor device of claim 5 , further comprising a carrier structure disposed on a second surface of the sensor substrate opposite the first surface of the sensor substrate.
9. The sensor device of claim 5 , further comprising a lid structure directly on the frame structure and completely covering the frame structure and the first area.
10. The sensor device of claim 5 , further comprising an inlet box formed by a second loop portion disposed on the sensor substrate and coupled to the lateral port.
11. The sensor device of claim 10 , further comprising a further lid structure covering at least a portion of the inlet box.
12. The sensor device of claim 11 , wherein the further lid structure comprises a lid opening exposing a lower portion of the inlet box.
13. The sensor device of claim 10 , further comprising a reflective structure disposed on the lower portion of the inlet box.
14. A method of forming a sensor device, the method comprising:
forming a sensor unit sensitive for a property of a gaseous medium, wherein the sensor unit is formed on a first surface of a sensor substrate;
forming a frame structure on the first surface, wherein the frame structure is formed from a developed first photoresist material and comprises a first loop portion laterally surrounding a first area comprising the sensor unit; and
forming a communicating channel accessing the first area through at least one of a lateral port in the first loop portion or a base port in the sensor substrate.
15. The method of claim 14 , further comprising a lid structure directly on the frame structure and completely covering the frame structure and the first area.
16. The method of claim 15 , wherein the lid structure is formed from a second photoresist material.
17. The method of claim 14 , further comprising forming an inlet box, wherein the inlet box is formed by a second loop portion disposed on the sensor substrate and coupled to the lateral port.
18. The method of claim 17 , further comprising forming a further lid structure covering at least a portion of the inlet box.
19. The method of claim 18 , wherein the further lid structure comprises a lid opening exposing a lower portion of the inlet box.
20. The method of claim 17 , further comprising forming a reflective structure disposed on the lower portion of the inlet box.